NO2 gas sensing performance of Ag−WO3−x thin films prepared by reactive magnetron sputtering process.
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| Authors: | Hossain, Modassar1 (AUTHOR), Sarkar, Krishnendu1 (AUTHOR), Mondal, Arnab2 (AUTHOR), Bag, Ankush3 (AUTHOR), Kuiri, Probodh Kumar4 (AUTHOR), Roopa5 (AUTHOR), Kumar, M. Senthil5 (AUTHOR), Bysakh, Sandip1 (AUTHOR), Pal, Prabir1 (AUTHOR) prabir.p@cgcri.res.in |
| Source: | Applied Physics A: Materials Science & Processing. Dec2023, Vol. 129 Issue 12, p1-13. 13p. |
| Subjects: | Magnetron sputtering, Reactive sputtering, Thin films, Magnetrons, X-ray photoelectron spectroscopy, Transmission electron microscopes, Trace gases |
| Abstract: | We have demonstrated a comparative study of NO2 gas sensing behavior of reactive sputtered growth WO3−x nanocrystalline thin films and its functionalization with Ag nanoparticles (Ag−WO3−x) on Si/SiO2 substrates. X-ray diffraction and transmission electron microscope characterizations demonstrate the formation of polycrystalline monoclinic phase of porous WO3-x thin film. X-ray photoelectron spectroscopy experiments reveal that W6+ charge state has higher concentration compared with that of W4+ and W5+. The Ag−WO3−x films exhibit a sensitivity of about 70% at 10 ppm, while WO3−x films show 12%, measured at 225 °C with same NO2 gas concentration. The response and recovery time are 2 and 3 min. for Ag−WO3−x films, while these for WO3−x films are 3 and 4 min., respectively. This work shows that nano-scale dendritic agglomeration growth of Ag nanoparticles on WO3−x surface can increase active sites for NO2 gas and play an important role in trace-level gas sensing performance. [ABSTRACT FROM AUTHOR] |
| Copyright of Applied Physics A: Materials Science & Processing is the property of Springer Nature and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.) | |
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| Header | DbId: egs DbLabel: Engineering Source An: 174342394 AccessLevel: 6 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| Items | – Name: Title Label: Title Group: Ti Data: NO<subscript>2</subscript> gas sensing performance of Ag−WO<subscript>3−x</subscript> thin films prepared by reactive magnetron sputtering process. – Name: Author Label: Authors Group: Au Data: <searchLink fieldCode="AR" term="%22Hossain%2C+Modassar%22">Hossain, Modassar</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Sarkar%2C+Krishnendu%22">Sarkar, Krishnendu</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Mondal%2C+Arnab%22">Mondal, Arnab</searchLink><relatesTo>2</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Bag%2C+Ankush%22">Bag, Ankush</searchLink><relatesTo>3</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Kuiri%2C+Probodh+Kumar%22">Kuiri, Probodh Kumar</searchLink><relatesTo>4</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Roopa%22">Roopa</searchLink><relatesTo>5</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Kumar%2C+M%2E+Senthil%22">Kumar, M. Senthil</searchLink><relatesTo>5</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Bysakh%2C+Sandip%22">Bysakh, Sandip</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Pal%2C+Prabir%22">Pal, Prabir</searchLink><relatesTo>1</relatesTo> (AUTHOR)<i> prabir.p@cgcri.res.in</i> – Name: TitleSource Label: Source Group: Src Data: <searchLink fieldCode="JN" term="%22Applied+Physics+A%3A+Materials+Science+%26+Processing%22">Applied Physics A: Materials Science & Processing</searchLink>. Dec2023, Vol. 129 Issue 12, p1-13. 13p. – Name: Subject Label: Subjects Group: Su Data: <searchLink fieldCode="DE" term="%22Magnetron+sputtering%22">Magnetron sputtering</searchLink><br /><searchLink fieldCode="DE" term="%22Reactive+sputtering%22">Reactive sputtering</searchLink><br /><searchLink fieldCode="DE" term="%22Thin+films%22">Thin films</searchLink><br /><searchLink fieldCode="DE" term="%22Magnetrons%22">Magnetrons</searchLink><br /><searchLink fieldCode="DE" term="%22X-ray+photoelectron+spectroscopy%22">X-ray photoelectron spectroscopy</searchLink><br /><searchLink fieldCode="DE" term="%22Transmission+electron+microscopes%22">Transmission electron microscopes</searchLink><br /><searchLink fieldCode="DE" term="%22Trace+gases%22">Trace gases</searchLink> – Name: Abstract Label: Abstract Group: Ab Data: We have demonstrated a comparative study of NO2 gas sensing behavior of reactive sputtered growth WO3−x nanocrystalline thin films and its functionalization with Ag nanoparticles (Ag−WO3−x) on Si/SiO2 substrates. X-ray diffraction and transmission electron microscope characterizations demonstrate the formation of polycrystalline monoclinic phase of porous WO3-x thin film. X-ray photoelectron spectroscopy experiments reveal that W6+ charge state has higher concentration compared with that of W4+ and W5+. The Ag−WO3−x films exhibit a sensitivity of about 70% at 10 ppm, while WO3−x films show 12%, measured at 225 °C with same NO2 gas concentration. The response and recovery time are 2 and 3 min. for Ag−WO3−x films, while these for WO3−x films are 3 and 4 min., respectively. This work shows that nano-scale dendritic agglomeration growth of Ag nanoparticles on WO3−x surface can increase active sites for NO2 gas and play an important role in trace-level gas sensing performance. [ABSTRACT FROM AUTHOR] – Name: AbstractSuppliedCopyright Label: Group: Ab Data: <i>Copyright of Applied Physics A: Materials Science & Processing is the property of Springer Nature and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.) |
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| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1007/s00339-023-07134-7 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 13 StartPage: 1 Subjects: – SubjectFull: Magnetron sputtering Type: general – SubjectFull: Reactive sputtering Type: general – SubjectFull: Thin films Type: general – SubjectFull: Magnetrons Type: general – SubjectFull: X-ray photoelectron spectroscopy Type: general – SubjectFull: Transmission electron microscopes Type: general – SubjectFull: Trace gases Type: general Titles: – TitleFull: NO2 gas sensing performance of Ag−WO3−x thin films prepared by reactive magnetron sputtering process. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Hossain, Modassar – PersonEntity: Name: NameFull: Sarkar, Krishnendu – PersonEntity: Name: NameFull: Mondal, Arnab – PersonEntity: Name: NameFull: Bag, Ankush – PersonEntity: Name: NameFull: Kuiri, Probodh Kumar – PersonEntity: Name: NameFull: Roopa – PersonEntity: Name: NameFull: Kumar, M. Senthil – PersonEntity: Name: NameFull: Bysakh, Sandip – PersonEntity: Name: NameFull: Pal, Prabir IsPartOfRelationships: – BibEntity: Dates: – D: 01 M: 12 Text: Dec2023 Type: published Y: 2023 Identifiers: – Type: issn-print Value: 09478396 Numbering: – Type: volume Value: 129 – Type: issue Value: 12 Titles: – TitleFull: Applied Physics A: Materials Science & Processing Type: main |
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