APA (7th ed.) Citation

Kumar, K. N., Reddy, G. V. A., Sattar, S. A., Jafri, R. I., Premkumar, R., Muthukrishnan, M., . . . Ko, T. J. (2024). Effect of Oxygen Flow Rate, Post-annealing Temperature, and Different Electrolyte Concentrations on WO3 Thin Films Deposited by DC Magnetron Sputtering For Electrochromic Applications. Journal of Electronic Materials, 53(5), 2351. https://doi.org/10.1007/s11664-024-11000-4

Chicago Style (17th ed.) Citation

Kumar, K. Naveen, et al. "Effect of Oxygen Flow Rate, Post-annealing Temperature, and Different Electrolyte Concentrations on WO3 Thin Films Deposited by DC Magnetron Sputtering For Electrochromic Applications." Journal of Electronic Materials 53, no. 5 (2024): 2351. https://doi.org/10.1007/s11664-024-11000-4.

MLA (9th ed.) Citation

Kumar, K. Naveen, et al. "Effect of Oxygen Flow Rate, Post-annealing Temperature, and Different Electrolyte Concentrations on WO3 Thin Films Deposited by DC Magnetron Sputtering For Electrochromic Applications." Journal of Electronic Materials, vol. 53, no. 5, 2024, p. 2351, https://doi.org/10.1007/s11664-024-11000-4.