Effect of Oxygen Flow Rate, Post-annealing Temperature, and Different Electrolyte Concentrations on WO3 Thin Films Deposited by DC Magnetron Sputtering For Electrochromic Applications.

Saved in:
Bibliographic Details
Title: Effect of Oxygen Flow Rate, Post-annealing Temperature, and Different Electrolyte Concentrations on WO3 Thin Films Deposited by DC Magnetron Sputtering For Electrochromic Applications.
Authors: Kumar, K. Naveen1,2 naveenkilari95@gmail.com, Reddy, G. V. Ashok1, Sattar, Sheik Abdul1 sheik.abdul.sattar@nmit.ac.in, Jafri, R. Imran3, Premkumar, R.4, Muthukrishnan, M.5, Ahamed, A. Asrar6, Meera, M. R.7, Prakash, Nunna Guru8 drguruprakashn@gmail.com, Tighezza, Ammar M.9, Ko, Tae Jo8 tjko@yu.ac.kr
Source: Journal of Electronic Materials. May2024, Vol. 53 Issue 5, p2351-2366. 16p.
Subjects: Magnetron sputtering, DC sputtering, Thin films, Electrochromic effect, Electrolytes, Optical spectroscopy
Abstract: In this work, tungsten oxide (WO3) films were deposited at room temperature and annealed for 2 h at 400°C. The electrochromic and electrochemical properties were studied for two different electrolytes. The films were deposited at different oxygen flow rates of 2, 4, and 6 standard cubic centimeters per minute (SCCM). X-ray diffraction analysis revealed structural characterization of amorphous and crystalline phases. UV-visible spectroscopy optical transmittance revealed 91% transmittance, and energy-dispersive x-ray spectroscopy (EDS) analysis revealed the absence of impurities and the presence of W and O. An electrochemical analyzer was used to characterize the deposited and annealed WO3 films immersed in the two different electrolyte solutions (H2SO4 and LiClO4 with oxygen flow rates ranging from 2 SCCM to 6 SCCM). It was found that the H2SO4 electrolyte of an annealed WO3 thin film at 2 SCCM demonstrated high coloring efficiency of 50.18 cm2/C, and the LiClO4 electrolyte of an annealed WO3 thin film at 4 SCCM demonstrated high coloring efficiency of 20.06 cm2/C. [ABSTRACT FROM AUTHOR]
Copyright of Journal of Electronic Materials is the property of Springer Nature and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
Database: Engineering Source
Full text is not displayed to guests.
FullText Links:
  – Type: pdflink
Text:
  Availability: 1
Header DbId: egs
DbLabel: Engineering Source
An: 176353910
AccessLevel: 6
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
IllustrationInfo
Items – Name: Title
  Label: Title
  Group: Ti
  Data: Effect of Oxygen Flow Rate, Post-annealing Temperature, and Different Electrolyte Concentrations on WO<subscript>3</subscript> Thin Films Deposited by DC Magnetron Sputtering For Electrochromic Applications.
– Name: Author
  Label: Authors
  Group: Au
  Data: <searchLink fieldCode="AR" term="%22Kumar%2C+K%2E+Naveen%22">Kumar, K. Naveen</searchLink><relatesTo>1,2</relatesTo><i> naveenkilari95@gmail.com</i><br /><searchLink fieldCode="AR" term="%22Reddy%2C+G%2E+V%2E+Ashok%22">Reddy, G. V. Ashok</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Sattar%2C+Sheik+Abdul%22">Sattar, Sheik Abdul</searchLink><relatesTo>1</relatesTo><i> sheik.abdul.sattar@nmit.ac.in</i><br /><searchLink fieldCode="AR" term="%22Jafri%2C+R%2E+Imran%22">Jafri, R. Imran</searchLink><relatesTo>3</relatesTo><br /><searchLink fieldCode="AR" term="%22Premkumar%2C+R%2E%22">Premkumar, R.</searchLink><relatesTo>4</relatesTo><br /><searchLink fieldCode="AR" term="%22Muthukrishnan%2C+M%2E%22">Muthukrishnan, M.</searchLink><relatesTo>5</relatesTo><br /><searchLink fieldCode="AR" term="%22Ahamed%2C+A%2E+Asrar%22">Ahamed, A. Asrar</searchLink><relatesTo>6</relatesTo><br /><searchLink fieldCode="AR" term="%22Meera%2C+M%2E+R%2E%22">Meera, M. R.</searchLink><relatesTo>7</relatesTo><br /><searchLink fieldCode="AR" term="%22Prakash%2C+Nunna+Guru%22">Prakash, Nunna Guru</searchLink><relatesTo>8</relatesTo><i> drguruprakashn@gmail.com</i><br /><searchLink fieldCode="AR" term="%22Tighezza%2C+Ammar+M%2E%22">Tighezza, Ammar M.</searchLink><relatesTo>9</relatesTo><br /><searchLink fieldCode="AR" term="%22Ko%2C+Tae+Jo%22">Ko, Tae Jo</searchLink><relatesTo>8</relatesTo><i> tjko@yu.ac.kr</i>
– Name: TitleSource
  Label: Source
  Group: Src
  Data: <searchLink fieldCode="JN" term="%22Journal+of+Electronic+Materials%22">Journal of Electronic Materials</searchLink>. May2024, Vol. 53 Issue 5, p2351-2366. 16p.
– Name: Subject
  Label: Subjects
  Group: Su
  Data: <searchLink fieldCode="DE" term="%22Magnetron+sputtering%22">Magnetron sputtering</searchLink><br /><searchLink fieldCode="DE" term="%22DC+sputtering%22">DC sputtering</searchLink><br /><searchLink fieldCode="DE" term="%22Thin+films%22">Thin films</searchLink><br /><searchLink fieldCode="DE" term="%22Electrochromic+effect%22">Electrochromic effect</searchLink><br /><searchLink fieldCode="DE" term="%22Electrolytes%22">Electrolytes</searchLink><br /><searchLink fieldCode="DE" term="%22Optical+spectroscopy%22">Optical spectroscopy</searchLink>
– Name: Abstract
  Label: Abstract
  Group: Ab
  Data: In this work, tungsten oxide (WO3) films were deposited at room temperature and annealed for 2 h at 400°C. The electrochromic and electrochemical properties were studied for two different electrolytes. The films were deposited at different oxygen flow rates of 2, 4, and 6 standard cubic centimeters per minute (SCCM). X-ray diffraction analysis revealed structural characterization of amorphous and crystalline phases. UV-visible spectroscopy optical transmittance revealed 91% transmittance, and energy-dispersive x-ray spectroscopy (EDS) analysis revealed the absence of impurities and the presence of W and O. An electrochemical analyzer was used to characterize the deposited and annealed WO3 films immersed in the two different electrolyte solutions (H2SO4 and LiClO4 with oxygen flow rates ranging from 2 SCCM to 6 SCCM). It was found that the H2SO4 electrolyte of an annealed WO3 thin film at 2 SCCM demonstrated high coloring efficiency of 50.18 cm2/C, and the LiClO4 electrolyte of an annealed WO3 thin film at 4 SCCM demonstrated high coloring efficiency of 20.06 cm2/C. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of Journal of Electronic Materials is the property of Springer Nature and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=egs&AN=176353910
RecordInfo BibRecord:
  BibEntity:
    Identifiers:
      – Type: doi
        Value: 10.1007/s11664-024-11000-4
    Languages:
      – Code: eng
        Text: English
    PhysicalDescription:
      Pagination:
        PageCount: 16
        StartPage: 2351
    Subjects:
      – SubjectFull: Magnetron sputtering
        Type: general
      – SubjectFull: DC sputtering
        Type: general
      – SubjectFull: Thin films
        Type: general
      – SubjectFull: Electrochromic effect
        Type: general
      – SubjectFull: Electrolytes
        Type: general
      – SubjectFull: Optical spectroscopy
        Type: general
    Titles:
      – TitleFull: Effect of Oxygen Flow Rate, Post-annealing Temperature, and Different Electrolyte Concentrations on WO3 Thin Films Deposited by DC Magnetron Sputtering For Electrochromic Applications.
        Type: main
  BibRelationships:
    HasContributorRelationships:
      – PersonEntity:
          Name:
            NameFull: Kumar, K. Naveen
      – PersonEntity:
          Name:
            NameFull: Reddy, G. V. Ashok
      – PersonEntity:
          Name:
            NameFull: Sattar, Sheik Abdul
      – PersonEntity:
          Name:
            NameFull: Jafri, R. Imran
      – PersonEntity:
          Name:
            NameFull: Premkumar, R.
      – PersonEntity:
          Name:
            NameFull: Muthukrishnan, M.
      – PersonEntity:
          Name:
            NameFull: Ahamed, A. Asrar
      – PersonEntity:
          Name:
            NameFull: Meera, M. R.
      – PersonEntity:
          Name:
            NameFull: Prakash, Nunna Guru
      – PersonEntity:
          Name:
            NameFull: Tighezza, Ammar M.
      – PersonEntity:
          Name:
            NameFull: Ko, Tae Jo
    IsPartOfRelationships:
      – BibEntity:
          Dates:
            – D: 01
              M: 05
              Text: May2024
              Type: published
              Y: 2024
          Identifiers:
            – Type: issn-print
              Value: 03615235
          Numbering:
            – Type: volume
              Value: 53
            – Type: issue
              Value: 5
          Titles:
            – TitleFull: Journal of Electronic Materials
              Type: main
ResultId 1