View in EDS HTML Full Text PDF Full Text

Effect of MoN on the structure and characteristics of MoN/ZrMoN bi-layer nitride films.

Saved in:
Bibliographic Details
Title: Effect of MoN on the structure and characteristics of MoN/ZrMoN bi-layer nitride films.
Authors: Hu, Ding-Chiang1 (AUTHOR), Kuo, Dong-Hau1 (AUTHOR), Tsao, Chung-Chen2 (AUTHOR), Ho, Jihng-Kuo3 (AUTHOR), Kuo, Chin-Guo4 (AUTHOR), Hsu, Chun-Yao2 (AUTHOR) cyhsu@mail.lhu.edu.tw
Source: Bulletin of Materials Science. Jun2024, Vol. 47 Issue 2, p1-10. 10p.
Subjects: Buffer layers, Reactive sputtering, Hardness, Adhesives
Abstract: Multi-alloy-modified film is used to protect the surface of tools and components. MoN/ZrMoN bi-layer films are deposited by sputtering. The effect of the MoN deposition time and the DC power for the Zr target on the structure and mechanical performance of the coated films is studied. The ZrMoN films correspond to the (111), (200) and (220) crystal planes of the FCC (NaCl) structures. The diffraction peaks for the (111) plane gradually shift to lower 2θ values as the Zr content is increased. For a MoN buffer layer with a thickness of ~393 nm, the ZrMoN film has a hardness of 12.53 GPa and a coefficient of friction of 0.42. As the DC power for the Zr target is increased to 200 W, the e hardness and elastic recovery for the MoN/ZrMoN bi-layer films are 15.65 GPa and 67.70%, respectively, which are the maximum respective values. The experimental results show that these bi-layer films have good mechanical performance and adhesive strength. [ABSTRACT FROM AUTHOR]
Copyright of Bulletin of Materials Science is the property of Springer Nature and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
Database: Engineering Source
Full text is not displayed to guests.
FullText Links:
  – Type: pdflink
Text:
  Availability: 1
Header DbId: egs
DbLabel: Engineering Source
An: 176995454
AccessLevel: 6
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
IllustrationInfo
Items – Name: Title
  Label: Title
  Group: Ti
  Data: Effect of MoN on the structure and characteristics of MoN/ZrMoN bi-layer nitride films.
– Name: Author
  Label: Authors
  Group: Au
  Data: <searchLink fieldCode="AR" term="%22Hu%2C+Ding-Chiang%22">Hu, Ding-Chiang</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Kuo%2C+Dong-Hau%22">Kuo, Dong-Hau</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Tsao%2C+Chung-Chen%22">Tsao, Chung-Chen</searchLink><relatesTo>2</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Ho%2C+Jihng-Kuo%22">Ho, Jihng-Kuo</searchLink><relatesTo>3</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Kuo%2C+Chin-Guo%22">Kuo, Chin-Guo</searchLink><relatesTo>4</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Hsu%2C+Chun-Yao%22">Hsu, Chun-Yao</searchLink><relatesTo>2</relatesTo> (AUTHOR)<i> cyhsu@mail.lhu.edu.tw</i>
– Name: TitleSource
  Label: Source
  Group: Src
  Data: <searchLink fieldCode="JN" term="%22Bulletin+of+Materials+Science%22">Bulletin of Materials Science</searchLink>. Jun2024, Vol. 47 Issue 2, p1-10. 10p.
– Name: Subject
  Label: Subjects
  Group: Su
  Data: <searchLink fieldCode="DE" term="%22Buffer+layers%22">Buffer layers</searchLink><br /><searchLink fieldCode="DE" term="%22Reactive+sputtering%22">Reactive sputtering</searchLink><br /><searchLink fieldCode="DE" term="%22Hardness%22">Hardness</searchLink><br /><searchLink fieldCode="DE" term="%22Adhesives%22">Adhesives</searchLink>
– Name: Abstract
  Label: Abstract
  Group: Ab
  Data: Multi-alloy-modified film is used to protect the surface of tools and components. MoN/ZrMoN bi-layer films are deposited by sputtering. The effect of the MoN deposition time and the DC power for the Zr target on the structure and mechanical performance of the coated films is studied. The ZrMoN films correspond to the (111), (200) and (220) crystal planes of the FCC (NaCl) structures. The diffraction peaks for the (111) plane gradually shift to lower 2θ values as the Zr content is increased. For a MoN buffer layer with a thickness of ~393 nm, the ZrMoN film has a hardness of 12.53 GPa and a coefficient of friction of 0.42. As the DC power for the Zr target is increased to 200 W, the e hardness and elastic recovery for the MoN/ZrMoN bi-layer films are 15.65 GPa and 67.70%, respectively, which are the maximum respective values. The experimental results show that these bi-layer films have good mechanical performance and adhesive strength. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of Bulletin of Materials Science is the property of Springer Nature and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=egs&AN=176995454
RecordInfo BibRecord:
  BibEntity:
    Identifiers:
      – Type: doi
        Value: 10.1007/s12034-023-03136-6
    Languages:
      – Code: eng
        Text: English
    PhysicalDescription:
      Pagination:
        PageCount: 10
        StartPage: 1
    Subjects:
      – SubjectFull: Buffer layers
        Type: general
      – SubjectFull: Reactive sputtering
        Type: general
      – SubjectFull: Hardness
        Type: general
      – SubjectFull: Adhesives
        Type: general
    Titles:
      – TitleFull: Effect of MoN on the structure and characteristics of MoN/ZrMoN bi-layer nitride films.
        Type: main
  BibRelationships:
    HasContributorRelationships:
      – PersonEntity:
          Name:
            NameFull: Hu, Ding-Chiang
      – PersonEntity:
          Name:
            NameFull: Kuo, Dong-Hau
      – PersonEntity:
          Name:
            NameFull: Tsao, Chung-Chen
      – PersonEntity:
          Name:
            NameFull: Ho, Jihng-Kuo
      – PersonEntity:
          Name:
            NameFull: Kuo, Chin-Guo
      – PersonEntity:
          Name:
            NameFull: Hsu, Chun-Yao
    IsPartOfRelationships:
      – BibEntity:
          Dates:
            – D: 01
              M: 06
              Text: Jun2024
              Type: published
              Y: 2024
          Identifiers:
            – Type: issn-print
              Value: 02504707
          Numbering:
            – Type: volume
              Value: 47
            – Type: issue
              Value: 2
          Titles:
            – TitleFull: Bulletin of Materials Science
              Type: main
ResultId 1