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Oxidation Performance of Nano-Layered (AlTiZrHfTa)N x /SiN x Coatings Deposited by Reactive Magnetron Sputtering.

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Title: Oxidation Performance of Nano-Layered (AlTiZrHfTa)N x /SiN x Coatings Deposited by Reactive Magnetron Sputtering.
Authors: Touaibia, Djallel Eddine1,2 (AUTHOR) djallel_eddine.touaibia@utt.fr, Achache, Sofiane1,2 (AUTHOR) abdelhakim.bouissil@utt.fr, Bouissil, Abdelhakim1,2 (AUTHOR) fabrice.parent@utt.fr, Parent, Fabrice1,2 (AUTHOR) frederic.sanchette@utt.fr, Ghanbaja, Jaafar3 (AUTHOR) jaafar.ghanbaja@univ-lorraine.fr, Gorbunova, Alina4 (AUTHOR) aag84@tpu.ru, Postnikov, Pavel S.4 (AUTHOR) pavelpostnikov@gmail.com, Chehimi, Mohamed Mehdi5 (AUTHOR) mmchehimi@yahoo.fr, Schuster, Frederic6 (AUTHOR) frederic.schuster@cea.fr, Sanchette, Frederic1,2 (AUTHOR), El Garah, Mohamed1,2 (AUTHOR) djallel_eddine.touaibia@utt.fr
Source: Materials (1996-1944). Jun2024, Vol. 17 Issue 12, p2799. 21p.
Subjects: Reactive sputtering, Magnetron sputtering, Refractory coating, DC sputtering, Field emission electron microscopy
Abstract: This work uses the direct current magnetron sputtering (DCMS) of equi-atomic (AlTiZrHfTa) and Si targets in dynamic sweep mode to deposit nano-layered (AlTiZrHfTa)Nx/SiNx refractory high-entropy coatings (RHECs). Transmission electron microscopy (TEM), field emission scanning electron microscopy (FESEM), thermogravimetric analysis (TGA), X-ray diffraction (XRD), and X-ray photoelectron spectroscopy (XPS) are used to investigate the effect of Si addition on the oxidation behavior of the nano-layered coatings. The Si-free nitride coating exhibits FCC structure and columnar morphology, while the Si-doped nitride coatings present a FCC (AlTiZrHfTa)N/amorphous-SiNx nano-layered architecture. The hardness decreases from 24.3 ± 1.0 GPa to 17.5 ± 1.0 GPa because of the nano-layered architecture, whilst Young's modulus reduces from 188.0 ± 1.0 GPa to roughly 162.4 ± 1.0 GPa. By increasing the thickness of the SiNx nano-layer, kp values decrease significantly from 3.36 × 10−8 g2 cm−4 h−1 to 6.06 × 10−9 g2 cm−4 h−1. The activation energy increases from 90.8 kJ·mol−1 for (AlTiZrHfTa)Nx nitride coating to 126.52 kJ·mol−1 for the (AlTiZrHfTa)Nx/SiNx nano-layered coating. The formation of a FCC (AlTiZrHfTa)-Nx/a-SiNx nano-layered architecture results in the improvement of the resistance to oxidation at high temperature. [ABSTRACT FROM AUTHOR]
Copyright of Materials (1996-1944) is the property of MDPI and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
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  Data: Oxidation Performance of Nano-Layered (AlTiZrHfTa)N x /SiN x Coatings Deposited by Reactive Magnetron Sputtering.
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  Data: <searchLink fieldCode="AR" term="%22Touaibia%2C+Djallel+Eddine%22">Touaibia, Djallel Eddine</searchLink><relatesTo>1,2</relatesTo> (AUTHOR)<i> djallel_eddine.touaibia@utt.fr</i><br /><searchLink fieldCode="AR" term="%22Achache%2C+Sofiane%22">Achache, Sofiane</searchLink><relatesTo>1,2</relatesTo> (AUTHOR)<i> abdelhakim.bouissil@utt.fr</i><br /><searchLink fieldCode="AR" term="%22Bouissil%2C+Abdelhakim%22">Bouissil, Abdelhakim</searchLink><relatesTo>1,2</relatesTo> (AUTHOR)<i> fabrice.parent@utt.fr</i><br /><searchLink fieldCode="AR" term="%22Parent%2C+Fabrice%22">Parent, Fabrice</searchLink><relatesTo>1,2</relatesTo> (AUTHOR)<i> frederic.sanchette@utt.fr</i><br /><searchLink fieldCode="AR" term="%22Ghanbaja%2C+Jaafar%22">Ghanbaja, Jaafar</searchLink><relatesTo>3</relatesTo> (AUTHOR)<i> jaafar.ghanbaja@univ-lorraine.fr</i><br /><searchLink fieldCode="AR" term="%22Gorbunova%2C+Alina%22">Gorbunova, Alina</searchLink><relatesTo>4</relatesTo> (AUTHOR)<i> aag84@tpu.ru</i><br /><searchLink fieldCode="AR" term="%22Postnikov%2C+Pavel+S%2E%22">Postnikov, Pavel S.</searchLink><relatesTo>4</relatesTo> (AUTHOR)<i> pavelpostnikov@gmail.com</i><br /><searchLink fieldCode="AR" term="%22Chehimi%2C+Mohamed+Mehdi%22">Chehimi, Mohamed Mehdi</searchLink><relatesTo>5</relatesTo> (AUTHOR)<i> mmchehimi@yahoo.fr</i><br /><searchLink fieldCode="AR" term="%22Schuster%2C+Frederic%22">Schuster, Frederic</searchLink><relatesTo>6</relatesTo> (AUTHOR)<i> frederic.schuster@cea.fr</i><br /><searchLink fieldCode="AR" term="%22Sanchette%2C+Frederic%22">Sanchette, Frederic</searchLink><relatesTo>1,2</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22El+Garah%2C+Mohamed%22">El Garah, Mohamed</searchLink><relatesTo>1,2</relatesTo> (AUTHOR)<i> djallel_eddine.touaibia@utt.fr</i>
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  Data: <searchLink fieldCode="JN" term="%22Materials+%281996-1944%29%22">Materials (1996-1944)</searchLink>. Jun2024, Vol. 17 Issue 12, p2799. 21p.
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  Data: <searchLink fieldCode="DE" term="%22Reactive+sputtering%22">Reactive sputtering</searchLink><br /><searchLink fieldCode="DE" term="%22Magnetron+sputtering%22">Magnetron sputtering</searchLink><br /><searchLink fieldCode="DE" term="%22Refractory+coating%22">Refractory coating</searchLink><br /><searchLink fieldCode="DE" term="%22DC+sputtering%22">DC sputtering</searchLink><br /><searchLink fieldCode="DE" term="%22Field+emission+electron+microscopy%22">Field emission electron microscopy</searchLink>
– Name: Abstract
  Label: Abstract
  Group: Ab
  Data: This work uses the direct current magnetron sputtering (DCMS) of equi-atomic (AlTiZrHfTa) and Si targets in dynamic sweep mode to deposit nano-layered (AlTiZrHfTa)Nx/SiNx refractory high-entropy coatings (RHECs). Transmission electron microscopy (TEM), field emission scanning electron microscopy (FESEM), thermogravimetric analysis (TGA), X-ray diffraction (XRD), and X-ray photoelectron spectroscopy (XPS) are used to investigate the effect of Si addition on the oxidation behavior of the nano-layered coatings. The Si-free nitride coating exhibits FCC structure and columnar morphology, while the Si-doped nitride coatings present a FCC (AlTiZrHfTa)N/amorphous-SiNx nano-layered architecture. The hardness decreases from 24.3 ± 1.0 GPa to 17.5 ± 1.0 GPa because of the nano-layered architecture, whilst Young's modulus reduces from 188.0 ± 1.0 GPa to roughly 162.4 ± 1.0 GPa. By increasing the thickness of the SiNx nano-layer, kp values decrease significantly from 3.36 × 10−8 g2 cm−4 h−1 to 6.06 × 10−9 g2 cm−4 h−1. The activation energy increases from 90.8 kJ·mol−1 for (AlTiZrHfTa)Nx nitride coating to 126.52 kJ·mol−1 for the (AlTiZrHfTa)Nx/SiNx nano-layered coating. The formation of a FCC (AlTiZrHfTa)-Nx/a-SiNx nano-layered architecture results in the improvement of the resistance to oxidation at high temperature. [ABSTRACT FROM AUTHOR]
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  Data: <i>Copyright of Materials (1996-1944) is the property of MDPI and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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        Text: English
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