Sultana, R., Islam, K., & Chakraborty, S. (2024). Electrical Response of Al Based Zr-Doped Stacked Tri-Layer HfO2 Deposited at Various Substrate Temperature. Russian Physics Journal, 67(7), 923. https://doi.org/10.1007/s11182-024-03198-x
Chicago Style (17th ed.) CitationSultana, R., K. Islam, and S. Chakraborty. "Electrical Response of Al Based Zr-Doped Stacked Tri-Layer HfO2 Deposited at Various Substrate Temperature." Russian Physics Journal 67, no. 7 (2024): 923. https://doi.org/10.1007/s11182-024-03198-x.
MLA (9th ed.) CitationSultana, R., et al. "Electrical Response of Al Based Zr-Doped Stacked Tri-Layer HfO2 Deposited at Various Substrate Temperature." Russian Physics Journal, vol. 67, no. 7, 2024, p. 923, https://doi.org/10.1007/s11182-024-03198-x.