APA (7th ed.) Citation

Alekseevskiy, P. V., Timofeeva, M., Bachinin, S., Peignier, R., Noel, C., Boulet, P., . . . Milichko, V. A. (2024). Non-thermal plasma etching of MOF thin films in high optical quality for interference sensing. Optical Materials, 154, N.PAG. https://doi.org/10.1016/j.optmat.2024.115666

Chicago Style (17th ed.) Citation

Alekseevskiy, Pavel V., Maria Timofeeva, Semyon Bachinin, Regis Peignier, Cedric Noel, Pascal Boulet, Thierry Belmonte, and Valentin A. Milichko. "Non-thermal Plasma Etching of MOF Thin Films in High Optical Quality for Interference Sensing." Optical Materials 154 (2024): N.PAG. https://doi.org/10.1016/j.optmat.2024.115666.

MLA (9th ed.) Citation

Alekseevskiy, Pavel V., et al. "Non-thermal Plasma Etching of MOF Thin Films in High Optical Quality for Interference Sensing." Optical Materials, vol. 154, 2024, p. N.PAG, https://doi.org/10.1016/j.optmat.2024.115666.