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Non-thermal plasma etching of MOF thin films in high optical quality for interference sensing.

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Title: Non-thermal plasma etching of MOF thin films in high optical quality for interference sensing.
Authors: Alekseevskiy, Pavel V.1 (AUTHOR), Timofeeva, Maria1 (AUTHOR), Bachinin, Semyon1 (AUTHOR), Peignier, Regis2 (AUTHOR), Noel, Cedric2 (AUTHOR), Boulet, Pascal2 (AUTHOR), Belmonte, Thierry2 (AUTHOR) thierry.belmonte@univ-lorraine.fr, Milichko, Valentin A.1,2 (AUTHOR) v.milichko@metalab.ifmo.ru
Source: Optical Materials. Aug2024, Vol. 154, pN.PAG-N.PAG. 1p.
Subjects: Optical films, Plasma etching, Non-thermal plasmas, Thin films, Optical interference
Abstract: Metal–organic frameworks (MOFs) in a thin film (TF) form have appeared recently as multifunctional elements for micro- and opto-electronic devices. However, achieving the roughness of MOF TF less than 10 nm is still a challenge, which limits their further integration with the corresponding devices. Here, we report on plasma etching (PE) approach allowing one to improve the quality of MOF TF surfaces. We demonstrate that PE of a spin-coated HKUST-1 TFs with a varied thickness (1.9 to 3 μ m) and roughness (more than 200 nm) decreases the film roughness by 100 times (up to 2 nm), while the chemical composition and the structure remain. As a result, an optical quality for the TF surface can be achieved resulting to a mirror like reflectivity as well as an optical sensitivity of water through the interference effect. The obtained results, thereby, pave the way to a universal post-processing of MOF TFs for diverse applications where their roughness plays a key role. • Plasma etching of MOF films results in decrease the roughness by 100 times up to 2 nm. • An optical quality for MOF film surface corresponds to a mirror-like reflectivity. • An optical sensitivity of water via interference effect is demonstrated. [ABSTRACT FROM AUTHOR]
Copyright of Optical Materials is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
Database: Engineering Source
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Header DbId: egs
DbLabel: Engineering Source
An: 178537577
AccessLevel: 6
PubType: Academic Journal
PubTypeId: academicJournal
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  Data: Non-thermal plasma etching of MOF thin films in high optical quality for interference sensing.
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  Data: <searchLink fieldCode="AR" term="%22Alekseevskiy%2C+Pavel+V%2E%22">Alekseevskiy, Pavel V.</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Timofeeva%2C+Maria%22">Timofeeva, Maria</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Bachinin%2C+Semyon%22">Bachinin, Semyon</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Peignier%2C+Regis%22">Peignier, Regis</searchLink><relatesTo>2</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Noel%2C+Cedric%22">Noel, Cedric</searchLink><relatesTo>2</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Boulet%2C+Pascal%22">Boulet, Pascal</searchLink><relatesTo>2</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Belmonte%2C+Thierry%22">Belmonte, Thierry</searchLink><relatesTo>2</relatesTo> (AUTHOR)<i> thierry.belmonte@univ-lorraine.fr</i><br /><searchLink fieldCode="AR" term="%22Milichko%2C+Valentin+A%2E%22">Milichko, Valentin A.</searchLink><relatesTo>1,2</relatesTo> (AUTHOR)<i> v.milichko@metalab.ifmo.ru</i>
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  Data: <searchLink fieldCode="JN" term="%22Optical+Materials%22">Optical Materials</searchLink>. Aug2024, Vol. 154, pN.PAG-N.PAG. 1p.
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  Data: <searchLink fieldCode="DE" term="%22Optical+films%22">Optical films</searchLink><br /><searchLink fieldCode="DE" term="%22Plasma+etching%22">Plasma etching</searchLink><br /><searchLink fieldCode="DE" term="%22Non-thermal+plasmas%22">Non-thermal plasmas</searchLink><br /><searchLink fieldCode="DE" term="%22Thin+films%22">Thin films</searchLink><br /><searchLink fieldCode="DE" term="%22Optical+interference%22">Optical interference</searchLink>
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  Label: Abstract
  Group: Ab
  Data: Metal–organic frameworks (MOFs) in a thin film (TF) form have appeared recently as multifunctional elements for micro- and opto-electronic devices. However, achieving the roughness of MOF TF less than 10 nm is still a challenge, which limits their further integration with the corresponding devices. Here, we report on plasma etching (PE) approach allowing one to improve the quality of MOF TF surfaces. We demonstrate that PE of a spin-coated HKUST-1 TFs with a varied thickness (1.9 to 3 μ m) and roughness (more than 200 nm) decreases the film roughness by 100 times (up to 2 nm), while the chemical composition and the structure remain. As a result, an optical quality for the TF surface can be achieved resulting to a mirror like reflectivity as well as an optical sensitivity of water through the interference effect. The obtained results, thereby, pave the way to a universal post-processing of MOF TFs for diverse applications where their roughness plays a key role. • Plasma etching of MOF films results in decrease the roughness by 100 times up to 2 nm. • An optical quality for MOF film surface corresponds to a mirror-like reflectivity. • An optical sensitivity of water via interference effect is demonstrated. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of Optical Materials is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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RecordInfo BibRecord:
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      – Type: doi
        Value: 10.1016/j.optmat.2024.115666
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      – Code: eng
        Text: English
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        PageCount: 1
        StartPage: N.PAG
    Subjects:
      – SubjectFull: Optical films
        Type: general
      – SubjectFull: Plasma etching
        Type: general
      – SubjectFull: Non-thermal plasmas
        Type: general
      – SubjectFull: Thin films
        Type: general
      – SubjectFull: Optical interference
        Type: general
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      – TitleFull: Non-thermal plasma etching of MOF thin films in high optical quality for interference sensing.
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            NameFull: Alekseevskiy, Pavel V.
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            NameFull: Timofeeva, Maria
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            – D: 01
              M: 08
              Text: Aug2024
              Type: published
              Y: 2024
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              Value: 154
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