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Characterization of sputter-deposited hydrophobic chromium doped nickel alumnide coatings for mechanical and high-temperature oxidation-resistant applications.

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Title: Characterization of sputter-deposited hydrophobic chromium doped nickel alumnide coatings for mechanical and high-temperature oxidation-resistant applications.
Authors: Tiwari, Sunil Kumar1 (AUTHOR), Rao, Akula Umamaheswara2 (AUTHOR), Kharb, Archana Singh3 (AUTHOR), Chawla, Vipin4 (AUTHOR), Sardana, Neha5 (AUTHOR), Dubey, Paritosh6 (AUTHOR), Verma, Piyush Chandra7 (AUTHOR), Dubey, Sanjeev Kumar3 (AUTHOR), Avasthi, Devesh Kumar3 (AUTHOR), Chawla, Amit Kumar3 (AUTHOR) amit.phy@gmail.com
Source: Journal of Materials Science. Aug2024, Vol. 59 Issue 29, p13632-13651. 20p.
Subjects: Surface coatings, DC sputtering, Surface analysis, Substrates (Materials science), Chromium, Nickel
Abstract: Ni3Al and Cr-Ni3Al films were deposited on Inconel-718 using the DC magnetron sputtering at a substrate temperature of 400 °C. The evolution of phase, microstructure, surface topography, and mechanical properties of the deposited films have been characterized using XRD, FESEM, AFM, and nanoindentation, respectively. The results of nanoindentation showed that the hardness, modulus, and adhesive strength of the coatings increased with increase in Cr concentration in the host Ni3Al matrix. The maximum hardness and modulus of 10.62 and 150.42 GPa respectively are shown by 5.7 at% of Cr-Ni3Al films. The cyclic oxidation tests were performed at elevated temperatures of 900 °C, 1000 °C, and 1100 °C in the open-air environment to study the actual oxidation attack. The results of the test showed that the rate of oxidation in Ni3Al and Cr-Ni3Al films was low as compared to the uncoated substrate. Ni3Al film doped with 5.7 at% of Cr-Ni3Al has resulted in providing better protection to the substrate against oxidation attacks. The surface morphology and elemental composition of the oxidized samples were investigated using FESEM and EDS to elucidate the surface scale analysis and mechanism of oxidation due to the formation of different oxide layers. [ABSTRACT FROM AUTHOR]
Copyright of Journal of Materials Science is the property of Springer Nature and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
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  Data: Characterization of sputter-deposited hydrophobic chromium doped nickel alumnide coatings for mechanical and high-temperature oxidation-resistant applications.
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+Materials+Science%22">Journal of Materials Science</searchLink>. Aug2024, Vol. 59 Issue 29, p13632-13651. 20p.
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  Data: <searchLink fieldCode="DE" term="%22Surface+coatings%22">Surface coatings</searchLink><br /><searchLink fieldCode="DE" term="%22DC+sputtering%22">DC sputtering</searchLink><br /><searchLink fieldCode="DE" term="%22Surface+analysis%22">Surface analysis</searchLink><br /><searchLink fieldCode="DE" term="%22Substrates+%28Materials+science%29%22">Substrates (Materials science)</searchLink><br /><searchLink fieldCode="DE" term="%22Chromium%22">Chromium</searchLink><br /><searchLink fieldCode="DE" term="%22Nickel%22">Nickel</searchLink>
– Name: Abstract
  Label: Abstract
  Group: Ab
  Data: Ni3Al and Cr-Ni3Al films were deposited on Inconel-718 using the DC magnetron sputtering at a substrate temperature of 400 °C. The evolution of phase, microstructure, surface topography, and mechanical properties of the deposited films have been characterized using XRD, FESEM, AFM, and nanoindentation, respectively. The results of nanoindentation showed that the hardness, modulus, and adhesive strength of the coatings increased with increase in Cr concentration in the host Ni3Al matrix. The maximum hardness and modulus of 10.62 and 150.42 GPa respectively are shown by 5.7 at% of Cr-Ni3Al films. The cyclic oxidation tests were performed at elevated temperatures of 900 °C, 1000 °C, and 1100 °C in the open-air environment to study the actual oxidation attack. The results of the test showed that the rate of oxidation in Ni3Al and Cr-Ni3Al films was low as compared to the uncoated substrate. Ni3Al film doped with 5.7 at% of Cr-Ni3Al has resulted in providing better protection to the substrate against oxidation attacks. The surface morphology and elemental composition of the oxidized samples were investigated using FESEM and EDS to elucidate the surface scale analysis and mechanism of oxidation due to the formation of different oxide layers. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of Journal of Materials Science is the property of Springer Nature and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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      – Type: doi
        Value: 10.1007/s10853-024-10002-1
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      – Code: eng
        Text: English
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        PageCount: 20
        StartPage: 13632
    Subjects:
      – SubjectFull: Surface coatings
        Type: general
      – SubjectFull: DC sputtering
        Type: general
      – SubjectFull: Surface analysis
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      – SubjectFull: Chromium
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      – SubjectFull: Nickel
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      – TitleFull: Characterization of sputter-deposited hydrophobic chromium doped nickel alumnide coatings for mechanical and high-temperature oxidation-resistant applications.
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            – D: 01
              M: 08
              Text: Aug2024
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