Microstructure Evolution of the Interface in SiC f /TiC-Ti 3 SiC 2 Composite under Sequential Xe-He-H Ion Irradiation and Annealing Process.
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| Title: | Microstructure Evolution of the Interface in SiC f /TiC-Ti 3 SiC 2 Composite under Sequential Xe-He-H Ion Irradiation and Annealing Process. |
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| Authors: | Lei, Penghui1 (AUTHOR) penghuilei@xjtu.edu.cn, Chang, Qing2,3 (AUTHOR) changqing@mail.nwpu.edu.cn, Xiao, Mingkun2,3 (AUTHOR) xiaomingkun@mail.nwpu.edu.cn, Ye, Chao2,3 (AUTHOR) yechao@nwpu.edu.cn, Qi, Pan4 (AUTHOR) qipan@cnnp.com.cn, Shi, Fangjie5 (AUTHOR) fangjie158@163.com, Hang, Yuhua5 (AUTHOR) hangyuhua@163.com, Li, Qianwu5 (AUTHOR) l1192177798@163.com, Peng, Qing6,7,8 (AUTHOR) yechao@nwpu.edu.cn |
| Source: | Nanomaterials (2079-4991). Oct2024, Vol. 14 Issue 20, p1629. 11p. |
| Subjects: | Discontinuous precipitation, Transmission electron microscopy, Free surfaces, Amorphization, Ions |
| Abstract: | A new type of SiCf/TiC-Ti3SiC2 composite was prepared by the Spark Plasma Sintering (SPS) method in this work. The phase transformation and interface cracking of this composite under ion irradiation (single Xe, Xe + He, and Xe + He + H ions) and subsequent annealing were analyzed using transmission electron microscopy (TEM), mainly focusing on the interface regions. Xe ion irradiation resulted in the formation of high-density stacking faults in the TiC coatings and the complete amorphization of SiC fibers. The implanted H ions exacerbated interface coarsening. After annealing at 900 °C for 2 h, the interface in the Xe + He + H ion-irradiated samples was seriously damaged, resulting in the formation of large bubbles and cracks. This damage occurred because the H atoms reduced the surface free energy, thereby promoting the nucleation and growth of bubbles. Due to the absorption effect of the SiCf/TiC interface on defects, the SiC fiber areas near the interface recovered back to the initial nano-polycrystalline structure after annealing. [ABSTRACT FROM AUTHOR] |
| Copyright of Nanomaterials (2079-4991) is the property of MDPI and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.) | |
| Database: | Engineering Source |
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| Header | DbId: egs DbLabel: Engineering Source An: 180525294 AccessLevel: 6 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| Items | – Name: Title Label: Title Group: Ti Data: Microstructure Evolution of the Interface in SiC f /TiC-Ti 3 SiC 2 Composite under Sequential Xe-He-H Ion Irradiation and Annealing Process. – Name: Author Label: Authors Group: Au Data: <searchLink fieldCode="AR" term="%22Lei%2C+Penghui%22">Lei, Penghui</searchLink><relatesTo>1</relatesTo> (AUTHOR)<i> penghuilei@xjtu.edu.cn</i><br /><searchLink fieldCode="AR" term="%22Chang%2C+Qing%22">Chang, Qing</searchLink><relatesTo>2,3</relatesTo> (AUTHOR)<i> changqing@mail.nwpu.edu.cn</i><br /><searchLink fieldCode="AR" term="%22Xiao%2C+Mingkun%22">Xiao, Mingkun</searchLink><relatesTo>2,3</relatesTo> (AUTHOR)<i> xiaomingkun@mail.nwpu.edu.cn</i><br /><searchLink fieldCode="AR" term="%22Ye%2C+Chao%22">Ye, Chao</searchLink><relatesTo>2,3</relatesTo> (AUTHOR)<i> yechao@nwpu.edu.cn</i><br /><searchLink fieldCode="AR" term="%22Qi%2C+Pan%22">Qi, Pan</searchLink><relatesTo>4</relatesTo> (AUTHOR)<i> qipan@cnnp.com.cn</i><br /><searchLink fieldCode="AR" term="%22Shi%2C+Fangjie%22">Shi, Fangjie</searchLink><relatesTo>5</relatesTo> (AUTHOR)<i> fangjie158@163.com</i><br /><searchLink fieldCode="AR" term="%22Hang%2C+Yuhua%22">Hang, Yuhua</searchLink><relatesTo>5</relatesTo> (AUTHOR)<i> hangyuhua@163.com</i><br /><searchLink fieldCode="AR" term="%22Li%2C+Qianwu%22">Li, Qianwu</searchLink><relatesTo>5</relatesTo> (AUTHOR)<i> l1192177798@163.com</i><br /><searchLink fieldCode="AR" term="%22Peng%2C+Qing%22">Peng, Qing</searchLink><relatesTo>6,7,8</relatesTo> (AUTHOR)<i> yechao@nwpu.edu.cn</i> – Name: TitleSource Label: Source Group: Src Data: <searchLink fieldCode="JN" term="%22Nanomaterials+%282079-4991%29%22">Nanomaterials (2079-4991)</searchLink>. Oct2024, Vol. 14 Issue 20, p1629. 11p. – Name: Subject Label: Subjects Group: Su Data: <searchLink fieldCode="DE" term="%22Discontinuous+precipitation%22">Discontinuous precipitation</searchLink><br /><searchLink fieldCode="DE" term="%22Transmission+electron+microscopy%22">Transmission electron microscopy</searchLink><br /><searchLink fieldCode="DE" term="%22Free+surfaces%22">Free surfaces</searchLink><br /><searchLink fieldCode="DE" term="%22Amorphization%22">Amorphization</searchLink><br /><searchLink fieldCode="DE" term="%22Ions%22">Ions</searchLink> – Name: Abstract Label: Abstract Group: Ab Data: A new type of SiCf/TiC-Ti3SiC2 composite was prepared by the Spark Plasma Sintering (SPS) method in this work. The phase transformation and interface cracking of this composite under ion irradiation (single Xe, Xe + He, and Xe + He + H ions) and subsequent annealing were analyzed using transmission electron microscopy (TEM), mainly focusing on the interface regions. Xe ion irradiation resulted in the formation of high-density stacking faults in the TiC coatings and the complete amorphization of SiC fibers. The implanted H ions exacerbated interface coarsening. After annealing at 900 °C for 2 h, the interface in the Xe + He + H ion-irradiated samples was seriously damaged, resulting in the formation of large bubbles and cracks. This damage occurred because the H atoms reduced the surface free energy, thereby promoting the nucleation and growth of bubbles. Due to the absorption effect of the SiCf/TiC interface on defects, the SiC fiber areas near the interface recovered back to the initial nano-polycrystalline structure after annealing. [ABSTRACT FROM AUTHOR] – Name: AbstractSuppliedCopyright Label: Group: Ab Data: <i>Copyright of Nanomaterials (2079-4991) is the property of MDPI and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.) |
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| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.3390/nano14201629 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 11 StartPage: 1629 Subjects: – SubjectFull: Discontinuous precipitation Type: general – SubjectFull: Transmission electron microscopy Type: general – SubjectFull: Free surfaces Type: general – SubjectFull: Amorphization Type: general – SubjectFull: Ions Type: general Titles: – TitleFull: Microstructure Evolution of the Interface in SiC f /TiC-Ti 3 SiC 2 Composite under Sequential Xe-He-H Ion Irradiation and Annealing Process. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Lei, Penghui – PersonEntity: Name: NameFull: Chang, Qing – PersonEntity: Name: NameFull: Xiao, Mingkun – PersonEntity: Name: NameFull: Ye, Chao – PersonEntity: Name: NameFull: Qi, Pan – PersonEntity: Name: NameFull: Shi, Fangjie – PersonEntity: Name: NameFull: Hang, Yuhua – PersonEntity: Name: NameFull: Li, Qianwu – PersonEntity: Name: NameFull: Peng, Qing IsPartOfRelationships: – BibEntity: Dates: – D: 15 M: 10 Text: Oct2024 Type: published Y: 2024 Identifiers: – Type: issn-print Value: 20794991 Numbering: – Type: volume Value: 14 – Type: issue Value: 20 Titles: – TitleFull: Nanomaterials (2079-4991) Type: main |
| ResultId | 1 |