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Optimization of Soft X-Ray Fresnel Zone Plate Fabrication Through Joint Electron Beam Lithography and Cryo-Etching Techniques.

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Title: Optimization of Soft X-Ray Fresnel Zone Plate Fabrication Through Joint Electron Beam Lithography and Cryo-Etching Techniques.
Authors: Labani, Maha1 (AUTHOR) idu018684@usal.es, Clericò, Vito1 (AUTHOR), Diez, Enrique1 (AUTHOR), Gatti, Giancarlo2 (AUTHOR), Amado, Mario1,3 (AUTHOR), Pérez-Rodríguez, Ana1 (AUTHOR) perez.rodriguez.ana@usal.es
Source: Nanomaterials (2079-4991). Dec2024, Vol. 14 Issue 23, p1898. 22p.
Subjects: Electron beam lithography, Soft X rays, Optical resolution, Chromium, Photons
Abstract: The ability to manufacture complex 3D structures with nanometer-scale resolution, such as Fresnel Zone Plates (FZPs), is crucial to achieve state-of-the-art control in X-ray sources for use in a diverse range of cutting-edge applications. This study demonstrates a novel approach combining Electron Beam Lithography (EBL) and cryoetching to produce silicon-based FZP prototypes as a test bench to assess the strong points and limitations of this fabrication method. Through this method, we obtained FZPs with 100 zones, a diameter of 20 µm, and an outermost zone width of 50 nm, resulting in a high aspect ratio that is suitable for use across a range of photon energies. The process incorporates a chromium mask in the EBL stage, enhancing microstructure precision and mitigating pattern collapse challenges. This minimized issues of under- and over-etching, producing well-defined patterns with a nanometer-scale resolution and low roughness. The refined process thus holds promise for achieving improved optical resolution and efficiency in FZPs, making it viable for the fabrication of high-performance, nanometer-scale devices. [ABSTRACT FROM AUTHOR]
Copyright of Nanomaterials (2079-4991) is the property of MDPI and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
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  Data: Optimization of Soft X-Ray Fresnel Zone Plate Fabrication Through Joint Electron Beam Lithography and Cryo-Etching Techniques.
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  Data: <searchLink fieldCode="JN" term="%22Nanomaterials+%282079-4991%29%22">Nanomaterials (2079-4991)</searchLink>. Dec2024, Vol. 14 Issue 23, p1898. 22p.
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  Data: <searchLink fieldCode="DE" term="%22Electron+beam+lithography%22">Electron beam lithography</searchLink><br /><searchLink fieldCode="DE" term="%22Soft+X+rays%22">Soft X rays</searchLink><br /><searchLink fieldCode="DE" term="%22Optical+resolution%22">Optical resolution</searchLink><br /><searchLink fieldCode="DE" term="%22Chromium%22">Chromium</searchLink><br /><searchLink fieldCode="DE" term="%22Photons%22">Photons</searchLink>
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  Data: The ability to manufacture complex 3D structures with nanometer-scale resolution, such as Fresnel Zone Plates (FZPs), is crucial to achieve state-of-the-art control in X-ray sources for use in a diverse range of cutting-edge applications. This study demonstrates a novel approach combining Electron Beam Lithography (EBL) and cryoetching to produce silicon-based FZP prototypes as a test bench to assess the strong points and limitations of this fabrication method. Through this method, we obtained FZPs with 100 zones, a diameter of 20 µm, and an outermost zone width of 50 nm, resulting in a high aspect ratio that is suitable for use across a range of photon energies. The process incorporates a chromium mask in the EBL stage, enhancing microstructure precision and mitigating pattern collapse challenges. This minimized issues of under- and over-etching, producing well-defined patterns with a nanometer-scale resolution and low roughness. The refined process thus holds promise for achieving improved optical resolution and efficiency in FZPs, making it viable for the fabrication of high-performance, nanometer-scale devices. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of Nanomaterials (2079-4991) is the property of MDPI and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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        Value: 10.3390/nano14231898
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        Text: English
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        PageCount: 22
        StartPage: 1898
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      – SubjectFull: Electron beam lithography
        Type: general
      – SubjectFull: Soft X rays
        Type: general
      – SubjectFull: Optical resolution
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      – SubjectFull: Chromium
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      – SubjectFull: Photons
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      – TitleFull: Optimization of Soft X-Ray Fresnel Zone Plate Fabrication Through Joint Electron Beam Lithography and Cryo-Etching Techniques.
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            NameFull: Labani, Maha
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            NameFull: Clericò, Vito
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            – D: 01
              M: 12
              Text: Dec2024
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              Y: 2024
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