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Refractory high entropy TiTaZrHfW-N/Si3N4 nano-layered alloy thin film's oxidation resistance.

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Title: Refractory high entropy TiTaZrHfW-N/Si3N4 nano-layered alloy thin film's oxidation resistance.
Authors: Bouissil, Abdelhakim1,2 (AUTHOR) abdelhakim.bouissil@utt.fr, Achache, Sofiane1,2 (AUTHOR), Touaibia, Djallel Eddine1,2 (AUTHOR), Ghanbaga, Jaafar3 (AUTHOR), Postnikov, Pavel S.4 (AUTHOR), Chehimi, Mohamed M.5 (AUTHOR), Panicaud, Benoit6 (AUTHOR), Parent, Fabrice1,2 (AUTHOR), Sanchette, Frederic1,2 (AUTHOR), El Garah, Mohamed1,2 (AUTHOR) mohamed.el_garah@utt.fr
Source: Journal of Alloys & Compounds. Jan2025, Vol. 1010, pN.PAG-N.PAG. 1p.
Subjects: Magnetron sputtering, Thin films, Reactive sputtering, High temperatures, Thermal stability
Abstract: Refractory high entropy TiTaZrHfW-N/Si 3 -N 4 nano-layered alloy thin films are investigated to study the effect of nano-layered architecture and silicon (Si) mean content on their structural, mechanical, thermal properties and oxidation behavior. The films are deposited using direct current (DC) magnetron sputtering of separate Si and TiTaZrHfW targets. The Si mean content is controlled by tailoring the power discharge applied to the Si target. The deposition process led to a nano-layered architecture where Si 3 N 4 (amorphous) and TiTaZrHfW-N (nano-crystalized NaCl FCC type structure) are alternated. By increasing the thickness of Si 3 N 4 nano-layers, the Si mean content increases. All coatings are found to have good thermal stability after annealing under vacuum at 900 °C. Increasing Si mean content reduces the film's hardness; however, the annealing treatment at 900 °C improves it. A super-hardness of 41 GPa is found for the post-annealed Si-free film. Si 3 N 4 nano-layers enhance the oxidation resistance at elevated temperatures of 600, 700, and 800 °C. This oxidation resistance is further enhanced by increasing the nano-layer's period and also by increasing the density of the films. [Display omitted] • Refractory high entropy TiTaZrHfW-N/Si 3 -N 4 nanolayered thin films deposited by reactive magnetron sputtering. • Effect of Si alloying on TiTaZrHfW(-N) properties. • Nanolayered architecture structure alternating Si 3 N 4 (amorphous) and TiTaZrHfW-N (nano-crystalized NaCl FCC). • Si 3 N 4 nano-layers enhance oxidation resistance at elevated temperatures (600, 700, and 800 °C). • Oxidation resistance further improves with increased nano-layers period and film density. [ABSTRACT FROM AUTHOR]
Copyright of Journal of Alloys & Compounds is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
Database: Engineering Source
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Header DbId: egs
DbLabel: Engineering Source
An: 182184320
AccessLevel: 6
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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Items – Name: Title
  Label: Title
  Group: Ti
  Data: Refractory high entropy TiTaZrHfW-N/Si3N4 nano-layered alloy thin film's oxidation resistance.
– Name: Author
  Label: Authors
  Group: Au
  Data: <searchLink fieldCode="AR" term="%22Bouissil%2C+Abdelhakim%22">Bouissil, Abdelhakim</searchLink><relatesTo>1,2</relatesTo> (AUTHOR)<i> abdelhakim.bouissil@utt.fr</i><br /><searchLink fieldCode="AR" term="%22Achache%2C+Sofiane%22">Achache, Sofiane</searchLink><relatesTo>1,2</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Touaibia%2C+Djallel+Eddine%22">Touaibia, Djallel Eddine</searchLink><relatesTo>1,2</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Ghanbaga%2C+Jaafar%22">Ghanbaga, Jaafar</searchLink><relatesTo>3</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Postnikov%2C+Pavel+S%2E%22">Postnikov, Pavel S.</searchLink><relatesTo>4</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Chehimi%2C+Mohamed+M%2E%22">Chehimi, Mohamed M.</searchLink><relatesTo>5</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Panicaud%2C+Benoit%22">Panicaud, Benoit</searchLink><relatesTo>6</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Parent%2C+Fabrice%22">Parent, Fabrice</searchLink><relatesTo>1,2</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Sanchette%2C+Frederic%22">Sanchette, Frederic</searchLink><relatesTo>1,2</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22El+Garah%2C+Mohamed%22">El Garah, Mohamed</searchLink><relatesTo>1,2</relatesTo> (AUTHOR)<i> mohamed.el_garah@utt.fr</i>
– Name: TitleSource
  Label: Source
  Group: Src
  Data: <searchLink fieldCode="JN" term="%22Journal+of+Alloys+%26+Compounds%22">Journal of Alloys & Compounds</searchLink>. Jan2025, Vol. 1010, pN.PAG-N.PAG. 1p.
– Name: Subject
  Label: Subjects
  Group: Su
  Data: <searchLink fieldCode="DE" term="%22Magnetron+sputtering%22">Magnetron sputtering</searchLink><br /><searchLink fieldCode="DE" term="%22Thin+films%22">Thin films</searchLink><br /><searchLink fieldCode="DE" term="%22Reactive+sputtering%22">Reactive sputtering</searchLink><br /><searchLink fieldCode="DE" term="%22High+temperatures%22">High temperatures</searchLink><br /><searchLink fieldCode="DE" term="%22Thermal+stability%22">Thermal stability</searchLink>
– Name: Abstract
  Label: Abstract
  Group: Ab
  Data: Refractory high entropy TiTaZrHfW-N/Si 3 -N 4 nano-layered alloy thin films are investigated to study the effect of nano-layered architecture and silicon (Si) mean content on their structural, mechanical, thermal properties and oxidation behavior. The films are deposited using direct current (DC) magnetron sputtering of separate Si and TiTaZrHfW targets. The Si mean content is controlled by tailoring the power discharge applied to the Si target. The deposition process led to a nano-layered architecture where Si 3 N 4 (amorphous) and TiTaZrHfW-N (nano-crystalized NaCl FCC type structure) are alternated. By increasing the thickness of Si 3 N 4 nano-layers, the Si mean content increases. All coatings are found to have good thermal stability after annealing under vacuum at 900 °C. Increasing Si mean content reduces the film's hardness; however, the annealing treatment at 900 °C improves it. A super-hardness of 41 GPa is found for the post-annealed Si-free film. Si 3 N 4 nano-layers enhance the oxidation resistance at elevated temperatures of 600, 700, and 800 °C. This oxidation resistance is further enhanced by increasing the nano-layer's period and also by increasing the density of the films. [Display omitted] • Refractory high entropy TiTaZrHfW-N/Si 3 -N 4 nanolayered thin films deposited by reactive magnetron sputtering. • Effect of Si alloying on TiTaZrHfW(-N) properties. • Nanolayered architecture structure alternating Si 3 N 4 (amorphous) and TiTaZrHfW-N (nano-crystalized NaCl FCC). • Si 3 N 4 nano-layers enhance oxidation resistance at elevated temperatures (600, 700, and 800 °C). • Oxidation resistance further improves with increased nano-layers period and film density. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of Journal of Alloys & Compounds is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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RecordInfo BibRecord:
  BibEntity:
    Identifiers:
      – Type: doi
        Value: 10.1016/j.jallcom.2024.177046
    Languages:
      – Code: eng
        Text: English
    PhysicalDescription:
      Pagination:
        PageCount: 1
        StartPage: N.PAG
    Subjects:
      – SubjectFull: Magnetron sputtering
        Type: general
      – SubjectFull: Thin films
        Type: general
      – SubjectFull: Reactive sputtering
        Type: general
      – SubjectFull: High temperatures
        Type: general
      – SubjectFull: Thermal stability
        Type: general
    Titles:
      – TitleFull: Refractory high entropy TiTaZrHfW-N/Si3N4 nano-layered alloy thin film's oxidation resistance.
        Type: main
  BibRelationships:
    HasContributorRelationships:
      – PersonEntity:
          Name:
            NameFull: Bouissil, Abdelhakim
      – PersonEntity:
          Name:
            NameFull: Achache, Sofiane
      – PersonEntity:
          Name:
            NameFull: Touaibia, Djallel Eddine
      – PersonEntity:
          Name:
            NameFull: Ghanbaga, Jaafar
      – PersonEntity:
          Name:
            NameFull: Postnikov, Pavel S.
      – PersonEntity:
          Name:
            NameFull: Chehimi, Mohamed M.
      – PersonEntity:
          Name:
            NameFull: Panicaud, Benoit
      – PersonEntity:
          Name:
            NameFull: Parent, Fabrice
      – PersonEntity:
          Name:
            NameFull: Sanchette, Frederic
      – PersonEntity:
          Name:
            NameFull: El Garah, Mohamed
    IsPartOfRelationships:
      – BibEntity:
          Dates:
            – D: 05
              M: 01
              Text: Jan2025
              Type: published
              Y: 2025
          Identifiers:
            – Type: issn-print
              Value: 09258388
          Numbering:
            – Type: volume
              Value: 1010
          Titles:
            – TitleFull: Journal of Alloys & Compounds
              Type: main
ResultId 1