Magnetron sputtering in membrane fabrication and modification: Applications in gas and water treatment.

Saved in:
Bibliographic Details
Title: Magnetron sputtering in membrane fabrication and modification: Applications in gas and water treatment.
Authors: Delkhosh, Fatemeh1 (AUTHOR), Qotbi, Armaghan2 (AUTHOR), Hossein Behroozi, Amir3 (AUTHOR), Vatanpour, Vahid1,4,5 (AUTHOR) vahidvatanpour@khu.ac.ir
Source: Journal of Industrial & Engineering Chemistry. Mar2025, Vol. 143, p85-108. 24p.
Subjects: Magnetron sputtering, Water purification, Thin films, Separation of gases, Crystal structure
Abstract: [Display omitted] Magnetron-sputtered membranes have been an interesting candidate for water and gas treatment applications because of their controllable thickness, chemical compositions, crystalline structure, and other surface properties. Using magnetron sputtering (MS) as a reproducible and scalable deposition technique, membranes can be directed fabricated or modified through deposition of a thin layer on a support layer. The fundamental concepts, detailed processing mechanism, and various types of this technique are first outlined. Then, the applications of this technique in depositing thin films, mainly originating from polymers, metal(loid)s, oxides, and carbon, on membrane supports are briefly discussed. The next focus is on recent progress in this field by reporting the performance of MS-based developed membranes in both water and gas treatment processes, which provides a comparative study in terms of filtration efficiency. Finally, the current challenges and future directions are briefly provided for the development of next-generation magnetron-sputtered membranes. [ABSTRACT FROM AUTHOR]
Copyright of Journal of Industrial & Engineering Chemistry is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
Database: Engineering Source
Description
Abstract:[Display omitted] Magnetron-sputtered membranes have been an interesting candidate for water and gas treatment applications because of their controllable thickness, chemical compositions, crystalline structure, and other surface properties. Using magnetron sputtering (MS) as a reproducible and scalable deposition technique, membranes can be directed fabricated or modified through deposition of a thin layer on a support layer. The fundamental concepts, detailed processing mechanism, and various types of this technique are first outlined. Then, the applications of this technique in depositing thin films, mainly originating from polymers, metal(loid)s, oxides, and carbon, on membrane supports are briefly discussed. The next focus is on recent progress in this field by reporting the performance of MS-based developed membranes in both water and gas treatment processes, which provides a comparative study in terms of filtration efficiency. Finally, the current challenges and future directions are briefly provided for the development of next-generation magnetron-sputtered membranes. [ABSTRACT FROM AUTHOR]
ISSN:1226086X
DOI:10.1016/j.jiec.2024.08.052