Magnetron sputtering in membrane fabrication and modification: Applications in gas and water treatment.

Saved in:
Bibliographic Details
Title: Magnetron sputtering in membrane fabrication and modification: Applications in gas and water treatment.
Authors: Delkhosh, Fatemeh1 (AUTHOR), Qotbi, Armaghan2 (AUTHOR), Hossein Behroozi, Amir3 (AUTHOR), Vatanpour, Vahid1,4,5 (AUTHOR) vahidvatanpour@khu.ac.ir
Source: Journal of Industrial & Engineering Chemistry. Mar2025, Vol. 143, p85-108. 24p.
Subjects: Magnetron sputtering, Water purification, Thin films, Separation of gases, Crystal structure
Abstract: [Display omitted] Magnetron-sputtered membranes have been an interesting candidate for water and gas treatment applications because of their controllable thickness, chemical compositions, crystalline structure, and other surface properties. Using magnetron sputtering (MS) as a reproducible and scalable deposition technique, membranes can be directed fabricated or modified through deposition of a thin layer on a support layer. The fundamental concepts, detailed processing mechanism, and various types of this technique are first outlined. Then, the applications of this technique in depositing thin films, mainly originating from polymers, metal(loid)s, oxides, and carbon, on membrane supports are briefly discussed. The next focus is on recent progress in this field by reporting the performance of MS-based developed membranes in both water and gas treatment processes, which provides a comparative study in terms of filtration efficiency. Finally, the current challenges and future directions are briefly provided for the development of next-generation magnetron-sputtered membranes. [ABSTRACT FROM AUTHOR]
Copyright of Journal of Industrial & Engineering Chemistry is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
Database: Engineering Source
FullText Text:
  Availability: 0
Header DbId: egs
DbLabel: Engineering Source
An: 182216981
AccessLevel: 6
PubType: Periodical
PubTypeId: serialPeriodical
PreciseRelevancyScore: 0
IllustrationInfo
Items – Name: Title
  Label: Title
  Group: Ti
  Data: Magnetron sputtering in membrane fabrication and modification: Applications in gas and water treatment.
– Name: Author
  Label: Authors
  Group: Au
  Data: <searchLink fieldCode="AR" term="%22Delkhosh%2C+Fatemeh%22">Delkhosh, Fatemeh</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Qotbi%2C+Armaghan%22">Qotbi, Armaghan</searchLink><relatesTo>2</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Hossein+Behroozi%2C+Amir%22">Hossein Behroozi, Amir</searchLink><relatesTo>3</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Vatanpour%2C+Vahid%22">Vatanpour, Vahid</searchLink><relatesTo>1,4,5</relatesTo> (AUTHOR)<i> vahidvatanpour@khu.ac.ir</i>
– Name: TitleSource
  Label: Source
  Group: Src
  Data: <searchLink fieldCode="JN" term="%22Journal+of+Industrial+%26+Engineering+Chemistry%22">Journal of Industrial & Engineering Chemistry</searchLink>. Mar2025, Vol. 143, p85-108. 24p.
– Name: Subject
  Label: Subjects
  Group: Su
  Data: <searchLink fieldCode="DE" term="%22Magnetron+sputtering%22">Magnetron sputtering</searchLink><br /><searchLink fieldCode="DE" term="%22Water+purification%22">Water purification</searchLink><br /><searchLink fieldCode="DE" term="%22Thin+films%22">Thin films</searchLink><br /><searchLink fieldCode="DE" term="%22Separation+of+gases%22">Separation of gases</searchLink><br /><searchLink fieldCode="DE" term="%22Crystal+structure%22">Crystal structure</searchLink>
– Name: Abstract
  Label: Abstract
  Group: Ab
  Data: [Display omitted] Magnetron-sputtered membranes have been an interesting candidate for water and gas treatment applications because of their controllable thickness, chemical compositions, crystalline structure, and other surface properties. Using magnetron sputtering (MS) as a reproducible and scalable deposition technique, membranes can be directed fabricated or modified through deposition of a thin layer on a support layer. The fundamental concepts, detailed processing mechanism, and various types of this technique are first outlined. Then, the applications of this technique in depositing thin films, mainly originating from polymers, metal(loid)s, oxides, and carbon, on membrane supports are briefly discussed. The next focus is on recent progress in this field by reporting the performance of MS-based developed membranes in both water and gas treatment processes, which provides a comparative study in terms of filtration efficiency. Finally, the current challenges and future directions are briefly provided for the development of next-generation magnetron-sputtered membranes. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of Journal of Industrial & Engineering Chemistry is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=egs&AN=182216981
RecordInfo BibRecord:
  BibEntity:
    Identifiers:
      – Type: doi
        Value: 10.1016/j.jiec.2024.08.052
    Languages:
      – Code: eng
        Text: English
    PhysicalDescription:
      Pagination:
        PageCount: 24
        StartPage: 85
    Subjects:
      – SubjectFull: Magnetron sputtering
        Type: general
      – SubjectFull: Water purification
        Type: general
      – SubjectFull: Thin films
        Type: general
      – SubjectFull: Separation of gases
        Type: general
      – SubjectFull: Crystal structure
        Type: general
    Titles:
      – TitleFull: Magnetron sputtering in membrane fabrication and modification: Applications in gas and water treatment.
        Type: main
  BibRelationships:
    HasContributorRelationships:
      – PersonEntity:
          Name:
            NameFull: Delkhosh, Fatemeh
      – PersonEntity:
          Name:
            NameFull: Qotbi, Armaghan
      – PersonEntity:
          Name:
            NameFull: Hossein Behroozi, Amir
      – PersonEntity:
          Name:
            NameFull: Vatanpour, Vahid
    IsPartOfRelationships:
      – BibEntity:
          Dates:
            – D: 25
              M: 03
              Text: Mar2025
              Type: published
              Y: 2025
          Identifiers:
            – Type: issn-print
              Value: 1226086X
          Numbering:
            – Type: volume
              Value: 143
          Titles:
            – TitleFull: Journal of Industrial & Engineering Chemistry
              Type: main
ResultId 1