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Features of Interlayer Interfaces in Transparent Conducting Oxide/Metal/Oxide Trilayer Structures.

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Title: Features of Interlayer Interfaces in Transparent Conducting Oxide/Metal/Oxide Trilayer Structures.
Authors: Asvarov, A. Sh.1,2 (AUTHOR) abil-as@list.ru, Akhmedov, A. K.2 (AUTHOR), Murliev, E. K.2 (AUTHOR), Abduev, A. Kh.3 (AUTHOR), Kanevsky, V. M.1 (AUTHOR)
Source: Crystallography Reports. Dec2024, Vol. 69 Issue 7, p1144-1149. 6p.
Subjects: Radiofrequency sputtering, Transmission electron microscopy, Metallic oxides, Magnetron sputtering, X-ray spectroscopy
Abstract: A comparative study of the growth processes, microstructures, and electrical characteristics of oxide/metal/oxide trilayer structures of different compositions synthesized at 50°C by rf magnetron sputtering in argon has been performed. The effect of subsequent annealing in an open atmosphere on the conductivity of the structures has been investigated. Transmission electron microscopy and energy-dispersive X-ray spectroscopy have been used to examine changes in the microstructure and profiles of distribution of chemical elements included in the structures under annealing. Based on the results obtained, mechanisms have been proposed for the transformation of interlayer interfaces and conditions of carrier transport in the structures, depending on the composition of the oxide and metallic layers comprising them. [ABSTRACT FROM AUTHOR]
Copyright of Crystallography Reports is the property of Springer Nature and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
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  Data: Features of Interlayer Interfaces in Transparent Conducting Oxide/Metal/Oxide Trilayer Structures.
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  Data: A comparative study of the growth processes, microstructures, and electrical characteristics of oxide/metal/oxide trilayer structures of different compositions synthesized at 50°C by rf magnetron sputtering in argon has been performed. The effect of subsequent annealing in an open atmosphere on the conductivity of the structures has been investigated. Transmission electron microscopy and energy-dispersive X-ray spectroscopy have been used to examine changes in the microstructure and profiles of distribution of chemical elements included in the structures under annealing. Based on the results obtained, mechanisms have been proposed for the transformation of interlayer interfaces and conditions of carrier transport in the structures, depending on the composition of the oxide and metallic layers comprising them. [ABSTRACT FROM AUTHOR]
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  Data: <i>Copyright of Crystallography Reports is the property of Springer Nature and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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