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Substrate Bias-Driven Structural and Mechanical Evolution of AlCrN and AlCrSiN Coatings via Reactive Magnetron Sputtering.

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Title: Substrate Bias-Driven Structural and Mechanical Evolution of AlCrN and AlCrSiN Coatings via Reactive Magnetron Sputtering.
Authors: Tsai, Du-Cheng1 (AUTHOR), Huang, Rong-Hsin2 (AUTHOR), Chang, Zue-Chin3 (AUTHOR) chang@ncut.edu.tw, Chen, Erh-Chiang1,4 (AUTHOR), Huang, Yen-Lin1,4 (AUTHOR), Shieu, Fuh-Sheng1,2 (AUTHOR)
Source: Materials (1996-1944). Apr2025, Vol. 18 Issue 7, p1671. 19p.
Subjects: Substrates (Materials science), Reactive sputtering, Magnetron sputtering, Radio frequency, Grain refinement
Abstract: AlCrN and AlCrSiN coatings were deposited via reactive magnetron sputtering. This study investigates the effects of radio frequency (RF) substrate bias, ranging from 0 V to 200 V, on the chemical composition, microstructure, and mechanical properties of the coatings. All crystalline coatings exhibited a single wurtzite-type hexagonal close-packed (hcp) structure. At a 0 V substrate bias, the AlCrN coating consisted of porous V-shaped columnar crystallites, while the AlCrSiN coating exhibited a porous, fiber-like amorphous structure. As the substrate bias increased, crystal growth was promoted, void density decreased, and the surface morphology transitioned from a textured to a more rounded appearance. Additionally, the preferred orientation shifted toward the (101) direction. However, at excessively high substrate bias, re-nucleation occurred, leading to grain refinement and increased film densification, which in turn caused a further shift in the preferred orientation toward the (002) plane. Due to its multi-element composition and the low solubility of Si in nitrides, AlCrSiN coatings tend to exhibit an amorphous growth tendency during sputtering. As a result, their microstructure is more sensitive to substrate bias. This sensitivity results in the formation of a highly dense structure with an optimal crystallite size at a substrate bias of 100 V, leading to a hardness of 22.6 GPa—surpassing that of the AlCrN coating. [ABSTRACT FROM AUTHOR]
Copyright of Materials (1996-1944) is the property of MDPI and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
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  Label: Title
  Group: Ti
  Data: Substrate Bias-Driven Structural and Mechanical Evolution of AlCrN and AlCrSiN Coatings via Reactive Magnetron Sputtering.
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  Data: <searchLink fieldCode="AR" term="%22Tsai%2C+Du-Cheng%22">Tsai, Du-Cheng</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Huang%2C+Rong-Hsin%22">Huang, Rong-Hsin</searchLink><relatesTo>2</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Chang%2C+Zue-Chin%22">Chang, Zue-Chin</searchLink><relatesTo>3</relatesTo> (AUTHOR)<i> chang@ncut.edu.tw</i><br /><searchLink fieldCode="AR" term="%22Chen%2C+Erh-Chiang%22">Chen, Erh-Chiang</searchLink><relatesTo>1,4</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Huang%2C+Yen-Lin%22">Huang, Yen-Lin</searchLink><relatesTo>1,4</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Shieu%2C+Fuh-Sheng%22">Shieu, Fuh-Sheng</searchLink><relatesTo>1,2</relatesTo> (AUTHOR)
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  Data: <searchLink fieldCode="JN" term="%22Materials+%281996-1944%29%22">Materials (1996-1944)</searchLink>. Apr2025, Vol. 18 Issue 7, p1671. 19p.
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  Data: <searchLink fieldCode="DE" term="%22Substrates+%28Materials+science%29%22">Substrates (Materials science)</searchLink><br /><searchLink fieldCode="DE" term="%22Reactive+sputtering%22">Reactive sputtering</searchLink><br /><searchLink fieldCode="DE" term="%22Magnetron+sputtering%22">Magnetron sputtering</searchLink><br /><searchLink fieldCode="DE" term="%22Radio+frequency%22">Radio frequency</searchLink><br /><searchLink fieldCode="DE" term="%22Grain+refinement%22">Grain refinement</searchLink>
– Name: Abstract
  Label: Abstract
  Group: Ab
  Data: AlCrN and AlCrSiN coatings were deposited via reactive magnetron sputtering. This study investigates the effects of radio frequency (RF) substrate bias, ranging from 0 V to 200 V, on the chemical composition, microstructure, and mechanical properties of the coatings. All crystalline coatings exhibited a single wurtzite-type hexagonal close-packed (hcp) structure. At a 0 V substrate bias, the AlCrN coating consisted of porous V-shaped columnar crystallites, while the AlCrSiN coating exhibited a porous, fiber-like amorphous structure. As the substrate bias increased, crystal growth was promoted, void density decreased, and the surface morphology transitioned from a textured to a more rounded appearance. Additionally, the preferred orientation shifted toward the (101) direction. However, at excessively high substrate bias, re-nucleation occurred, leading to grain refinement and increased film densification, which in turn caused a further shift in the preferred orientation toward the (002) plane. Due to its multi-element composition and the low solubility of Si in nitrides, AlCrSiN coatings tend to exhibit an amorphous growth tendency during sputtering. As a result, their microstructure is more sensitive to substrate bias. This sensitivity results in the formation of a highly dense structure with an optimal crystallite size at a substrate bias of 100 V, leading to a hardness of 22.6 GPa—surpassing that of the AlCrN coating. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of Materials (1996-1944) is the property of MDPI and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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        Value: 10.3390/ma18071671
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      – Code: eng
        Text: English
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      – SubjectFull: Substrates (Materials science)
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      – SubjectFull: Reactive sputtering
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      – SubjectFull: Magnetron sputtering
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      – SubjectFull: Radio frequency
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      – SubjectFull: Grain refinement
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      – TitleFull: Substrate Bias-Driven Structural and Mechanical Evolution of AlCrN and AlCrSiN Coatings via Reactive Magnetron Sputtering.
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            NameFull: Tsai, Du-Cheng
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            NameFull: Huang, Rong-Hsin
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            NameFull: Chen, Erh-Chiang
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            NameFull: Huang, Yen-Lin
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            – D: 01
              M: 04
              Text: Apr2025
              Type: published
              Y: 2025
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              Value: 18
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