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Evaluation of the contribution of the mean free path in Co to the magnetoresistance in Co/Cu multilayers.

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Title: Evaluation of the contribution of the mean free path in Co to the magnetoresistance in Co/Cu multilayers.
Authors: Elsafi, Bassem1 (AUTHOR) bassem.elsafi@yahoo.fr
Source: Applied Physics A: Materials Science & Processing. Apr2025, Vol. 131 Issue 4, p1-8. 8p.
Subjects: Nuclear spin, Electron diffusion, Copper, Electron spin, Surface roughness
Abstract: Abstarct: The mean free path (MFP) within the Co layer is systematically varied between 10 Å and 500 Å. This variation allows for the investigation of its effect on the current-in-plane magnetoresistance (MR) of Co/Cu angstrom-scale multilayers. The study also explores the influence of surface roughness on the magnetotransport properties of these structures. To analyze the role of interfacial features, two interface configurations are examined: one with a smooth interface and the other with a rough interface. This comparative study highlights how interface quality impacts the magnetic behaviour of the multilayers. Numerical simulations show that MR decreases with MFP for smooth interfaces but may either increase or decrease with MFP for rough interfaces, depending on the electron spin diffusion mechanisms at the Co/Cu interface. The magnitude of MR is strongly dependent on surface roughness, with variations in interfacial characteristics leading to significant differences in MR behaviour. These results emphasize the critical role of both interface quality and surface roughness in determining MR characteristics. [ABSTRACT FROM AUTHOR]
Copyright of Applied Physics A: Materials Science & Processing is the property of Springer Nature and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
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  Data: Evaluation of the contribution of the mean free path in Co to the magnetoresistance in Co/Cu multilayers.
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  Data: <searchLink fieldCode="AR" term="%22Elsafi%2C+Bassem%22">Elsafi, Bassem</searchLink><relatesTo>1</relatesTo> (AUTHOR)<i> bassem.elsafi@yahoo.fr</i>
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  Data: <searchLink fieldCode="JN" term="%22Applied+Physics+A%3A+Materials+Science+%26+Processing%22">Applied Physics A: Materials Science & Processing</searchLink>. Apr2025, Vol. 131 Issue 4, p1-8. 8p.
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  Data: <searchLink fieldCode="DE" term="%22Nuclear+spin%22">Nuclear spin</searchLink><br /><searchLink fieldCode="DE" term="%22Electron+diffusion%22">Electron diffusion</searchLink><br /><searchLink fieldCode="DE" term="%22Copper%22">Copper</searchLink><br /><searchLink fieldCode="DE" term="%22Electron+spin%22">Electron spin</searchLink><br /><searchLink fieldCode="DE" term="%22Surface+roughness%22">Surface roughness</searchLink>
– Name: Abstract
  Label: Abstract
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  Data: Abstarct: The mean free path (MFP) within the Co layer is systematically varied between 10 Å and 500 Å. This variation allows for the investigation of its effect on the current-in-plane magnetoresistance (MR) of Co/Cu angstrom-scale multilayers. The study also explores the influence of surface roughness on the magnetotransport properties of these structures. To analyze the role of interfacial features, two interface configurations are examined: one with a smooth interface and the other with a rough interface. This comparative study highlights how interface quality impacts the magnetic behaviour of the multilayers. Numerical simulations show that MR decreases with MFP for smooth interfaces but may either increase or decrease with MFP for rough interfaces, depending on the electron spin diffusion mechanisms at the Co/Cu interface. The magnitude of MR is strongly dependent on surface roughness, with variations in interfacial characteristics leading to significant differences in MR behaviour. These results emphasize the critical role of both interface quality and surface roughness in determining MR characteristics. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
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  Group: Ab
  Data: <i>Copyright of Applied Physics A: Materials Science & Processing is the property of Springer Nature and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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        Value: 10.1007/s00339-025-08377-2
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      – Code: eng
        Text: English
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      – SubjectFull: Nuclear spin
        Type: general
      – SubjectFull: Electron diffusion
        Type: general
      – SubjectFull: Copper
        Type: general
      – SubjectFull: Electron spin
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      – SubjectFull: Surface roughness
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      – TitleFull: Evaluation of the contribution of the mean free path in Co to the magnetoresistance in Co/Cu multilayers.
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              Text: Apr2025
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