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Resultant Incidence Angle: A Unique Criterion for Controlling the Inclined Columnar Nanostructure of Metallic Films.

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Title: Resultant Incidence Angle: A Unique Criterion for Controlling the Inclined Columnar Nanostructure of Metallic Films.
Authors: Besnard, Aurélien1 (AUTHOR) aurelien.besnard@femto-st.fr, Gerami, Hamidreza1,2 (AUTHOR), Raschetti, Marina1,2 (AUTHOR), Martin, Nicolas1,2 (AUTHOR)
Source: Nanomaterials (2079-4991). Apr2025, Vol. 15 Issue 8, p620. 17p.
Subjects: Glancing angle deposition, Body-centered cubic metals, Metallic films, Substrates (Materials science), Transition metals
Abstract: The original Glancing Angle Deposition (GLAD) technique was developed using the evaporation process, i.e., in high vacuum, with a nearly punctual source, and with the substrate aligned with the source axis. In this specific case, the substrate tilt angle can be assumed to be equal to the impinging incidence angle of evaporated atoms. With the sputtering process, the deposition pressure is higher, sources are larger, and substrates are not intrinsically aligned with the source. As a result, deviations from the growth models applied for evaporation are reported, and the substrate tilt angle is no longer relevant for describing the impinging atomic flux. To control the inclined nanostructure of metallic films, a relevant description of the atomic flux is required, applicable across all deposition configurations. In this work, transport simulation is used to determine the resultant incidence angle, a unique criterion relevant to each specific deposition condition. The different representations of the flux are described and discussed, and some typical examples of the resultant angles are presented. Ten elements are investigated: three hcp transition metals (Ti, Zr, and Hf), six bcc transition metals (V, Nb, Ta, Cr, Mo, and W), and one fcc post-transition metal (Al). [ABSTRACT FROM AUTHOR]
Copyright of Nanomaterials (2079-4991) is the property of MDPI and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
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  Data: Resultant Incidence Angle: A Unique Criterion for Controlling the Inclined Columnar Nanostructure of Metallic Films.
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  Data: <searchLink fieldCode="DE" term="%22Glancing+angle+deposition%22">Glancing angle deposition</searchLink><br /><searchLink fieldCode="DE" term="%22Body-centered+cubic+metals%22">Body-centered cubic metals</searchLink><br /><searchLink fieldCode="DE" term="%22Metallic+films%22">Metallic films</searchLink><br /><searchLink fieldCode="DE" term="%22Substrates+%28Materials+science%29%22">Substrates (Materials science)</searchLink><br /><searchLink fieldCode="DE" term="%22Transition+metals%22">Transition metals</searchLink>
– Name: Abstract
  Label: Abstract
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  Data: The original Glancing Angle Deposition (GLAD) technique was developed using the evaporation process, i.e., in high vacuum, with a nearly punctual source, and with the substrate aligned with the source axis. In this specific case, the substrate tilt angle can be assumed to be equal to the impinging incidence angle of evaporated atoms. With the sputtering process, the deposition pressure is higher, sources are larger, and substrates are not intrinsically aligned with the source. As a result, deviations from the growth models applied for evaporation are reported, and the substrate tilt angle is no longer relevant for describing the impinging atomic flux. To control the inclined nanostructure of metallic films, a relevant description of the atomic flux is required, applicable across all deposition configurations. In this work, transport simulation is used to determine the resultant incidence angle, a unique criterion relevant to each specific deposition condition. The different representations of the flux are described and discussed, and some typical examples of the resultant angles are presented. Ten elements are investigated: three hcp transition metals (Ti, Zr, and Hf), six bcc transition metals (V, Nb, Ta, Cr, Mo, and W), and one fcc post-transition metal (Al). [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of Nanomaterials (2079-4991) is the property of MDPI and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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        Value: 10.3390/nano15080620
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      – Code: eng
        Text: English
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        PageCount: 17
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      – SubjectFull: Glancing angle deposition
        Type: general
      – SubjectFull: Body-centered cubic metals
        Type: general
      – SubjectFull: Metallic films
        Type: general
      – SubjectFull: Substrates (Materials science)
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      – SubjectFull: Transition metals
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      – TitleFull: Resultant Incidence Angle: A Unique Criterion for Controlling the Inclined Columnar Nanostructure of Metallic Films.
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            NameFull: Besnard, Aurélien
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            NameFull: Gerami, Hamidreza
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            NameFull: Raschetti, Marina
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            NameFull: Martin, Nicolas
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            – D: 15
              M: 04
              Text: Apr2025
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              Y: 2025
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