APA (7th ed.) Citation

Zuo, T., Li, X., & Tang, X. (2025). Interfacial Behavior of Nb-Doped Ti-Al-Based Barrier Layer n-Type Skutterudite Thermoelectric Joints. Journal of Electronic Materials, 54(8), 6275. https://doi.org/10.1007/s11664-025-11941-4

Chicago Style (17th ed.) Citation

Zuo, Tong, Xin Li, and Xian Tang. "Interfacial Behavior of Nb-Doped Ti-Al-Based Barrier Layer N-Type Skutterudite Thermoelectric Joints." Journal of Electronic Materials 54, no. 8 (2025): 6275. https://doi.org/10.1007/s11664-025-11941-4.

MLA (9th ed.) Citation

Zuo, Tong, et al. "Interfacial Behavior of Nb-Doped Ti-Al-Based Barrier Layer N-Type Skutterudite Thermoelectric Joints." Journal of Electronic Materials, vol. 54, no. 8, 2025, p. 6275, https://doi.org/10.1007/s11664-025-11941-4.