APA (7th ed.) Citation

Freddi, S., Gherardi, M., Chiappini, A., Arette-Hourquet, A., Berbezier, I., Fedorov, A., . . . Bollani, M. (2025). Strain-Driven Dewetting and Interdiffusion in SiGe Thin Films on SOI for CMOS-Compatible Nanostructures. Nanomaterials (2079-4991), 15(13), 965. https://doi.org/10.3390/nano15130965

Chicago Style (17th ed.) Citation

Freddi, Sonia, Michele Gherardi, Andrea Chiappini, Adam Arette-Hourquet, Isabelle Berbezier, Alexey Fedorov, Daniel Chrastina, and Monica Bollani. "Strain-Driven Dewetting and Interdiffusion in SiGe Thin Films on SOI for CMOS-Compatible Nanostructures." Nanomaterials (2079-4991) 15, no. 13 (2025): 965. https://doi.org/10.3390/nano15130965.

MLA (9th ed.) Citation

Freddi, Sonia, et al. "Strain-Driven Dewetting and Interdiffusion in SiGe Thin Films on SOI for CMOS-Compatible Nanostructures." Nanomaterials (2079-4991), vol. 15, no. 13, 2025, p. 965, https://doi.org/10.3390/nano15130965.