View in EDS

Molecular dynamics and experimental characterization of amorphization in silicon substrates during aerosol deposition.

Saved in:
Bibliographic Details
Title: Molecular dynamics and experimental characterization of amorphization in silicon substrates during aerosol deposition.
Authors: Rahmati, Saeed1 (AUTHOR) saeed.rahmati@utoronto.ca, Yang, Z.1 (AUTHOR), Veiga, R.G.A.2 (AUTHOR), Coyle, T.W.1 (AUTHOR), Mostaghimi, J.1 (AUTHOR), Dolatabadi, A.1 (AUTHOR)
Source: Ceramics International. Aug2025:Part B, Vol. 51 Issue 20, p32478-32484. 7p.
Subjects: Amorphization, Molecular dynamics, Crystal defects, Shearing force, Amorphous silicon, Silicon nanowires
Abstract: This study explores the amorphization mechanisms in silicon (Si) wafer during aerosol deposition (AD) of alumina particles. Utilizing molecular dynamics (MD) simulations and experimental methods, the research investigates the high-velocity impact process and resulting microstructural changes in Si. Experimental observations using TEM and EDS confirm the presence of a thick amorphous Si layer directly beneath the alumina coating. The MD simulations of alumina aggregate impact on an initially flat, defect-free Si surface reveal the formation of amorphous bands initiating at the surface and propagating along maximum shear stress directions into the bulk. Lattice defects such as dislocations and stacking faults are not involved in the onset of amorphization but may act as precursors for further amorphization due to successive impacts. [ABSTRACT FROM AUTHOR]
Copyright of Ceramics International is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
Database: Engineering Source
Description
Abstract:This study explores the amorphization mechanisms in silicon (Si) wafer during aerosol deposition (AD) of alumina particles. Utilizing molecular dynamics (MD) simulations and experimental methods, the research investigates the high-velocity impact process and resulting microstructural changes in Si. Experimental observations using TEM and EDS confirm the presence of a thick amorphous Si layer directly beneath the alumina coating. The MD simulations of alumina aggregate impact on an initially flat, defect-free Si surface reveal the formation of amorphous bands initiating at the surface and propagating along maximum shear stress directions into the bulk. Lattice defects such as dislocations and stacking faults are not involved in the onset of amorphization but may act as precursors for further amorphization due to successive impacts. [ABSTRACT FROM AUTHOR]
ISSN:02728842
DOI:10.1016/j.ceramint.2025.04.334