Indentation-induced intercolumnar shearing in AlN thin films grown on Si(111) substrate.
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| Title: | Indentation-induced intercolumnar shearing in AlN thin films grown on Si(111) substrate. |
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| Authors: | Jian, Sheng-Rui1 (AUTHOR) srjian@gmail.com, Juang, Jenh-Yih2 (AUTHOR) jyjuang@nycu.edu.tw |
| Source: | Journal of Physics & Chemistry of Solids. Dec2025, Vol. 207, pN.PAG-N.PAG. 1p. |
| Subjects: | Nanoindentation, Aluminum nitride films, Shearing force, Microstructure, Phase transitions, Rock deformation, Transmission electron microscopy |
| Abstract: | The interrelations between microstructure and deformation behaviors induced by using nanoindentation in AlN thin films deposited on Si(111) substrates are investigated with a Berkovich indenter in this study. The AlN thin films prepared by helicon sputtering are having apparent columnar grain structure (∼20–40 nm in diameter) with thickness of about 350 nm. The cross-sectional transmission electron microscopy (XTEM) observations performed on Berkovich nanoindentation-induced deformation region revealed evidence of cracks resulted from intercolumnar shearing in AlN thin film. Moreover, sharp shearing-induced steps at the film/substrate interface were observed, which was found to intimately correlate with the multiple pop-ins phenomena appearing in the loading part of load-displacement curve. The XTEM results also indicated that, within the Si(111) substrate, in addition to the slip bands appearing on {111} planes, there exists a nanoindentation-induced phase transformation zone containing the metastable phases of Si-III and Si-XII, accompanying with substantial amorphous regions. An indentation-energy model based on the shearing crack driving deformation is proposed to evaluate the intercolumnar shear stress for AlN thin film. • AlN thin films are deposited on Si(111) substrates using by helicon sputtering. • The interfacial crack behaviors for AlN/Si system are analyzed by nanoindentation and XTEM. • The inter-columnar shear stress for AlN film is estimated to be ∼3.5 GPa. [ABSTRACT FROM AUTHOR] |
| Copyright of Journal of Physics & Chemistry of Solids is the property of Pergamon Press - An Imprint of Elsevier Science and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.) | |
| Database: | Engineering Source |
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| Items | – Name: Title Label: Title Group: Ti Data: Indentation-induced intercolumnar shearing in AlN thin films grown on Si(111) substrate. – Name: Author Label: Authors Group: Au Data: <searchLink fieldCode="AR" term="%22Jian%2C+Sheng-Rui%22">Jian, Sheng-Rui</searchLink><relatesTo>1</relatesTo> (AUTHOR)<i> srjian@gmail.com</i><br /><searchLink fieldCode="AR" term="%22Juang%2C+Jenh-Yih%22">Juang, Jenh-Yih</searchLink><relatesTo>2</relatesTo> (AUTHOR)<i> jyjuang@nycu.edu.tw</i> – Name: TitleSource Label: Source Group: Src Data: <searchLink fieldCode="JN" term="%22Journal+of+Physics+%26+Chemistry+of+Solids%22">Journal of Physics & Chemistry of Solids</searchLink>. Dec2025, Vol. 207, pN.PAG-N.PAG. 1p. – Name: Subject Label: Subjects Group: Su Data: <searchLink fieldCode="DE" term="%22Nanoindentation%22">Nanoindentation</searchLink><br /><searchLink fieldCode="DE" term="%22Aluminum+nitride+films%22">Aluminum nitride films</searchLink><br /><searchLink fieldCode="DE" term="%22Shearing+force%22">Shearing force</searchLink><br /><searchLink fieldCode="DE" term="%22Microstructure%22">Microstructure</searchLink><br /><searchLink fieldCode="DE" term="%22Phase+transitions%22">Phase transitions</searchLink><br /><searchLink fieldCode="DE" term="%22Rock+deformation%22">Rock deformation</searchLink><br /><searchLink fieldCode="DE" term="%22Transmission+electron+microscopy%22">Transmission electron microscopy</searchLink> – Name: Abstract Label: Abstract Group: Ab Data: The interrelations between microstructure and deformation behaviors induced by using nanoindentation in AlN thin films deposited on Si(111) substrates are investigated with a Berkovich indenter in this study. The AlN thin films prepared by helicon sputtering are having apparent columnar grain structure (∼20–40 nm in diameter) with thickness of about 350 nm. The cross-sectional transmission electron microscopy (XTEM) observations performed on Berkovich nanoindentation-induced deformation region revealed evidence of cracks resulted from intercolumnar shearing in AlN thin film. Moreover, sharp shearing-induced steps at the film/substrate interface were observed, which was found to intimately correlate with the multiple pop-ins phenomena appearing in the loading part of load-displacement curve. The XTEM results also indicated that, within the Si(111) substrate, in addition to the slip bands appearing on {111} planes, there exists a nanoindentation-induced phase transformation zone containing the metastable phases of Si-III and Si-XII, accompanying with substantial amorphous regions. An indentation-energy model based on the shearing crack driving deformation is proposed to evaluate the intercolumnar shear stress for AlN thin film. • AlN thin films are deposited on Si(111) substrates using by helicon sputtering. • The interfacial crack behaviors for AlN/Si system are analyzed by nanoindentation and XTEM. • The inter-columnar shear stress for AlN film is estimated to be ∼3.5 GPa. [ABSTRACT FROM AUTHOR] – Name: AbstractSuppliedCopyright Label: Group: Ab Data: <i>Copyright of Journal of Physics & Chemistry of Solids is the property of Pergamon Press - An Imprint of Elsevier Science and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.) |
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| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1016/j.jpcs.2025.112932 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 1 StartPage: N.PAG Subjects: – SubjectFull: Nanoindentation Type: general – SubjectFull: Aluminum nitride films Type: general – SubjectFull: Shearing force Type: general – SubjectFull: Microstructure Type: general – SubjectFull: Phase transitions Type: general – SubjectFull: Rock deformation Type: general – SubjectFull: Transmission electron microscopy Type: general Titles: – TitleFull: Indentation-induced intercolumnar shearing in AlN thin films grown on Si(111) substrate. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Jian, Sheng-Rui – PersonEntity: Name: NameFull: Juang, Jenh-Yih IsPartOfRelationships: – BibEntity: Dates: – D: 01 M: 12 Text: Dec2025 Type: published Y: 2025 Identifiers: – Type: issn-print Value: 00223697 Numbering: – Type: volume Value: 207 Titles: – TitleFull: Journal of Physics & Chemistry of Solids Type: main |
| ResultId | 1 |
