Flexible Inorganic/Organic Memristor Based on W-Doped MoO x /Poly(methyl methacrylate) Heterostructure.
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| Title: | Flexible Inorganic/Organic Memristor Based on W-Doped MoO x /Poly(methyl methacrylate) Heterostructure. |
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| Authors: | Kalemai, Gion1 (AUTHOR), Aidinis, Konstantinos2,3 (AUTHOR), Sakellis, Elias3,4,5 (AUTHOR), Filippatos, Petros-Panagis4 (AUTHOR), Tsipas, Polychronis4,5 (AUTHOR), Davazoglou, Dimitris1,4 (AUTHOR), Soultati, Anastasia2,4 (AUTHOR) a.soultati@inn.demokritos.gr |
| Source: | Nanomaterials (2079-4991). Nov2025, Vol. 15 Issue 22, p1707. 15p. |
| Subjects: | Memristors, Nonvolatile memory, Heterostructures, Nonvolatile random-access memory, Molybdenum oxides, Charge carrier capture, Polymethylmethacrylate |
| Abstract: | Work investigates the doping of molybdenum oxide (MoOx) with tungsten (W). The successful incorporation of W into the MoOx lattice was confirmed through X-ray photoelectron spectroscopy (XPS) and energy-dispersive X-ray spectroscopy (EDS). Structural and optical analysis revealed the presence of oxygen vacancies within the W-MoOx film, which are known to facilitate resistive switching (RS) in memristive devices. Based on this, a flexible memristor with the structure PET/ITO/W-MoOx/polymethyl methacrylate (PMMA)/Al was fabricated. PMMA was strategically introduced between the W-MoOx layer and the aluminum electrode to modulate interfacial properties that influence RS behavior. The W-MoOx/PMMA-based memristor exhibited good resistive switching characteristics, with a memory window of approximately 12 and a retention time exceeding 2 × 104 s, demonstrating a non-volatile memory behavior. In the high-resistance state (HRS), the conduction mechanism under higher applied voltages follows a space-charge-limited current (SCLC) model, indicating that the RS process is primarily governed by charge trapping and de-trapping at the interface. Overall, the consistent and robust switching performance of the W-MoOx/PMMA heterostructure underlines its potential as a reliable functional layer for next-generation resistive random-access memory (ReRAM) devices. [ABSTRACT FROM AUTHOR] |
| Copyright of Nanomaterials (2079-4991) is the property of MDPI and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.) | |
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| Header | DbId: egs DbLabel: Engineering Source An: 189676635 AccessLevel: 6 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| Items | – Name: Title Label: Title Group: Ti Data: Flexible Inorganic/Organic Memristor Based on W-Doped MoO x /Poly(methyl methacrylate) Heterostructure. – Name: Author Label: Authors Group: Au Data: <searchLink fieldCode="AR" term="%22Kalemai%2C+Gion%22">Kalemai, Gion</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Aidinis%2C+Konstantinos%22">Aidinis, Konstantinos</searchLink><relatesTo>2,3</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Sakellis%2C+Elias%22">Sakellis, Elias</searchLink><relatesTo>3,4,5</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Filippatos%2C+Petros-Panagis%22">Filippatos, Petros-Panagis</searchLink><relatesTo>4</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Tsipas%2C+Polychronis%22">Tsipas, Polychronis</searchLink><relatesTo>4,5</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Davazoglou%2C+Dimitris%22">Davazoglou, Dimitris</searchLink><relatesTo>1,4</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Soultati%2C+Anastasia%22">Soultati, Anastasia</searchLink><relatesTo>2,4</relatesTo> (AUTHOR)<i> a.soultati@inn.demokritos.gr</i> – Name: TitleSource Label: Source Group: Src Data: <searchLink fieldCode="JN" term="%22Nanomaterials+%282079-4991%29%22">Nanomaterials (2079-4991)</searchLink>. Nov2025, Vol. 15 Issue 22, p1707. 15p. – Name: Subject Label: Subjects Group: Su Data: <searchLink fieldCode="DE" term="%22Memristors%22">Memristors</searchLink><br /><searchLink fieldCode="DE" term="%22Nonvolatile+memory%22">Nonvolatile memory</searchLink><br /><searchLink fieldCode="DE" term="%22Heterostructures%22">Heterostructures</searchLink><br /><searchLink fieldCode="DE" term="%22Nonvolatile+random-access+memory%22">Nonvolatile random-access memory</searchLink><br /><searchLink fieldCode="DE" term="%22Molybdenum+oxides%22">Molybdenum oxides</searchLink><br /><searchLink fieldCode="DE" term="%22Charge+carrier+capture%22">Charge carrier capture</searchLink><br /><searchLink fieldCode="DE" term="%22Polymethylmethacrylate%22">Polymethylmethacrylate</searchLink> – Name: Abstract Label: Abstract Group: Ab Data: Work investigates the doping of molybdenum oxide (MoOx) with tungsten (W). The successful incorporation of W into the MoOx lattice was confirmed through X-ray photoelectron spectroscopy (XPS) and energy-dispersive X-ray spectroscopy (EDS). Structural and optical analysis revealed the presence of oxygen vacancies within the W-MoOx film, which are known to facilitate resistive switching (RS) in memristive devices. Based on this, a flexible memristor with the structure PET/ITO/W-MoOx/polymethyl methacrylate (PMMA)/Al was fabricated. PMMA was strategically introduced between the W-MoOx layer and the aluminum electrode to modulate interfacial properties that influence RS behavior. The W-MoOx/PMMA-based memristor exhibited good resistive switching characteristics, with a memory window of approximately 12 and a retention time exceeding 2 × 104 s, demonstrating a non-volatile memory behavior. In the high-resistance state (HRS), the conduction mechanism under higher applied voltages follows a space-charge-limited current (SCLC) model, indicating that the RS process is primarily governed by charge trapping and de-trapping at the interface. Overall, the consistent and robust switching performance of the W-MoOx/PMMA heterostructure underlines its potential as a reliable functional layer for next-generation resistive random-access memory (ReRAM) devices. [ABSTRACT FROM AUTHOR] – Name: AbstractSuppliedCopyright Label: Group: Ab Data: <i>Copyright of Nanomaterials (2079-4991) is the property of MDPI and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.) |
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| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.3390/nano15221707 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 15 StartPage: 1707 Subjects: – SubjectFull: Memristors Type: general – SubjectFull: Nonvolatile memory Type: general – SubjectFull: Heterostructures Type: general – SubjectFull: Nonvolatile random-access memory Type: general – SubjectFull: Molybdenum oxides Type: general – SubjectFull: Charge carrier capture Type: general – SubjectFull: Polymethylmethacrylate Type: general Titles: – TitleFull: Flexible Inorganic/Organic Memristor Based on W-Doped MoO x /Poly(methyl methacrylate) Heterostructure. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Kalemai, Gion – PersonEntity: Name: NameFull: Aidinis, Konstantinos – PersonEntity: Name: NameFull: Sakellis, Elias – PersonEntity: Name: NameFull: Filippatos, Petros-Panagis – PersonEntity: Name: NameFull: Tsipas, Polychronis – PersonEntity: Name: NameFull: Davazoglou, Dimitris – PersonEntity: Name: NameFull: Soultati, Anastasia IsPartOfRelationships: – BibEntity: Dates: – D: 15 M: 11 Text: Nov2025 Type: published Y: 2025 Identifiers: – Type: issn-print Value: 20794991 Numbering: – Type: volume Value: 15 – Type: issue Value: 22 Titles: – TitleFull: Nanomaterials (2079-4991) Type: main |
| ResultId | 1 |