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Toward a Correlative Metrology Approach on the Same 2D Flake: Graphene Oxide Case Study—Sample Preparation and Stability Issues.

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Title: Toward a Correlative Metrology Approach on the Same 2D Flake: Graphene Oxide Case Study—Sample Preparation and Stability Issues.
Authors: Chibane, Lydia1,2 (AUTHOR), Delvallée, Alexandra1,2 (AUTHOR), Fleurence, Nolwenn1,3 (AUTHOR), Douri, Sarah1 (AUTHOR), Morán-Meza, José1,2 (AUTHOR), Ulysse, Christian3 (AUTHOR), Piquemal, François1 (AUTHOR), Feltin, Nicolas1 (AUTHOR), Flahaut, Emmanuel2 (AUTHOR)
Source: Nanomaterials (2079-4991). Dec2025, Vol. 15 Issue 24, p1861. 21p.
Subjects: Graphene oxide, Metrology, Scanning electron microscopy, Atomic force microscopy, Stability (Mechanics), Raman spectroscopy, Graphene, Chemical sample preparation
Abstract: Although graphene promises a wide range of applications, large-scale production of this material remains complex. One very common way of obtaining graphene is through a reduction in graphene oxide (GO). In order to fully control this production process, it is necessary to obtain data from different techniques, but a comprehensive characterization methodology and associated metrology are currently lacking. Here, we propose tools for substrate selection (in this study, the most appropriate were silicon and silicon dioxide on silicon) and precautions to be taken when setting up a correlative metrology method integrating atomic force microscopy (AFM), scanning electron microscopy (SEM), Raman microscopy/spectroscopy, scanning microwave microscopy (SMM) and scanning thermal microscopy (SThM). Indeed, in order to obtain reliable data for each of these techniques applied to a unique graphene oxide flake, a strategy must be developed and could be implemented to monitor the reduction in GO. Emphasis was placed on the choice of the substrate and on the possible degradations generated by each of the techniques employed, and a running sequence was determined. [ABSTRACT FROM AUTHOR]
Copyright of Nanomaterials (2079-4991) is the property of MDPI and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
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  Data: Toward a Correlative Metrology Approach on the Same 2D Flake: Graphene Oxide Case Study—Sample Preparation and Stability Issues.
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  Data: <searchLink fieldCode="JN" term="%22Nanomaterials+%282079-4991%29%22">Nanomaterials (2079-4991)</searchLink>. Dec2025, Vol. 15 Issue 24, p1861. 21p.
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  Data: <searchLink fieldCode="DE" term="%22Graphene+oxide%22">Graphene oxide</searchLink><br /><searchLink fieldCode="DE" term="%22Metrology%22">Metrology</searchLink><br /><searchLink fieldCode="DE" term="%22Scanning+electron+microscopy%22">Scanning electron microscopy</searchLink><br /><searchLink fieldCode="DE" term="%22Atomic+force+microscopy%22">Atomic force microscopy</searchLink><br /><searchLink fieldCode="DE" term="%22Stability+%28Mechanics%29%22">Stability (Mechanics)</searchLink><br /><searchLink fieldCode="DE" term="%22Raman+spectroscopy%22">Raman spectroscopy</searchLink><br /><searchLink fieldCode="DE" term="%22Graphene%22">Graphene</searchLink><br /><searchLink fieldCode="DE" term="%22Chemical+sample+preparation%22">Chemical sample preparation</searchLink>
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  Data: Although graphene promises a wide range of applications, large-scale production of this material remains complex. One very common way of obtaining graphene is through a reduction in graphene oxide (GO). In order to fully control this production process, it is necessary to obtain data from different techniques, but a comprehensive characterization methodology and associated metrology are currently lacking. Here, we propose tools for substrate selection (in this study, the most appropriate were silicon and silicon dioxide on silicon) and precautions to be taken when setting up a correlative metrology method integrating atomic force microscopy (AFM), scanning electron microscopy (SEM), Raman microscopy/spectroscopy, scanning microwave microscopy (SMM) and scanning thermal microscopy (SThM). Indeed, in order to obtain reliable data for each of these techniques applied to a unique graphene oxide flake, a strategy must be developed and could be implemented to monitor the reduction in GO. Emphasis was placed on the choice of the substrate and on the possible degradations generated by each of the techniques employed, and a running sequence was determined. [ABSTRACT FROM AUTHOR]
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  Data: <i>Copyright of Nanomaterials (2079-4991) is the property of MDPI and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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        Value: 10.3390/nano15241861
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        Text: English
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        PageCount: 21
        StartPage: 1861
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      – SubjectFull: Graphene oxide
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      – SubjectFull: Scanning electron microscopy
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      – SubjectFull: Atomic force microscopy
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      – SubjectFull: Graphene
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      – SubjectFull: Chemical sample preparation
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      – TitleFull: Toward a Correlative Metrology Approach on the Same 2D Flake: Graphene Oxide Case Study—Sample Preparation and Stability Issues.
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              Text: Dec2025
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