PIC/MCC simulation of post-arc plasma diffusion considering TRV, initial drift velocity and metal droplets.
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| Title: | PIC/MCC simulation of post-arc plasma diffusion considering TRV, initial drift velocity and metal droplets. |
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| Authors: | Wang, Lijun1 (AUTHOR) lijunwang@mail.xjtu.edu.cn, Wang, Hongjian1 (AUTHOR), Chen, Zhuo2 (AUTHOR), Hu, Runze1 (AUTHOR), Li, Xianzhe1 (AUTHOR), Shi, Ruibo1 (AUTHOR) |
| Source: | Journal of Physics D: Applied Physics. 2026, Vol. 59 Issue 1, p1-22. 22p. |
| Subjects: | Plasma diffusion, Vacuum circuit breakers, Plasma arcs, Diffusion kinetics, Metal clusters, Plasma boundary layers, Voltage |
| Abstract: | The phenomena of post-arc gap breakdown and the dielectric recovery process are crucial to the performance and reliability of vacuum interrupters and related equipment. In this paper, a two-dimensional particle-in-cell/Monte Carlo collision (PIC/MCC) simulation model is comprehensively used to study the diffusion process of the residual plasma in the post-arc stage of a vacuum circuit breaker. The research results show that under the action of the transient recovery voltage (TRV), the number of gap particles decreases, electrons dissipate faster than ions, an ion sheath layer is formed near the cathode, and the post-arc current first rises, then stabilizes, and then decreases. As the rise rate of the TRV increases, the speed of decrease in the number of electrons and ions accelerates, the current peak value increases, and the residual plasma dissipates faster. The introduction of the initial drift velocity accelerates the diffusion velocity of the post-arc plasma. Due to the opposite directions of the initial drift velocities of electrons and ions, the diffusion direction of ions is changed. After metal droplet is introduced, the diffusion speed of the post-arc plasma also slows down, the dissipation time of electrons and ions is delayed, the metal droplet hinders the plasma diffusion, and the gap electric field is distorted. [ABSTRACT FROM AUTHOR] |
| Copyright of Journal of Physics D: Applied Physics is the property of IOP Publishing and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.) | |
| Database: | Engineering Source |
| FullText | Text: Availability: 0 |
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| Header | DbId: egs DbLabel: Engineering Source An: 190589804 AccessLevel: 6 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| Items | – Name: Title Label: Title Group: Ti Data: PIC/MCC simulation of post-arc plasma diffusion considering TRV, initial drift velocity and metal droplets. – Name: Author Label: Authors Group: Au Data: <searchLink fieldCode="AR" term="%22Wang%2C+Lijun%22">Wang, Lijun</searchLink><relatesTo>1</relatesTo> (AUTHOR)<i> lijunwang@mail.xjtu.edu.cn</i><br /><searchLink fieldCode="AR" term="%22Wang%2C+Hongjian%22">Wang, Hongjian</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Chen%2C+Zhuo%22">Chen, Zhuo</searchLink><relatesTo>2</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Hu%2C+Runze%22">Hu, Runze</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Li%2C+Xianzhe%22">Li, Xianzhe</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Shi%2C+Ruibo%22">Shi, Ruibo</searchLink><relatesTo>1</relatesTo> (AUTHOR) – Name: TitleSource Label: Source Group: Src Data: <searchLink fieldCode="JN" term="%22Journal+of+Physics+D%3A+Applied+Physics%22">Journal of Physics D: Applied Physics</searchLink>. 2026, Vol. 59 Issue 1, p1-22. 22p. – Name: Subject Label: Subjects Group: Su Data: <searchLink fieldCode="DE" term="%22Plasma+diffusion%22">Plasma diffusion</searchLink><br /><searchLink fieldCode="DE" term="%22Vacuum+circuit+breakers%22">Vacuum circuit breakers</searchLink><br /><searchLink fieldCode="DE" term="%22Plasma+arcs%22">Plasma arcs</searchLink><br /><searchLink fieldCode="DE" term="%22Diffusion+kinetics%22">Diffusion kinetics</searchLink><br /><searchLink fieldCode="DE" term="%22Metal+clusters%22">Metal clusters</searchLink><br /><searchLink fieldCode="DE" term="%22Plasma+boundary+layers%22">Plasma boundary layers</searchLink><br /><searchLink fieldCode="DE" term="%22Voltage%22">Voltage</searchLink> – Name: Abstract Label: Abstract Group: Ab Data: The phenomena of post-arc gap breakdown and the dielectric recovery process are crucial to the performance and reliability of vacuum interrupters and related equipment. In this paper, a two-dimensional particle-in-cell/Monte Carlo collision (PIC/MCC) simulation model is comprehensively used to study the diffusion process of the residual plasma in the post-arc stage of a vacuum circuit breaker. The research results show that under the action of the transient recovery voltage (TRV), the number of gap particles decreases, electrons dissipate faster than ions, an ion sheath layer is formed near the cathode, and the post-arc current first rises, then stabilizes, and then decreases. As the rise rate of the TRV increases, the speed of decrease in the number of electrons and ions accelerates, the current peak value increases, and the residual plasma dissipates faster. The introduction of the initial drift velocity accelerates the diffusion velocity of the post-arc plasma. Due to the opposite directions of the initial drift velocities of electrons and ions, the diffusion direction of ions is changed. After metal droplet is introduced, the diffusion speed of the post-arc plasma also slows down, the dissipation time of electrons and ions is delayed, the metal droplet hinders the plasma diffusion, and the gap electric field is distorted. [ABSTRACT FROM AUTHOR] – Name: AbstractSuppliedCopyright Label: Group: Ab Data: <i>Copyright of Journal of Physics D: Applied Physics is the property of IOP Publishing and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.) |
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| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1088/1361-6463/ae2b81 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 22 StartPage: 1 Subjects: – SubjectFull: Plasma diffusion Type: general – SubjectFull: Vacuum circuit breakers Type: general – SubjectFull: Plasma arcs Type: general – SubjectFull: Diffusion kinetics Type: general – SubjectFull: Metal clusters Type: general – SubjectFull: Plasma boundary layers Type: general – SubjectFull: Voltage Type: general Titles: – TitleFull: PIC/MCC simulation of post-arc plasma diffusion considering TRV, initial drift velocity and metal droplets. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Wang, Lijun – PersonEntity: Name: NameFull: Wang, Hongjian – PersonEntity: Name: NameFull: Chen, Zhuo – PersonEntity: Name: NameFull: Hu, Runze – PersonEntity: Name: NameFull: Li, Xianzhe – PersonEntity: Name: NameFull: Shi, Ruibo IsPartOfRelationships: – BibEntity: Dates: – D: 09 M: 01 Text: 2026 Type: published Y: 2026 Identifiers: – Type: issn-print Value: 00223727 Numbering: – Type: volume Value: 59 – Type: issue Value: 1 Titles: – TitleFull: Journal of Physics D: Applied Physics Type: main |
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