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Channel‐cut monochromator withstanding incident powers above 400 W on undulator beamlines.

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Title: Channel‐cut monochromator withstanding incident powers above 400 W on undulator beamlines.
Authors: Yamazaki, Hiroshi1,2 (AUTHOR) yamazaki@spring8.or.jp, Shimizu, Yasuhiro1 (AUTHOR), Tsubota, Koji1 (AUTHOR), Tahara, Kazuhiko1 (AUTHOR), Shimizu, Satsuki1 (AUTHOR), Koyama, Takahisa1,2 (AUTHOR), Yumoto, Hirokatsu1,2 (AUTHOR), Osaka, Taito2 (AUTHOR), Inoue, Ichiro2 (AUTHOR), Yabashi, Makina1,2 (AUTHOR), Ohashi, Haruhiko1,2 (AUTHOR)
Source: Journal of Synchrotron Radiation. Jan2026, Vol. 33 Issue 1, p84-90. 7p.
Subjects: Monochromators, Optical elements, Coherence (Physics), Silicon crystals, Low temperature engineering, Diffraction patterns, Thermal stresses, Synchrotron radiation
Abstract: A liquid‐nitrogen‐cooled silicon channel‐cut monochromator was developed and experimentally evaluated under high‐thermal‐load conditions. Under the maximum load of 417 W, the first reflecting surface exhibited a concave deformation, resulting in only an 11% reduction in vertical beam size at 16 m downstream. The deformation radius was estimated at 510 m. Despite the deformation, no significant changes were observed in the angular profile or intensity of the monochromatic beam. Interference fringes caused by edge diffraction at an upstream slit confirmed excellent preservation of spatial coherence. For the stability test of the monochromator, intensity fluctuation of the monochromatic beam was monitored and linearly fitted with upstream beam‐position monitor signals, which were synchronously acquired. A high correlation (R2 = 0.95) confirmed that the inherent stability of the channel‐cut design remained under cryogenic cooling. Additionally, a double channel‐cut monochromator configuration for fixed‐exit beam operation was tested and produced the expected output beam intensity. These results confirm the feasibility of using channel‐cut monochromators as high‐stability high‐heat‐load‐tolerant optical elements for next‐generation synchrotron beamlines. [ABSTRACT FROM AUTHOR]
Copyright of Journal of Synchrotron Radiation is the property of Wiley-Blackwell and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
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  Label: Title
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  Data: Channel‐cut monochromator withstanding incident powers above 400 W on undulator beamlines.
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  Data: <searchLink fieldCode="AR" term="%22Yamazaki%2C+Hiroshi%22">Yamazaki, Hiroshi</searchLink><relatesTo>1,2</relatesTo> (AUTHOR)<i> yamazaki@spring8.or.jp</i><br /><searchLink fieldCode="AR" term="%22Shimizu%2C+Yasuhiro%22">Shimizu, Yasuhiro</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Tsubota%2C+Koji%22">Tsubota, Koji</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Tahara%2C+Kazuhiko%22">Tahara, Kazuhiko</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Shimizu%2C+Satsuki%22">Shimizu, Satsuki</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Koyama%2C+Takahisa%22">Koyama, Takahisa</searchLink><relatesTo>1,2</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Yumoto%2C+Hirokatsu%22">Yumoto, Hirokatsu</searchLink><relatesTo>1,2</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Osaka%2C+Taito%22">Osaka, Taito</searchLink><relatesTo>2</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Inoue%2C+Ichiro%22">Inoue, Ichiro</searchLink><relatesTo>2</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Yabashi%2C+Makina%22">Yabashi, Makina</searchLink><relatesTo>1,2</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Ohashi%2C+Haruhiko%22">Ohashi, Haruhiko</searchLink><relatesTo>1,2</relatesTo> (AUTHOR)
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+Synchrotron+Radiation%22">Journal of Synchrotron Radiation</searchLink>. Jan2026, Vol. 33 Issue 1, p84-90. 7p.
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  Data: <searchLink fieldCode="DE" term="%22Monochromators%22">Monochromators</searchLink><br /><searchLink fieldCode="DE" term="%22Optical+elements%22">Optical elements</searchLink><br /><searchLink fieldCode="DE" term="%22Coherence+%28Physics%29%22">Coherence (Physics)</searchLink><br /><searchLink fieldCode="DE" term="%22Silicon+crystals%22">Silicon crystals</searchLink><br /><searchLink fieldCode="DE" term="%22Low+temperature+engineering%22">Low temperature engineering</searchLink><br /><searchLink fieldCode="DE" term="%22Diffraction+patterns%22">Diffraction patterns</searchLink><br /><searchLink fieldCode="DE" term="%22Thermal+stresses%22">Thermal stresses</searchLink><br /><searchLink fieldCode="DE" term="%22Synchrotron+radiation%22">Synchrotron radiation</searchLink>
– Name: Abstract
  Label: Abstract
  Group: Ab
  Data: A liquid‐nitrogen‐cooled silicon channel‐cut monochromator was developed and experimentally evaluated under high‐thermal‐load conditions. Under the maximum load of 417 W, the first reflecting surface exhibited a concave deformation, resulting in only an 11% reduction in vertical beam size at 16 m downstream. The deformation radius was estimated at 510 m. Despite the deformation, no significant changes were observed in the angular profile or intensity of the monochromatic beam. Interference fringes caused by edge diffraction at an upstream slit confirmed excellent preservation of spatial coherence. For the stability test of the monochromator, intensity fluctuation of the monochromatic beam was monitored and linearly fitted with upstream beam‐position monitor signals, which were synchronously acquired. A high correlation (R2 = 0.95) confirmed that the inherent stability of the channel‐cut design remained under cryogenic cooling. Additionally, a double channel‐cut monochromator configuration for fixed‐exit beam operation was tested and produced the expected output beam intensity. These results confirm the feasibility of using channel‐cut monochromators as high‐stability high‐heat‐load‐tolerant optical elements for next‐generation synchrotron beamlines. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of Journal of Synchrotron Radiation is the property of Wiley-Blackwell and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=egs&AN=190718657
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        Value: 10.1107/S1600577525009695
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      – Code: eng
        Text: English
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      Pagination:
        PageCount: 7
        StartPage: 84
    Subjects:
      – SubjectFull: Monochromators
        Type: general
      – SubjectFull: Optical elements
        Type: general
      – SubjectFull: Coherence (Physics)
        Type: general
      – SubjectFull: Silicon crystals
        Type: general
      – SubjectFull: Low temperature engineering
        Type: general
      – SubjectFull: Diffraction patterns
        Type: general
      – SubjectFull: Thermal stresses
        Type: general
      – SubjectFull: Synchrotron radiation
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    Titles:
      – TitleFull: Channel‐cut monochromator withstanding incident powers above 400 W on undulator beamlines.
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              Text: Jan2026
              Type: published
              Y: 2026
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