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High-Uniformity Flat-Top Light Spot Based on a Dielectric Metasurface.

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Title: High-Uniformity Flat-Top Light Spot Based on a Dielectric Metasurface.
Authors: Pu, Xinxin1 (AUTHOR), Guo, Wenhao1 (AUTHOR), Hou, Jinyao1 (AUTHOR), Zhu, Yechuan1 (AUTHOR), Sun, Xueping1 (AUTHOR), Zhou, Shun1 (AUTHOR), Liu, Weiguo1 (AUTHOR)
Source: Nanomaterials (2079-4991). Feb2026, Vol. 16 Issue 3, p208. 10p.
Subjects: Uniformity, Silicon carbide, Inverse problems, Laser beams, Laser ablation
Abstract: With the rapid development of laser processing and infrared imaging, the demand for flat-top beams with high uniformity has become increasingly urgent. Conventional beam-shaping techniques based on bonded aspheric lenses are inherently bulky and inflexible, which limits their compatibility with modern optical systems. In this work, we propose a dielectric metasurface for laser beam shaping operating at 1064 nm, where the target phase distribution is derived by the given initial phase and is represented by a hyperbolic phase. An inverse optimization algorithm is proposed to optimize the unit cell consisting of silicon carbide (SiC) nanopillars and the silicon dioxide (SiO2) substrate. Numerical results show that, after transmission through the designed metasurface, the beam forms a circular flat-top spot with a radius of 2 μm at the target plane, exhibiting an intensity uniformity of 0.1021 and an energy efficiency of 76.3%. This study offers a compact and highly efficient solution for the flat-top beam shaping, demonstrating significant potential for applications in precision-laser processing, optical trapping, and bioimaging. [ABSTRACT FROM AUTHOR]
Copyright of Nanomaterials (2079-4991) is the property of MDPI and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
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  Data: High-Uniformity Flat-Top Light Spot Based on a Dielectric Metasurface.
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  Data: <searchLink fieldCode="JN" term="%22Nanomaterials+%282079-4991%29%22">Nanomaterials (2079-4991)</searchLink>. Feb2026, Vol. 16 Issue 3, p208. 10p.
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  Data: <searchLink fieldCode="DE" term="%22Uniformity%22">Uniformity</searchLink><br /><searchLink fieldCode="DE" term="%22Silicon+carbide%22">Silicon carbide</searchLink><br /><searchLink fieldCode="DE" term="%22Inverse+problems%22">Inverse problems</searchLink><br /><searchLink fieldCode="DE" term="%22Laser+beams%22">Laser beams</searchLink><br /><searchLink fieldCode="DE" term="%22Laser+ablation%22">Laser ablation</searchLink>
– Name: Abstract
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  Data: With the rapid development of laser processing and infrared imaging, the demand for flat-top beams with high uniformity has become increasingly urgent. Conventional beam-shaping techniques based on bonded aspheric lenses are inherently bulky and inflexible, which limits their compatibility with modern optical systems. In this work, we propose a dielectric metasurface for laser beam shaping operating at 1064 nm, where the target phase distribution is derived by the given initial phase and is represented by a hyperbolic phase. An inverse optimization algorithm is proposed to optimize the unit cell consisting of silicon carbide (SiC) nanopillars and the silicon dioxide (SiO2) substrate. Numerical results show that, after transmission through the designed metasurface, the beam forms a circular flat-top spot with a radius of 2 μm at the target plane, exhibiting an intensity uniformity of 0.1021 and an energy efficiency of 76.3%. This study offers a compact and highly efficient solution for the flat-top beam shaping, demonstrating significant potential for applications in precision-laser processing, optical trapping, and bioimaging. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of Nanomaterials (2079-4991) is the property of MDPI and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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        Value: 10.3390/nano16030208
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      – Code: eng
        Text: English
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        PageCount: 10
        StartPage: 208
    Subjects:
      – SubjectFull: Uniformity
        Type: general
      – SubjectFull: Silicon carbide
        Type: general
      – SubjectFull: Inverse problems
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      – SubjectFull: Laser beams
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      – SubjectFull: Laser ablation
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      – TitleFull: High-Uniformity Flat-Top Light Spot Based on a Dielectric Metasurface.
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            NameFull: Pu, Xinxin
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            NameFull: Guo, Wenhao
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            NameFull: Hou, Jinyao
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            NameFull: Zhou, Shun
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            – D: 01
              M: 02
              Text: Feb2026
              Type: published
              Y: 2026
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