Lofaj, F., Fekete, M., Kvetková, L., Hviščová, P., & Petruš, O. (2026). Understanding hysteresis‐free reactive DC magnetron and high target utilization sputtering of TiZrHfVNbTa‐N coatings. International Journal of Applied Ceramic Technology, 23(1), 1. https://doi.org/10.1111/ijac.70087
Chicago Style (17th ed.) CitationLofaj, František, Matej Fekete, Lenka Kvetková, Petra Hviščová, and Ondrej Petruš. "Understanding Hysteresis‐free Reactive DC Magnetron and High Target Utilization Sputtering of TiZrHfVNbTa‐N Coatings." International Journal of Applied Ceramic Technology 23, no. 1 (2026): 1. https://doi.org/10.1111/ijac.70087.
MLA (9th ed.) CitationLofaj, František, et al. "Understanding Hysteresis‐free Reactive DC Magnetron and High Target Utilization Sputtering of TiZrHfVNbTa‐N Coatings." International Journal of Applied Ceramic Technology, vol. 23, no. 1, 2026, p. 1, https://doi.org/10.1111/ijac.70087.