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Understanding hysteresis‐free reactive DC magnetron and high target utilization sputtering of TiZrHfVNbTa‐N coatings.

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Title: Understanding hysteresis‐free reactive DC magnetron and high target utilization sputtering of TiZrHfVNbTa‐N coatings.
Authors: Lofaj, František1 (AUTHOR) flofaj@saske.sk, Fekete, Matej2 (AUTHOR), Kvetková, Lenka1 (AUTHOR), Hviščová, Petra1 (AUTHOR), Petruš, Ondrej1 (AUTHOR)
Source: International Journal of Applied Ceramic Technology. Feb2026, Vol. 23 Issue 1, p1-12. 12p.
Subjects: Reactive sputtering, Hysteresis, Protective coatings, Magnetron sputtering
Abstract: Reactive direct current (DC) magnetron sputtering (rDCMS) and reactive high target utilization sputtering (rHiTUS) of compositionally complex TiZrHfVNbTa–N coatings were systematically investigated with varying nitrogen flow. The study combined experimental measurements of total and partial nitrogen pressures with simulations based on Berg's model. Both deposition systems exhibited hysteresis‐free behavior, characterized by two distinct nitrogen consumption regimes: (1) a nearly linear increase up to a critical nitrogen flow (≈4 sccm in rDCMS and ≈6 sccm in rHiTUS), and (2) a saturation regime. Simulations reproduced these trends and confirmed that hysteresis suppression originates from high pumping speeds (pumping speed/volume ratio > > 4 s−1). The applicability of Berg's model to rHiTUS was validated by the strong agreement between experiments and modeling, supporting the assumption that the fundamental processes of reactive sputtering—target sputtering, poisoning, and nitride formation—are identical in DCMS and HiTUS. The main technological benefit of operating in a hysteresis‐free regime is that coating composition and properties can be controlled solely through nitrogen flow adjustment. [ABSTRACT FROM AUTHOR]
Copyright of International Journal of Applied Ceramic Technology is the property of Wiley-Blackwell and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
Database: Engineering Source
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DbLabel: Engineering Source
An: 191803556
AccessLevel: 6
PubType: Academic Journal
PubTypeId: academicJournal
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  Label: Title
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  Data: Understanding hysteresis‐free reactive DC magnetron and high target utilization sputtering of TiZrHfVNbTa‐N coatings.
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  Data: <searchLink fieldCode="JN" term="%22International+Journal+of+Applied+Ceramic+Technology%22">International Journal of Applied Ceramic Technology</searchLink>. Feb2026, Vol. 23 Issue 1, p1-12. 12p.
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  Data: <searchLink fieldCode="DE" term="%22Reactive+sputtering%22">Reactive sputtering</searchLink><br /><searchLink fieldCode="DE" term="%22Hysteresis%22">Hysteresis</searchLink><br /><searchLink fieldCode="DE" term="%22Protective+coatings%22">Protective coatings</searchLink><br /><searchLink fieldCode="DE" term="%22Magnetron+sputtering%22">Magnetron sputtering</searchLink>
– Name: Abstract
  Label: Abstract
  Group: Ab
  Data: Reactive direct current (DC) magnetron sputtering (rDCMS) and reactive high target utilization sputtering (rHiTUS) of compositionally complex TiZrHfVNbTa–N coatings were systematically investigated with varying nitrogen flow. The study combined experimental measurements of total and partial nitrogen pressures with simulations based on Berg's model. Both deposition systems exhibited hysteresis‐free behavior, characterized by two distinct nitrogen consumption regimes: (1) a nearly linear increase up to a critical nitrogen flow (≈4 sccm in rDCMS and ≈6 sccm in rHiTUS), and (2) a saturation regime. Simulations reproduced these trends and confirmed that hysteresis suppression originates from high pumping speeds (pumping speed/volume ratio > > 4 s−1). The applicability of Berg's model to rHiTUS was validated by the strong agreement between experiments and modeling, supporting the assumption that the fundamental processes of reactive sputtering—target sputtering, poisoning, and nitride formation—are identical in DCMS and HiTUS. The main technological benefit of operating in a hysteresis‐free regime is that coating composition and properties can be controlled solely through nitrogen flow adjustment. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of International Journal of Applied Ceramic Technology is the property of Wiley-Blackwell and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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RecordInfo BibRecord:
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    Identifiers:
      – Type: doi
        Value: 10.1111/ijac.70087
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      – Code: eng
        Text: English
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        PageCount: 12
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    Subjects:
      – SubjectFull: Reactive sputtering
        Type: general
      – SubjectFull: Hysteresis
        Type: general
      – SubjectFull: Protective coatings
        Type: general
      – SubjectFull: Magnetron sputtering
        Type: general
    Titles:
      – TitleFull: Understanding hysteresis‐free reactive DC magnetron and high target utilization sputtering of TiZrHfVNbTa‐N coatings.
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            NameFull: Lofaj, František
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            NameFull: Fekete, Matej
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            NameFull: Hviščová, Petra
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            NameFull: Petruš, Ondrej
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              M: 02
              Text: Feb2026
              Type: published
              Y: 2026
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