APA (7th ed.) Citation

Shinoda, K., Nguyen, T., Yokogawa, K., Izawa, M., Ishikawa, K., & Hori, M. (2026). Thermal-cyclic etching of SiGe with selective removal over Ge using fluorocarbon-based plasma and infrared heating. Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films, 44(2), 1. https://doi.org/10.1116/6.0005128

Chicago Style (17th ed.) Citation

Shinoda, Kazunori, Thi-Thuy-Nga Nguyen, Kenetsu Yokogawa, Masaru Izawa, Kenji Ishikawa, and Masaru Hori. "Thermal-cyclic Etching of SiGe with Selective Removal over Ge Using Fluorocarbon-based Plasma and Infrared Heating." Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films 44, no. 2 (2026): 1. https://doi.org/10.1116/6.0005128.

MLA (9th ed.) Citation

Shinoda, Kazunori, et al. "Thermal-cyclic Etching of SiGe with Selective Removal over Ge Using Fluorocarbon-based Plasma and Infrared Heating." Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films, vol. 44, no. 2, 2026, p. 1, https://doi.org/10.1116/6.0005128.