Thermal-cyclic etching of SiGe with selective removal over Ge using fluorocarbon-based plasma and infrared heating. - Shinoda, Kazunori; Nguyen, Thi-Thuy-Nga; Yokogawa, Kenetsu; Izawa, Masaru; Ishikawa, Kenji; Hori, Masaru (Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films, 2026)