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Impact of deposition rate on structural, optical, and electrical properties of WS2 thin films.

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Title: Impact of deposition rate on structural, optical, and electrical properties of WS2 thin films.
Authors: Jafari, Monireh1 (AUTHOR) monireh_jafari@birjand.ac.ir, Shahidi, Mohammad Mahdi2,3 (AUTHOR) mmahdishahidi@gmail.com, Ehsani, Mohammad Hossein3 (AUTHOR) ehsani@semnan.ac.ir
Source: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films. Mar2026, Vol. 44 Issue 2, p1-9. 9p.
Subjects: Thin films, Radiofrequency sputtering, Electric properties, Sputtering (Physics), Nanostructured materials, Morphology, Optical properties, Crystallinity
Abstract: In this work, WS2 thin films approximately 200 nm thick were successfully synthesized on glass substrates using RF sputtering, applying deposition rates of 1 and 2 Å/s. The impact of these rates on the films' structure, surface morphology, optical properties, and electrical characteristics was thoroughly investigated. Field emission scanning electron microscope analysis revealed a morphology transition from nanoparticles to nanosheets as the rate increased. Atomic force microscope (AFM) analysis revealed that higher deposition rates increased grain size, nanosheet formation, and surface roughness in WS2 films. X-ray diffraction and Raman results showed enhanced crystallinity and the emergence of multiple growth orientations at higher deposition rates. Optical measurements indicated reduced transmittance and bandgap in the higher-rate film, attributed to morphological and structural improvements. Hall effect results showed significantly enhanced electrical conductivity in the nanosheet-based film due to increased carrier concentration and mobility. The Urbach energy values were also extracted, showing lower disorder in the high-rate film (79 meV) compared to the low-rate sample (106 meV). These findings underscore the key role of deposition rate in tailoring WS2 thin film properties for optoelectronic applications. [ABSTRACT FROM AUTHOR]
Copyright of Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films is the property of American Institute of Physics and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
Database: Engineering Source
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DbLabel: Engineering Source
An: 192180329
AccessLevel: 6
PubType: Academic Journal
PubTypeId: academicJournal
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  Data: Impact of deposition rate on structural, optical, and electrical properties of WS<subscript>2</subscript> thin films.
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  Data: <searchLink fieldCode="AR" term="%22Jafari%2C+Monireh%22">Jafari, Monireh</searchLink><relatesTo>1</relatesTo> (AUTHOR)<i> monireh_jafari@birjand.ac.ir</i><br /><searchLink fieldCode="AR" term="%22Shahidi%2C+Mohammad+Mahdi%22">Shahidi, Mohammad Mahdi</searchLink><relatesTo>2,3</relatesTo> (AUTHOR)<i> mmahdishahidi@gmail.com</i><br /><searchLink fieldCode="AR" term="%22Ehsani%2C+Mohammad+Hossein%22">Ehsani, Mohammad Hossein</searchLink><relatesTo>3</relatesTo> (AUTHOR)<i> ehsani@semnan.ac.ir</i>
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  Data: <searchLink fieldCode="DE" term="%22Thin+films%22">Thin films</searchLink><br /><searchLink fieldCode="DE" term="%22Radiofrequency+sputtering%22">Radiofrequency sputtering</searchLink><br /><searchLink fieldCode="DE" term="%22Electric+properties%22">Electric properties</searchLink><br /><searchLink fieldCode="DE" term="%22Sputtering+%28Physics%29%22">Sputtering (Physics)</searchLink><br /><searchLink fieldCode="DE" term="%22Nanostructured+materials%22">Nanostructured materials</searchLink><br /><searchLink fieldCode="DE" term="%22Morphology%22">Morphology</searchLink><br /><searchLink fieldCode="DE" term="%22Optical+properties%22">Optical properties</searchLink><br /><searchLink fieldCode="DE" term="%22Crystallinity%22">Crystallinity</searchLink>
– Name: Abstract
  Label: Abstract
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  Data: In this work, WS2 thin films approximately 200 nm thick were successfully synthesized on glass substrates using RF sputtering, applying deposition rates of 1 and 2 Å/s. The impact of these rates on the films' structure, surface morphology, optical properties, and electrical characteristics was thoroughly investigated. Field emission scanning electron microscope analysis revealed a morphology transition from nanoparticles to nanosheets as the rate increased. Atomic force microscope (AFM) analysis revealed that higher deposition rates increased grain size, nanosheet formation, and surface roughness in WS2 films. X-ray diffraction and Raman results showed enhanced crystallinity and the emergence of multiple growth orientations at higher deposition rates. Optical measurements indicated reduced transmittance and bandgap in the higher-rate film, attributed to morphological and structural improvements. Hall effect results showed significantly enhanced electrical conductivity in the nanosheet-based film due to increased carrier concentration and mobility. The Urbach energy values were also extracted, showing lower disorder in the high-rate film (79 meV) compared to the low-rate sample (106 meV). These findings underscore the key role of deposition rate in tailoring WS2 thin film properties for optoelectronic applications. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films is the property of American Institute of Physics and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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RecordInfo BibRecord:
  BibEntity:
    Identifiers:
      – Type: doi
        Value: 10.1116/6.0005197
    Languages:
      – Code: eng
        Text: English
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        PageCount: 9
        StartPage: 1
    Subjects:
      – SubjectFull: Thin films
        Type: general
      – SubjectFull: Radiofrequency sputtering
        Type: general
      – SubjectFull: Electric properties
        Type: general
      – SubjectFull: Sputtering (Physics)
        Type: general
      – SubjectFull: Nanostructured materials
        Type: general
      – SubjectFull: Morphology
        Type: general
      – SubjectFull: Optical properties
        Type: general
      – SubjectFull: Crystallinity
        Type: general
    Titles:
      – TitleFull: Impact of deposition rate on structural, optical, and electrical properties of WS2 thin films.
        Type: main
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      – PersonEntity:
          Name:
            NameFull: Jafari, Monireh
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            NameFull: Shahidi, Mohammad Mahdi
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          Name:
            NameFull: Ehsani, Mohammad Hossein
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          Dates:
            – D: 01
              M: 03
              Text: Mar2026
              Type: published
              Y: 2026
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              Value: 07342101
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              Value: 44
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            – TitleFull: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films
              Type: main
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