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Computational analysis of visible three-beam interference for enhanced nonlinear response and defect-sensitive photonic structuring.

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Bibliographic Details
Title: Computational analysis of visible three-beam interference for enhanced nonlinear response and defect-sensitive photonic structuring.
Authors: Kumar, Vikas1 (AUTHOR) kumarvikas1027@gmail.com, Kumar, Ajay2 (AUTHOR), Khan, Mohd Yasir3 (AUTHOR)
Source: Optical & Quantum Electronics. Mar2026, Vol. 58 Issue 3, p1-10. 10p.
Subjects: Optical interference, Nonlinear optics, Photorefractive effect, Simulation methods & models, Sensitivity analysis
Abstract: We present a comprehensive computational analysis of visible light interference patterns from three input beams. High-contrast interference fields, like hexagonal intensity lobe lattices, are produced by carefully examining a variety of input beam characteristics, angular orientations, and polarization. The simulations are based on scalar wave theory under the paraxial approximation and are performed on a subwavelength-resolution spatial grid to resolve fine-scale intensity characteristics. Optimized patterns induce photorefractive effects in LiNbO3, permanently imprinting crystals via exposure. Defect sensitivity is evaluated in another investigation by introducing nanoscale anomalies (~ 10 nm), which result in observable disruptions in high-intensity regions of the interference pattern. Our approach makes it easier to design defect-sensitive photonic structures and offers a practical path to real-time monitoring and precise manufacturing of nonlinear optical devices. [ABSTRACT FROM AUTHOR]
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Database: Engineering Source
Description
Abstract:We present a comprehensive computational analysis of visible light interference patterns from three input beams. High-contrast interference fields, like hexagonal intensity lobe lattices, are produced by carefully examining a variety of input beam characteristics, angular orientations, and polarization. The simulations are based on scalar wave theory under the paraxial approximation and are performed on a subwavelength-resolution spatial grid to resolve fine-scale intensity characteristics. Optimized patterns induce photorefractive effects in LiNbO3, permanently imprinting crystals via exposure. Defect sensitivity is evaluated in another investigation by introducing nanoscale anomalies (~ 10 nm), which result in observable disruptions in high-intensity regions of the interference pattern. Our approach makes it easier to design defect-sensitive photonic structures and offers a practical path to real-time monitoring and precise manufacturing of nonlinear optical devices. [ABSTRACT FROM AUTHOR]
ISSN:03068919
DOI:10.1007/s11082-026-08707-5