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Computational analysis of visible three-beam interference for enhanced nonlinear response and defect-sensitive photonic structuring.

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Title: Computational analysis of visible three-beam interference for enhanced nonlinear response and defect-sensitive photonic structuring.
Authors: Kumar, Vikas1 (AUTHOR) kumarvikas1027@gmail.com, Kumar, Ajay2 (AUTHOR), Khan, Mohd Yasir3 (AUTHOR)
Source: Optical & Quantum Electronics. Mar2026, Vol. 58 Issue 3, p1-10. 10p.
Subjects: Optical interference, Nonlinear optics, Photorefractive effect, Simulation methods & models, Sensitivity analysis
Abstract: We present a comprehensive computational analysis of visible light interference patterns from three input beams. High-contrast interference fields, like hexagonal intensity lobe lattices, are produced by carefully examining a variety of input beam characteristics, angular orientations, and polarization. The simulations are based on scalar wave theory under the paraxial approximation and are performed on a subwavelength-resolution spatial grid to resolve fine-scale intensity characteristics. Optimized patterns induce photorefractive effects in LiNbO3, permanently imprinting crystals via exposure. Defect sensitivity is evaluated in another investigation by introducing nanoscale anomalies (~ 10 nm), which result in observable disruptions in high-intensity regions of the interference pattern. Our approach makes it easier to design defect-sensitive photonic structures and offers a practical path to real-time monitoring and precise manufacturing of nonlinear optical devices. [ABSTRACT FROM AUTHOR]
Copyright of Optical & Quantum Electronics is the property of Springer Nature and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
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DbLabel: Engineering Source
An: 192418351
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PubTypeId: academicJournal
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  Data: Computational analysis of visible three-beam interference for enhanced nonlinear response and defect-sensitive photonic structuring.
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  Data: <searchLink fieldCode="AR" term="%22Kumar%2C+Vikas%22">Kumar, Vikas</searchLink><relatesTo>1</relatesTo> (AUTHOR)<i> kumarvikas1027@gmail.com</i><br /><searchLink fieldCode="AR" term="%22Kumar%2C+Ajay%22">Kumar, Ajay</searchLink><relatesTo>2</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Khan%2C+Mohd+Yasir%22">Khan, Mohd Yasir</searchLink><relatesTo>3</relatesTo> (AUTHOR)
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  Data: <searchLink fieldCode="JN" term="%22Optical+%26+Quantum+Electronics%22">Optical & Quantum Electronics</searchLink>. Mar2026, Vol. 58 Issue 3, p1-10. 10p.
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  Data: <searchLink fieldCode="DE" term="%22Optical+interference%22">Optical interference</searchLink><br /><searchLink fieldCode="DE" term="%22Nonlinear+optics%22">Nonlinear optics</searchLink><br /><searchLink fieldCode="DE" term="%22Photorefractive+effect%22">Photorefractive effect</searchLink><br /><searchLink fieldCode="DE" term="%22Simulation+methods+%26+models%22">Simulation methods & models</searchLink><br /><searchLink fieldCode="DE" term="%22Sensitivity+analysis%22">Sensitivity analysis</searchLink>
– Name: Abstract
  Label: Abstract
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  Data: We present a comprehensive computational analysis of visible light interference patterns from three input beams. High-contrast interference fields, like hexagonal intensity lobe lattices, are produced by carefully examining a variety of input beam characteristics, angular orientations, and polarization. The simulations are based on scalar wave theory under the paraxial approximation and are performed on a subwavelength-resolution spatial grid to resolve fine-scale intensity characteristics. Optimized patterns induce photorefractive effects in LiNbO3, permanently imprinting crystals via exposure. Defect sensitivity is evaluated in another investigation by introducing nanoscale anomalies (~ 10 nm), which result in observable disruptions in high-intensity regions of the interference pattern. Our approach makes it easier to design defect-sensitive photonic structures and offers a practical path to real-time monitoring and precise manufacturing of nonlinear optical devices. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of Optical & Quantum Electronics is the property of Springer Nature and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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        Value: 10.1007/s11082-026-08707-5
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      – Code: eng
        Text: English
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        PageCount: 10
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    Subjects:
      – SubjectFull: Optical interference
        Type: general
      – SubjectFull: Nonlinear optics
        Type: general
      – SubjectFull: Photorefractive effect
        Type: general
      – SubjectFull: Simulation methods & models
        Type: general
      – SubjectFull: Sensitivity analysis
        Type: general
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      – TitleFull: Computational analysis of visible three-beam interference for enhanced nonlinear response and defect-sensitive photonic structuring.
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              M: 03
              Text: Mar2026
              Type: published
              Y: 2026
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