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Effect of Boride Diffusion Barrier on High-Temperature Oxidation Behavior of Electrodeposited Mo-Si-B Composite Coating.

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Title: Effect of Boride Diffusion Barrier on High-Temperature Oxidation Behavior of Electrodeposited Mo-Si-B Composite Coating.
Authors: Zhang, Yalong1,2 (AUTHOR), Wang, Qian1 (AUTHOR) qwang12s@alum.imr.ac.cn, Hong, Mingyang1 (AUTHOR), Zhang, Junwei1 (AUTHOR)
Source: Journal of Materials Engineering & Performance. Apr2026, Vol. 35 Issue 14, p13981-13992. 12p.
Subjects: Diffusion barriers, Oxidation, Surface coatings, Composite coating, Electroplating
Abstract: Mo-Si-B composite coating was successfully prepared on molybdenum substrate by a two-step molten salt electrodeposition, including boronizing and siliconizing. The high-temperature oxidation behavior of Mo-Si-B composite coating was evaluated. The results showed that Mo-Si-B composite coatings prepared under different siliconizing times all presented a double-layer structure with an inner boride layer and an outer silicide layer. The inner boride layer could function as a diffusion barrier to limit the internal diffusion of silicon since the thickness of the outer silicide layer in the composite coating was much less than that of the silicide coating deposited directly on molybdenum. A continuous and dense SiO2-B2O3 composite oxide film was formed on the surface of Mo-Si-B coating after oxidation at 1000 °C, which could effectively block the further entry of oxygen. The original boride layer and Mo5SiB2 layer formed during oxidation could hinder the internal diffusion of Si and inhibit the degradation of MoSi2. [ABSTRACT FROM AUTHOR]
Copyright of Journal of Materials Engineering & Performance is the property of Springer Nature and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
Database: Engineering Source
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DbLabel: Engineering Source
An: 193006720
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  Data: Effect of Boride Diffusion Barrier on High-Temperature Oxidation Behavior of Electrodeposited Mo-Si-B Composite Coating.
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  Data: <searchLink fieldCode="AR" term="%22Zhang%2C+Yalong%22">Zhang, Yalong</searchLink><relatesTo>1,2</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Wang%2C+Qian%22">Wang, Qian</searchLink><relatesTo>1</relatesTo> (AUTHOR)<i> qwang12s@alum.imr.ac.cn</i><br /><searchLink fieldCode="AR" term="%22Hong%2C+Mingyang%22">Hong, Mingyang</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Zhang%2C+Junwei%22">Zhang, Junwei</searchLink><relatesTo>1</relatesTo> (AUTHOR)
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+Materials+Engineering+%26+Performance%22">Journal of Materials Engineering & Performance</searchLink>. Apr2026, Vol. 35 Issue 14, p13981-13992. 12p.
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  Data: <searchLink fieldCode="DE" term="%22Diffusion+barriers%22">Diffusion barriers</searchLink><br /><searchLink fieldCode="DE" term="%22Oxidation%22">Oxidation</searchLink><br /><searchLink fieldCode="DE" term="%22Surface+coatings%22">Surface coatings</searchLink><br /><searchLink fieldCode="DE" term="%22Composite+coating%22">Composite coating</searchLink><br /><searchLink fieldCode="DE" term="%22Electroplating%22">Electroplating</searchLink>
– Name: Abstract
  Label: Abstract
  Group: Ab
  Data: Mo-Si-B composite coating was successfully prepared on molybdenum substrate by a two-step molten salt electrodeposition, including boronizing and siliconizing. The high-temperature oxidation behavior of Mo-Si-B composite coating was evaluated. The results showed that Mo-Si-B composite coatings prepared under different siliconizing times all presented a double-layer structure with an inner boride layer and an outer silicide layer. The inner boride layer could function as a diffusion barrier to limit the internal diffusion of silicon since the thickness of the outer silicide layer in the composite coating was much less than that of the silicide coating deposited directly on molybdenum. A continuous and dense SiO2-B2O3 composite oxide film was formed on the surface of Mo-Si-B coating after oxidation at 1000 °C, which could effectively block the further entry of oxygen. The original boride layer and Mo5SiB2 layer formed during oxidation could hinder the internal diffusion of Si and inhibit the degradation of MoSi2. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of Journal of Materials Engineering & Performance is the property of Springer Nature and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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        Value: 10.1007/s11665-025-12607-2
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      – Code: eng
        Text: English
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        PageCount: 12
        StartPage: 13981
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      – SubjectFull: Diffusion barriers
        Type: general
      – SubjectFull: Oxidation
        Type: general
      – SubjectFull: Surface coatings
        Type: general
      – SubjectFull: Composite coating
        Type: general
      – SubjectFull: Electroplating
        Type: general
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      – TitleFull: Effect of Boride Diffusion Barrier on High-Temperature Oxidation Behavior of Electrodeposited Mo-Si-B Composite Coating.
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            NameFull: Zhang, Yalong
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            NameFull: Wang, Qian
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            NameFull: Hong, Mingyang
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            NameFull: Zhang, Junwei
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              M: 04
              Text: Apr2026
              Type: published
              Y: 2026
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