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Improving the performance of Mo/Si/C multilayers through selective substrate bias-assistance.

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Title: Improving the performance of Mo/Si/C multilayers through selective substrate bias-assistance.
Authors: Song, Hongxuan1,2 (AUTHOR), Du, Wenyun1 (AUTHOR) wenyundu@siom.ac.cn, Cao, Longxun1,2 (AUTHOR), Lu, Zhenqi1 (AUTHOR), Xu, Wenjie3 (AUTHOR), Shao, Jianda1,2,4 (AUTHOR), Zhu, Meiping1,2,4 (AUTHOR) bree@siom.ac.cn
Source: Applied Surface Science. Aug2026, Vol. 736, pN.PAG-N.PAG. 1p.
Subjects: Optical multilayers, Sputtering (Physics), Optical properties, Multilayered thin films, Surface coatings, Magnetron sputtering
Abstract: [Display omitted] • A selective substrate bias-assistance sputtering technique is developed. • Bias on Si leads to increased diffusion while bias on Mo/C has the opposite effect. • Optimizing the bias-assisted ratio of Si layers increased the EUV reflectivity by 2.6%. Substrate bias-assisted magnetron sputtering enables effective regulation of multilayer microstructures. However, investigations into selective bias-assisted deposition for extreme ultraviolet (EUV) multilayer coatings incorporating barrier layers have yet to be conducted. In this study, we develop a selective bias-assistance device that applies a controlled fraction of substrate bias to designated material layers in Mo/Si/C multilayers. By jointly analyzing crystallization and diffusion, we show that bias applied only to the Si layers triggers a self-accelerating intermixing–amorphization–enhanced-diffusion cycle at the Si-on-Mo interface, whereas bias on the Mo and C layers densifies these layers, enhances crystallization, and suppresses this cycle. By applying bias to both the Mo and C layers and optimizing the bias-assistance fraction during Si-layer deposition, the EUV reflectivity is increased by 2.6% compared with the unbiased multilayer. In summary, by considering the influences of bias on different material layers and optimizing the applied bias ratio, it is possible to engineer the interfaces and enhance the optical performance of multilayers. [ABSTRACT FROM AUTHOR]
Copyright of Applied Surface Science is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
Database: Engineering Source
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Header DbId: egs
DbLabel: Engineering Source
An: 193089820
AccessLevel: 6
PubType: Academic Journal
PubTypeId: academicJournal
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  Data: Improving the performance of Mo/Si/C multilayers through selective substrate bias-assistance.
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  Data: <searchLink fieldCode="AR" term="%22Song%2C+Hongxuan%22">Song, Hongxuan</searchLink><relatesTo>1,2</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Du%2C+Wenyun%22">Du, Wenyun</searchLink><relatesTo>1</relatesTo> (AUTHOR)<i> wenyundu@siom.ac.cn</i><br /><searchLink fieldCode="AR" term="%22Cao%2C+Longxun%22">Cao, Longxun</searchLink><relatesTo>1,2</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Lu%2C+Zhenqi%22">Lu, Zhenqi</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Xu%2C+Wenjie%22">Xu, Wenjie</searchLink><relatesTo>3</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Shao%2C+Jianda%22">Shao, Jianda</searchLink><relatesTo>1,2,4</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Zhu%2C+Meiping%22">Zhu, Meiping</searchLink><relatesTo>1,2,4</relatesTo> (AUTHOR)<i> bree@siom.ac.cn</i>
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  Data: <searchLink fieldCode="JN" term="%22Applied+Surface+Science%22">Applied Surface Science</searchLink>. Aug2026, Vol. 736, pN.PAG-N.PAG. 1p.
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  Data: <searchLink fieldCode="DE" term="%22Optical+multilayers%22">Optical multilayers</searchLink><br /><searchLink fieldCode="DE" term="%22Sputtering+%28Physics%29%22">Sputtering (Physics)</searchLink><br /><searchLink fieldCode="DE" term="%22Optical+properties%22">Optical properties</searchLink><br /><searchLink fieldCode="DE" term="%22Multilayered+thin+films%22">Multilayered thin films</searchLink><br /><searchLink fieldCode="DE" term="%22Surface+coatings%22">Surface coatings</searchLink><br /><searchLink fieldCode="DE" term="%22Magnetron+sputtering%22">Magnetron sputtering</searchLink>
– Name: Abstract
  Label: Abstract
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  Data: [Display omitted] • A selective substrate bias-assistance sputtering technique is developed. • Bias on Si leads to increased diffusion while bias on Mo/C has the opposite effect. • Optimizing the bias-assisted ratio of Si layers increased the EUV reflectivity by 2.6%. Substrate bias-assisted magnetron sputtering enables effective regulation of multilayer microstructures. However, investigations into selective bias-assisted deposition for extreme ultraviolet (EUV) multilayer coatings incorporating barrier layers have yet to be conducted. In this study, we develop a selective bias-assistance device that applies a controlled fraction of substrate bias to designated material layers in Mo/Si/C multilayers. By jointly analyzing crystallization and diffusion, we show that bias applied only to the Si layers triggers a self-accelerating intermixing–amorphization–enhanced-diffusion cycle at the Si-on-Mo interface, whereas bias on the Mo and C layers densifies these layers, enhances crystallization, and suppresses this cycle. By applying bias to both the Mo and C layers and optimizing the bias-assistance fraction during Si-layer deposition, the EUV reflectivity is increased by 2.6% compared with the unbiased multilayer. In summary, by considering the influences of bias on different material layers and optimizing the applied bias ratio, it is possible to engineer the interfaces and enhance the optical performance of multilayers. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of Applied Surface Science is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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RecordInfo BibRecord:
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    Identifiers:
      – Type: doi
        Value: 10.1016/j.apsusc.2026.166770
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      – Code: eng
        Text: English
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      Pagination:
        PageCount: 1
        StartPage: N.PAG
    Subjects:
      – SubjectFull: Optical multilayers
        Type: general
      – SubjectFull: Sputtering (Physics)
        Type: general
      – SubjectFull: Optical properties
        Type: general
      – SubjectFull: Multilayered thin films
        Type: general
      – SubjectFull: Surface coatings
        Type: general
      – SubjectFull: Magnetron sputtering
        Type: general
    Titles:
      – TitleFull: Improving the performance of Mo/Si/C multilayers through selective substrate bias-assistance.
        Type: main
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      – PersonEntity:
          Name:
            NameFull: Song, Hongxuan
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          Name:
            NameFull: Du, Wenyun
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            NameFull: Cao, Longxun
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            NameFull: Lu, Zhenqi
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            NameFull: Xu, Wenjie
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            NameFull: Zhu, Meiping
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          Dates:
            – D: 01
              M: 08
              Text: Aug2026
              Type: published
              Y: 2026
          Identifiers:
            – Type: issn-print
              Value: 01694332
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              Value: 736
          Titles:
            – TitleFull: Applied Surface Science
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