Metal-assisted chemical etching for controllable fabrication of silicon nanochannels.
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| Title: | Metal-assisted chemical etching for controllable fabrication of silicon nanochannels. |
|---|---|
| Authors: | Chen, Zixiu1 (AUTHOR), An, Nan1 (AUTHOR), Miao, Longfei2 (AUTHOR) longfei@jxnu.edu.cn, Zhang, Yuping3 (AUTHOR) zhangyuping@gem.com.cn, Zhai, Yueming1 (AUTHOR) lwang@jxnu.edu.cn |
| Source: | Nanotechnology. 2026, Vol. 37 Issue 17, p1-11. 11p. |
| Subjects: | Helical structure, Gold nanoparticles, Electron microscopy, Nanopores, Etching reagents |
| Abstract: | Silicon nanochannels possess adjustable structural characteristics and excellent mechanical properties, and have great application potential in nanoelectromechanical systems, seawater desalination, and nanoreactors. However, achieving controllable synthesis and precise structural modulation remains highly challenging. Metal-assisted chemical etching (MACE), with its advantages of simple operation and low cost, has been widely used in the fabrication of silicon nanochannels. This study systematically investigates the morphological regulation mechanism of silicon nanochannels prepared via MACE, with a focus on analyzing the influence of etching solution composition, gold nanoparticle microstructure, and reaction time on the formation of helical structures. By combining thermomechanical molding for replicating nanochannel structures with electron microscopy characterization, comprehensive morphological analysis was achieved. The results indicate that an etching solution ratio of HF:H₂O₂:H₂O = 6:4:5 (v/v/v) yields helical nanochannels with greater length and higher yield. Increasing the HF proportion promotes the formation of helical structures; however, excessively high HF concentration leads to severe lateral etching, inhibiting deep channel propagation. The study further reveals an externally-driven mechanism for helical structure formation: the hydrogen bubbles generated during the reaction and the flow of the etching solution exert thrust on the nanoparticles, causing them to move and carve helical pathways. [ABSTRACT FROM AUTHOR] |
| Copyright of Nanotechnology is the property of IOP Publishing and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.) | |
| Database: | Engineering Source |
| FullText | Text: Availability: 0 |
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| Header | DbId: egs DbLabel: Engineering Source An: 193284706 AccessLevel: 6 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| Items | – Name: Title Label: Title Group: Ti Data: Metal-assisted chemical etching for controllable fabrication of silicon nanochannels. – Name: Author Label: Authors Group: Au Data: <searchLink fieldCode="AR" term="%22Chen%2C+Zixiu%22">Chen, Zixiu</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22An%2C+Nan%22">An, Nan</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Miao%2C+Longfei%22">Miao, Longfei</searchLink><relatesTo>2</relatesTo> (AUTHOR)<i> longfei@jxnu.edu.cn</i><br /><searchLink fieldCode="AR" term="%22Zhang%2C+Yuping%22">Zhang, Yuping</searchLink><relatesTo>3</relatesTo> (AUTHOR)<i> zhangyuping@gem.com.cn</i><br /><searchLink fieldCode="AR" term="%22Zhai%2C+Yueming%22">Zhai, Yueming</searchLink><relatesTo>1</relatesTo> (AUTHOR)<i> lwang@jxnu.edu.cn</i> – Name: TitleSource Label: Source Group: Src Data: <searchLink fieldCode="JN" term="%22Nanotechnology%22">Nanotechnology</searchLink>. 2026, Vol. 37 Issue 17, p1-11. 11p. – Name: Subject Label: Subjects Group: Su Data: <searchLink fieldCode="DE" term="%22Helical+structure%22">Helical structure</searchLink><br /><searchLink fieldCode="DE" term="%22Gold+nanoparticles%22">Gold nanoparticles</searchLink><br /><searchLink fieldCode="DE" term="%22Electron+microscopy%22">Electron microscopy</searchLink><br /><searchLink fieldCode="DE" term="%22Nanopores%22">Nanopores</searchLink><br /><searchLink fieldCode="DE" term="%22Etching+reagents%22">Etching reagents</searchLink> – Name: Abstract Label: Abstract Group: Ab Data: Silicon nanochannels possess adjustable structural characteristics and excellent mechanical properties, and have great application potential in nanoelectromechanical systems, seawater desalination, and nanoreactors. However, achieving controllable synthesis and precise structural modulation remains highly challenging. Metal-assisted chemical etching (MACE), with its advantages of simple operation and low cost, has been widely used in the fabrication of silicon nanochannels. This study systematically investigates the morphological regulation mechanism of silicon nanochannels prepared via MACE, with a focus on analyzing the influence of etching solution composition, gold nanoparticle microstructure, and reaction time on the formation of helical structures. By combining thermomechanical molding for replicating nanochannel structures with electron microscopy characterization, comprehensive morphological analysis was achieved. The results indicate that an etching solution ratio of HF:H₂O₂:H₂O = 6:4:5 (v/v/v) yields helical nanochannels with greater length and higher yield. Increasing the HF proportion promotes the formation of helical structures; however, excessively high HF concentration leads to severe lateral etching, inhibiting deep channel propagation. The study further reveals an externally-driven mechanism for helical structure formation: the hydrogen bubbles generated during the reaction and the flow of the etching solution exert thrust on the nanoparticles, causing them to move and carve helical pathways. [ABSTRACT FROM AUTHOR] – Name: AbstractSuppliedCopyright Label: Group: Ab Data: <i>Copyright of Nanotechnology is the property of IOP Publishing and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.) |
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| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1088/1361-6528/ae607e Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 11 StartPage: 1 Subjects: – SubjectFull: Helical structure Type: general – SubjectFull: Gold nanoparticles Type: general – SubjectFull: Electron microscopy Type: general – SubjectFull: Nanopores Type: general – SubjectFull: Etching reagents Type: general Titles: – TitleFull: Metal-assisted chemical etching for controllable fabrication of silicon nanochannels. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Chen, Zixiu – PersonEntity: Name: NameFull: An, Nan – PersonEntity: Name: NameFull: Miao, Longfei – PersonEntity: Name: NameFull: Zhang, Yuping – PersonEntity: Name: NameFull: Zhai, Yueming IsPartOfRelationships: – BibEntity: Dates: – D: 01 M: 05 Text: 2026 Type: published Y: 2026 Identifiers: – Type: issn-print Value: 09574484 Numbering: – Type: volume Value: 37 – Type: issue Value: 17 Titles: – TitleFull: Nanotechnology Type: main |
| ResultId | 1 |
