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Microstructure analysis of low electron density contrast metallic multilayers using resonant X‐ray reflectivity.

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Title: Microstructure analysis of low electron density contrast metallic multilayers using resonant X‐ray reflectivity.
Authors: Rao, P. N.1 (AUTHOR) pnrao@rrcat.gov.in, Swami, M. K.1,2 (AUTHOR), Srivastava, H.1,2 (AUTHOR), Sahu, P.1 (AUTHOR), Ghosh, A.1 (AUTHOR), Rai, S. K.1,2 (AUTHOR)
Source: Journal of Synchrotron Radiation. May2026, Vol. 33 Issue 3, p708-714. 7p.
Subjects: X-ray reflectometry, Multilayered thin films, Electron density, Interfacial roughness, Microstructure, Thin films, Magnetron sputtering
Abstract: Resonant X‐ray reflectivity (RXRR) was employed to investigate the microstructural properties, such as layer thicknesses, densities and interface widths, of metallic multilayers with low electron density contrast. Cu/Nb multilayers were chosen as a model system to demonstrate the enhanced sensitivity of RXRR. These multilayers, consisting of ten bilayers with varying period thicknesses, were deposited using magnetron sputtering. X‐ray reflectivity measurements were performed at the K‐absorption edges of both Cu and Nb, as well as using conventional Cu Kα radiation. A pronounced difference was observed between reflectivity profiles acquired at these different energies. The enhanced contrast near the absorption edges enabled an effective means to extract microstructural information. The results demonstrate that RXRR is a powerful technique for characterizing metallic multilayers with low electron density contrast. [ABSTRACT FROM AUTHOR]
Copyright of Journal of Synchrotron Radiation is the property of Wiley-Blackwell and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
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An: 193520503
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  Label: Title
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  Data: Microstructure analysis of low electron density contrast metallic multilayers using resonant X‐ray reflectivity.
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+Synchrotron+Radiation%22">Journal of Synchrotron Radiation</searchLink>. May2026, Vol. 33 Issue 3, p708-714. 7p.
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  Data: <searchLink fieldCode="DE" term="%22X-ray+reflectometry%22">X-ray reflectometry</searchLink><br /><searchLink fieldCode="DE" term="%22Multilayered+thin+films%22">Multilayered thin films</searchLink><br /><searchLink fieldCode="DE" term="%22Electron+density%22">Electron density</searchLink><br /><searchLink fieldCode="DE" term="%22Interfacial+roughness%22">Interfacial roughness</searchLink><br /><searchLink fieldCode="DE" term="%22Microstructure%22">Microstructure</searchLink><br /><searchLink fieldCode="DE" term="%22Thin+films%22">Thin films</searchLink><br /><searchLink fieldCode="DE" term="%22Magnetron+sputtering%22">Magnetron sputtering</searchLink>
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  Data: Resonant X‐ray reflectivity (RXRR) was employed to investigate the microstructural properties, such as layer thicknesses, densities and interface widths, of metallic multilayers with low electron density contrast. Cu/Nb multilayers were chosen as a model system to demonstrate the enhanced sensitivity of RXRR. These multilayers, consisting of ten bilayers with varying period thicknesses, were deposited using magnetron sputtering. X‐ray reflectivity measurements were performed at the K‐absorption edges of both Cu and Nb, as well as using conventional Cu Kα radiation. A pronounced difference was observed between reflectivity profiles acquired at these different energies. The enhanced contrast near the absorption edges enabled an effective means to extract microstructural information. The results demonstrate that RXRR is a powerful technique for characterizing metallic multilayers with low electron density contrast. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of Journal of Synchrotron Radiation is the property of Wiley-Blackwell and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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RecordInfo BibRecord:
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    Identifiers:
      – Type: doi
        Value: 10.1107/S1600577526001827
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      – Code: eng
        Text: English
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      Pagination:
        PageCount: 7
        StartPage: 708
    Subjects:
      – SubjectFull: X-ray reflectometry
        Type: general
      – SubjectFull: Multilayered thin films
        Type: general
      – SubjectFull: Electron density
        Type: general
      – SubjectFull: Interfacial roughness
        Type: general
      – SubjectFull: Microstructure
        Type: general
      – SubjectFull: Thin films
        Type: general
      – SubjectFull: Magnetron sputtering
        Type: general
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      – TitleFull: Microstructure analysis of low electron density contrast metallic multilayers using resonant X‐ray reflectivity.
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          Name:
            NameFull: Rao, P. N.
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            NameFull: Swami, M. K.
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            NameFull: Srivastava, H.
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            – D: 01
              M: 05
              Text: May2026
              Type: published
              Y: 2026
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              Value: 33
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