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Research on Plasma Characteristics of High-Power Impulse Magnetron Sputtering Ti-Nb-Cr Target and Its Effect on Film Properties.

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Title: Research on Plasma Characteristics of High-Power Impulse Magnetron Sputtering Ti-Nb-Cr Target and Its Effect on Film Properties.
Authors: Chen, Changzi1 (AUTHOR), Li, Yantao2 (AUTHOR), Ma, Donglin3 (AUTHOR), Jiang, Quanxin1 (AUTHOR), Peng, Jingjing1,2 (AUTHOR), Wang, Jianfei1,3 (AUTHOR) wangjianfeiimr@ustc.edu
Source: Materials (1996-1944). May2026, Vol. 19 Issue 9, p1710. 15p.
Subjects: Magnetron sputtering, Thin films, Corrosion resistance, Emission spectroscopy, Microstructure, Mechanical behavior of materials, Plasma dynamics
Abstract: High-power impulse magnetron sputtering (HiPIMS) technology was used to deposit Ti-Nb-Cr films on Si (100) and 316L substrates by changing the peak power of the Ti-Nb-Cr target. Optical emission spectroscopy (OES) was used to study the effect of peak power on the ion atomic arrival ratio in front of the substrate. Experimental instruments such as an X-ray diffraction (XRD) device, scanning electron microscope (SEM), transmission electron microscope (TEM), nanohardness tester, ball-disk reciprocating friction machine, and electrochemical workstation were used to study the effects of the atomic arrival ratio of Ti, Nb, and Cr ions on the microstructure, mechanical properties, and corrosion resistance of Ti-Nb-Cr films. The results show that when the peak power is 67.84 kW, the ion atomic arrival ratio of Ti reaches 47.57%, the ion atomic arrival ratio of Nb reaches 39.41%, and the ion atomic arrival ratio of Cr reaches 10.6%. The ion atomic arrival ratio is doubled compared to the peak power of 51.04 kW. The films prepared at different peak powers all show diffraction peaks of the BCC structure. At high power levels, the TiNbCr films exhibit reduced residual compressive stress, although this may be accompanied by lower hardness and wear resistance. [ABSTRACT FROM AUTHOR]
Copyright of Materials (1996-1944) is the property of MDPI and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
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DbLabel: Engineering Source
An: 193715516
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Items – Name: Title
  Label: Title
  Group: Ti
  Data: Research on Plasma Characteristics of High-Power Impulse Magnetron Sputtering Ti-Nb-Cr Target and Its Effect on Film Properties.
– Name: Author
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  Data: <searchLink fieldCode="AR" term="%22Chen%2C+Changzi%22">Chen, Changzi</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Li%2C+Yantao%22">Li, Yantao</searchLink><relatesTo>2</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Ma%2C+Donglin%22">Ma, Donglin</searchLink><relatesTo>3</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Jiang%2C+Quanxin%22">Jiang, Quanxin</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Peng%2C+Jingjing%22">Peng, Jingjing</searchLink><relatesTo>1,2</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Wang%2C+Jianfei%22">Wang, Jianfei</searchLink><relatesTo>1,3</relatesTo> (AUTHOR)<i> wangjianfeiimr@ustc.edu</i>
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  Data: <searchLink fieldCode="JN" term="%22Materials+%281996-1944%29%22">Materials (1996-1944)</searchLink>. May2026, Vol. 19 Issue 9, p1710. 15p.
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  Data: <searchLink fieldCode="DE" term="%22Magnetron+sputtering%22">Magnetron sputtering</searchLink><br /><searchLink fieldCode="DE" term="%22Thin+films%22">Thin films</searchLink><br /><searchLink fieldCode="DE" term="%22Corrosion+resistance%22">Corrosion resistance</searchLink><br /><searchLink fieldCode="DE" term="%22Emission+spectroscopy%22">Emission spectroscopy</searchLink><br /><searchLink fieldCode="DE" term="%22Microstructure%22">Microstructure</searchLink><br /><searchLink fieldCode="DE" term="%22Mechanical+behavior+of+materials%22">Mechanical behavior of materials</searchLink><br /><searchLink fieldCode="DE" term="%22Plasma+dynamics%22">Plasma dynamics</searchLink>
– Name: Abstract
  Label: Abstract
  Group: Ab
  Data: High-power impulse magnetron sputtering (HiPIMS) technology was used to deposit Ti-Nb-Cr films on Si (100) and 316L substrates by changing the peak power of the Ti-Nb-Cr target. Optical emission spectroscopy (OES) was used to study the effect of peak power on the ion atomic arrival ratio in front of the substrate. Experimental instruments such as an X-ray diffraction (XRD) device, scanning electron microscope (SEM), transmission electron microscope (TEM), nanohardness tester, ball-disk reciprocating friction machine, and electrochemical workstation were used to study the effects of the atomic arrival ratio of Ti, Nb, and Cr ions on the microstructure, mechanical properties, and corrosion resistance of Ti-Nb-Cr films. The results show that when the peak power is 67.84 kW, the ion atomic arrival ratio of Ti reaches 47.57%, the ion atomic arrival ratio of Nb reaches 39.41%, and the ion atomic arrival ratio of Cr reaches 10.6%. The ion atomic arrival ratio is doubled compared to the peak power of 51.04 kW. The films prepared at different peak powers all show diffraction peaks of the BCC structure. At high power levels, the TiNbCr films exhibit reduced residual compressive stress, although this may be accompanied by lower hardness and wear resistance. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of Materials (1996-1944) is the property of MDPI and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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RecordInfo BibRecord:
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    Identifiers:
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        Value: 10.3390/ma19091710
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      – Code: eng
        Text: English
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        PageCount: 15
        StartPage: 1710
    Subjects:
      – SubjectFull: Magnetron sputtering
        Type: general
      – SubjectFull: Thin films
        Type: general
      – SubjectFull: Corrosion resistance
        Type: general
      – SubjectFull: Emission spectroscopy
        Type: general
      – SubjectFull: Microstructure
        Type: general
      – SubjectFull: Mechanical behavior of materials
        Type: general
      – SubjectFull: Plasma dynamics
        Type: general
    Titles:
      – TitleFull: Research on Plasma Characteristics of High-Power Impulse Magnetron Sputtering Ti-Nb-Cr Target and Its Effect on Film Properties.
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            NameFull: Chen, Changzi
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            NameFull: Li, Yantao
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            NameFull: Ma, Donglin
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            NameFull: Jiang, Quanxin
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            NameFull: Peng, Jingjing
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            – D: 01
              M: 05
              Text: May2026
              Type: published
              Y: 2026
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              Value: 19
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              Value: 9
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