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Optimization of deposition parameters for silicon dioxide thin films synthesized by reactive pulsed-direct current magnetron sputtering.

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Title: Optimization of deposition parameters for silicon dioxide thin films synthesized by reactive pulsed-direct current magnetron sputtering.
Authors: Cruz-Gabarain, L1,2 (AUTHOR) cruzglc@ens.cnyn.unam.mx, Abundiz-Cisneros, N3 (AUTHOR), Sanginés, R3 (AUTHOR), Águila Muñoz, J3,4 (AUTHOR)
Source: Journal of Physics D: Applied Physics. 2026, Vol. 59 Issue 20, p1-14. 14p.
Subjects: Magnetron sputtering, Reactive sputtering, Current-voltage characteristics, Silica films, Refractive index, Emission spectroscopy, Optical spectroscopy
Abstract: Silicon dioxide (SiO₂) thin films were deposited by pulsed DC reactive magnetron sputtering under conditions in which discharge power and pulse frequency were systematically varied. Optical emission spectroscopy, voltage–current waveform analysis, and spectroscopic ellipsometry were combined to correlate the experimental parameters with the refractive index, extinction coefficient, and deposition rate of the films. The study shows that SiO₂ films with desirable optical characteristics can be obtained when the deposition is carried out at the optimal point identified in the characterization curves, where the transition into the poisoned regime is properly established. The integrated methodology provides a framework for optimizing pulsed-DC reactive sputtering processes and can be extended to the controlled synthesis of other compound films. [ABSTRACT FROM AUTHOR]
Copyright of Journal of Physics D: Applied Physics is the property of IOP Publishing and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
Database: Engineering Source
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Header DbId: egs
DbLabel: Engineering Source
An: 193894240
AccessLevel: 6
PubType: Academic Journal
PubTypeId: academicJournal
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  Data: Optimization of deposition parameters for silicon dioxide thin films synthesized by reactive pulsed-direct current magnetron sputtering.
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  Data: <searchLink fieldCode="AR" term="%22Cruz-Gabarain%2C+L%22">Cruz-Gabarain, L</searchLink><relatesTo>1,2</relatesTo> (AUTHOR)<i> cruzglc@ens.cnyn.unam.mx</i><br /><searchLink fieldCode="AR" term="%22Abundiz-Cisneros%2C+N%22">Abundiz-Cisneros, N</searchLink><relatesTo>3</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Sanginés%2C+R%22">Sanginés, R</searchLink><relatesTo>3</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Águila+Muñoz%2C+J%22">Águila Muñoz, J</searchLink><relatesTo>3,4</relatesTo> (AUTHOR)
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+Physics+D%3A+Applied+Physics%22">Journal of Physics D: Applied Physics</searchLink>. 2026, Vol. 59 Issue 20, p1-14. 14p.
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  Data: <searchLink fieldCode="DE" term="%22Magnetron+sputtering%22">Magnetron sputtering</searchLink><br /><searchLink fieldCode="DE" term="%22Reactive+sputtering%22">Reactive sputtering</searchLink><br /><searchLink fieldCode="DE" term="%22Current-voltage+characteristics%22">Current-voltage characteristics</searchLink><br /><searchLink fieldCode="DE" term="%22Silica+films%22">Silica films</searchLink><br /><searchLink fieldCode="DE" term="%22Refractive+index%22">Refractive index</searchLink><br /><searchLink fieldCode="DE" term="%22Emission+spectroscopy%22">Emission spectroscopy</searchLink><br /><searchLink fieldCode="DE" term="%22Optical+spectroscopy%22">Optical spectroscopy</searchLink>
– Name: Abstract
  Label: Abstract
  Group: Ab
  Data: Silicon dioxide (SiO₂) thin films were deposited by pulsed DC reactive magnetron sputtering under conditions in which discharge power and pulse frequency were systematically varied. Optical emission spectroscopy, voltage–current waveform analysis, and spectroscopic ellipsometry were combined to correlate the experimental parameters with the refractive index, extinction coefficient, and deposition rate of the films. The study shows that SiO₂ films with desirable optical characteristics can be obtained when the deposition is carried out at the optimal point identified in the characterization curves, where the transition into the poisoned regime is properly established. The integrated methodology provides a framework for optimizing pulsed-DC reactive sputtering processes and can be extended to the controlled synthesis of other compound films. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of Journal of Physics D: Applied Physics is the property of IOP Publishing and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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RecordInfo BibRecord:
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      – Type: doi
        Value: 10.1088/1361-6463/ae686b
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      – Code: eng
        Text: English
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        PageCount: 14
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      – SubjectFull: Magnetron sputtering
        Type: general
      – SubjectFull: Reactive sputtering
        Type: general
      – SubjectFull: Current-voltage characteristics
        Type: general
      – SubjectFull: Silica films
        Type: general
      – SubjectFull: Refractive index
        Type: general
      – SubjectFull: Emission spectroscopy
        Type: general
      – SubjectFull: Optical spectroscopy
        Type: general
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      – TitleFull: Optimization of deposition parameters for silicon dioxide thin films synthesized by reactive pulsed-direct current magnetron sputtering.
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            NameFull: Abundiz-Cisneros, N
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            NameFull: Sanginés, R
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              M: 05
              Text: 2026
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