RHEED investigation of the self-assembly of InAs quantum dots on AlGaAs.
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| Title: | RHEED investigation of the self-assembly of InAs quantum dots on AlGaAs. |
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| Authors: | Espinosa-Vega, L.I.1 (AUTHOR), Yépez-Barradas, G.1 (AUTHOR), Cortés-Mestizo, I.E1,2 (AUTHOR), Vilchis, Daniel1 (AUTHOR), Mora-Herrera, M.F.1 (AUTHOR), Vázquez-Cortés, David3 (AUTHOR), LaGrow, Alec P.3 (AUTHOR), Cuellar-Camacho, J.L.2,4 (AUTHOR), Ruíz-García, J.5 (AUTHOR), Méndez-García, Víctor H.1 (AUTHOR) victor.mendez@uaslp.mx |
| Source: | Journal of Crystal Growth. Sep2026, Vol. 690, pN.PAG-N.PAG. 1p. |
| Subjects: | Reflection high energy electron diffraction, Nucleation, Nanofabrication, Quantum dots, Diffusion kinetics, Ternary alloys, Molecular beam epitaxy |
| Abstract: | • Critical thickness remains nearly constant across Al x Ga 1−x As. • Weak dependence of nucleation onset challenges classical models. • Nucleation shifts toward diffusion-limited regime with Al content. • QD density and morphology correlate with nucleation dynamics. • Decoupled roles of strain and kinetics govern QD formation. The growth of InAs QDs on Al x Ga 1−x As layers with systematically varied Al molar fraction using molecular beam epitaxy is investigated. The growth process is monitored in situ by reflection high-energy electron diffraction (RHEED), enabling a detailed analysis of the nucleation dynamics, the critical thickness for the two-dimensional to three-dimensional (2D–3D) transition, and diffusion-related kinetic parameters within a single stacked heterostructure. Contrary to previously reported investigations performed on single heterostructures, the critical thickness of InAs on AlGaAs is found to remain nearly constant for intermediate Al content, exhibiting only minor variations, while a modest increase is observed in the AlAs limit (x = 1). Diffusion-related parameters extracted from the RHEED intensity evolution display a slight but clear dependence on the aluminum composition, indicating a progressive transition toward diffusion-limited growth. These kinetic effects are further correlated with changes in the initial surface roughness. It is also found that surface diffusion during growth, which presumably varies with Al content, has direct consequences on the pyramidal shape of the nano islands. [ABSTRACT FROM AUTHOR] |
| Copyright of Journal of Crystal Growth is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.) | |
| Database: | Engineering Source |
| FullText | Text: Availability: 0 |
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| Header | DbId: egs DbLabel: Engineering Source An: 194046629 AccessLevel: 6 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| Items | – Name: Title Label: Title Group: Ti Data: RHEED investigation of the self-assembly of InAs quantum dots on AlGaAs. – Name: Author Label: Authors Group: Au Data: <searchLink fieldCode="AR" term="%22Espinosa-Vega%2C+L%2EI%2E%22">Espinosa-Vega, L.I.</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Yépez-Barradas%2C+G%2E%22">Yépez-Barradas, G.</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Cortés-Mestizo%2C+I%2EE%22">Cortés-Mestizo, I.E</searchLink><relatesTo>1,2</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Vilchis%2C+Daniel%22">Vilchis, Daniel</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Mora-Herrera%2C+M%2EF%2E%22">Mora-Herrera, M.F.</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Vázquez-Cortés%2C+David%22">Vázquez-Cortés, David</searchLink><relatesTo>3</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22LaGrow%2C+Alec+P%2E%22">LaGrow, Alec P.</searchLink><relatesTo>3</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Cuellar-Camacho%2C+J%2EL%2E%22">Cuellar-Camacho, J.L.</searchLink><relatesTo>2,4</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Ruíz-García%2C+J%2E%22">Ruíz-García, J.</searchLink><relatesTo>5</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Méndez-García%2C+Víctor+H%2E%22">Méndez-García, Víctor H.</searchLink><relatesTo>1</relatesTo> (AUTHOR)<i> victor.mendez@uaslp.mx</i> – Name: TitleSource Label: Source Group: Src Data: <searchLink fieldCode="JN" term="%22Journal+of+Crystal+Growth%22">Journal of Crystal Growth</searchLink>. Sep2026, Vol. 690, pN.PAG-N.PAG. 1p. – Name: Subject Label: Subjects Group: Su Data: <searchLink fieldCode="DE" term="%22Reflection+high+energy+electron+diffraction%22">Reflection high energy electron diffraction</searchLink><br /><searchLink fieldCode="DE" term="%22Nucleation%22">Nucleation</searchLink><br /><searchLink fieldCode="DE" term="%22Nanofabrication%22">Nanofabrication</searchLink><br /><searchLink fieldCode="DE" term="%22Quantum+dots%22">Quantum dots</searchLink><br /><searchLink fieldCode="DE" term="%22Diffusion+kinetics%22">Diffusion kinetics</searchLink><br /><searchLink fieldCode="DE" term="%22Ternary+alloys%22">Ternary alloys</searchLink><br /><searchLink fieldCode="DE" term="%22Molecular+beam+epitaxy%22">Molecular beam epitaxy</searchLink> – Name: Abstract Label: Abstract Group: Ab Data: • Critical thickness remains nearly constant across Al x Ga 1−x As. • Weak dependence of nucleation onset challenges classical models. • Nucleation shifts toward diffusion-limited regime with Al content. • QD density and morphology correlate with nucleation dynamics. • Decoupled roles of strain and kinetics govern QD formation. The growth of InAs QDs on Al x Ga 1−x As layers with systematically varied Al molar fraction using molecular beam epitaxy is investigated. The growth process is monitored in situ by reflection high-energy electron diffraction (RHEED), enabling a detailed analysis of the nucleation dynamics, the critical thickness for the two-dimensional to three-dimensional (2D–3D) transition, and diffusion-related kinetic parameters within a single stacked heterostructure. Contrary to previously reported investigations performed on single heterostructures, the critical thickness of InAs on AlGaAs is found to remain nearly constant for intermediate Al content, exhibiting only minor variations, while a modest increase is observed in the AlAs limit (x = 1). Diffusion-related parameters extracted from the RHEED intensity evolution display a slight but clear dependence on the aluminum composition, indicating a progressive transition toward diffusion-limited growth. These kinetic effects are further correlated with changes in the initial surface roughness. It is also found that surface diffusion during growth, which presumably varies with Al content, has direct consequences on the pyramidal shape of the nano islands. [ABSTRACT FROM AUTHOR] – Name: AbstractSuppliedCopyright Label: Group: Ab Data: <i>Copyright of Journal of Crystal Growth is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.) |
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| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1016/j.jcrysgro.2026.128639 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 1 StartPage: N.PAG Subjects: – SubjectFull: Reflection high energy electron diffraction Type: general – SubjectFull: Nucleation Type: general – SubjectFull: Nanofabrication Type: general – SubjectFull: Quantum dots Type: general – SubjectFull: Diffusion kinetics Type: general – SubjectFull: Ternary alloys Type: general – SubjectFull: Molecular beam epitaxy Type: general Titles: – TitleFull: RHEED investigation of the self-assembly of InAs quantum dots on AlGaAs. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Espinosa-Vega, L.I. – PersonEntity: Name: NameFull: Yépez-Barradas, G. – PersonEntity: Name: NameFull: Cortés-Mestizo, I.E – PersonEntity: Name: NameFull: Vilchis, Daniel – PersonEntity: Name: NameFull: Mora-Herrera, M.F. – PersonEntity: Name: NameFull: Vázquez-Cortés, David – PersonEntity: Name: NameFull: LaGrow, Alec P. – PersonEntity: Name: NameFull: Cuellar-Camacho, J.L. – PersonEntity: Name: NameFull: Ruíz-García, J. – PersonEntity: Name: NameFull: Méndez-García, Víctor H. IsPartOfRelationships: – BibEntity: Dates: – D: 01 M: 09 Text: Sep2026 Type: published Y: 2026 Identifiers: – Type: issn-print Value: 00220248 Numbering: – Type: volume Value: 690 Titles: – TitleFull: Journal of Crystal Growth Type: main |
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