APA (7th ed.) Citation

Régnier, M., Kasprzak, J., Dydniański, A., Rouchouze, E., Traoré, A., Gheeraert, E., & Bonvalot, M. (2026). Development of an atomic layer etching process for diamond substrates. Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films, 44(3), 1. https://doi.org/10.1116/6.0005341

Chicago Style (17th ed.) Citation

Régnier, Marine, Jacek Kasprzak, Amadeusz Dydniański, Elliott Rouchouze, Aboulaye Traoré, Etienne Gheeraert, and Marceline Bonvalot. "Development of an Atomic Layer Etching Process for Diamond Substrates." Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films 44, no. 3 (2026): 1. https://doi.org/10.1116/6.0005341.

MLA (9th ed.) Citation

Régnier, Marine, et al. "Development of an Atomic Layer Etching Process for Diamond Substrates." Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films, vol. 44, no. 3, 2026, p. 1, https://doi.org/10.1116/6.0005341.