APA (7th ed.) Citation

Shi, C., Wang, Y., Wang, Z., Tian, Y., Chen, K., Li, L., . . . Wang, T. (2026). An Ether-Containing Hafnium–Diethylene Glycol Dry Resist Prepared by Molecular Layer Deposition for Mild-Acid Development. Nanomaterials (2079-4991), 16(12), 726. https://doi.org/10.3390/nano16120726

Chicago Style (17th ed.) Citation

Shi, Chao, Yixian Wang, Zimai Wang, Yumo Tian, Kuanlin Chen, Linyang Li, Xianhaoyan Chen, Yuan Cai, and Tuo Wang. "An Ether-Containing Hafnium–Diethylene Glycol Dry Resist Prepared by Molecular Layer Deposition for Mild-Acid Development." Nanomaterials (2079-4991) 16, no. 12 (2026): 726. https://doi.org/10.3390/nano16120726.

MLA (9th ed.) Citation

Shi, Chao, et al. "An Ether-Containing Hafnium–Diethylene Glycol Dry Resist Prepared by Molecular Layer Deposition for Mild-Acid Development." Nanomaterials (2079-4991), vol. 16, no. 12, 2026, p. 726, https://doi.org/10.3390/nano16120726.