An Ether-Containing Hafnium–Diethylene Glycol Dry Resist Prepared by Molecular Layer Deposition for Mild-Acid Development. - Shi, Chao; Wang, Yixian; Wang, Zimai; Tian, Yumo; Chen, Kuanlin; Li, Linyang; Chen, Xianhaoyan; Cai, Yuan; Wang, Tuo (Nanomaterials (2079-4991), 2026)