Synthesis of mono and bi-layer of Si nanocrystals embedded in a dielectric matrix by e-beam evaporation of SiO/SiO2 thin films

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Title: Synthesis of mono and bi-layer of Si nanocrystals embedded in a dielectric matrix by e-beam evaporation of SiO/SiO2 thin films
Authors: Perego, M.1 Michele.perego@mdm.infm.it, Fanciulli, M.1, Bonafos, C.2, Cherkashin, N.2
Source: Materials Science & Engineering: C. Jul2006, Vol. 26 Issue 5-7, p835-839. 5p.
Subjects: Nanocrystals, Photoelectron spectroscopy, Thin films, Electron microscopy
Abstract: Abstract: Si nanocrystals (ncs) were synthesized by e-beam evaporation of SiO/SiO2 multilayer structures and subsequent annealing at high temperatures. We focused our attention on the possibility to manipulate the ncs dimension by changing the SiO layer thickness. Time of flight secondary ion mass spectrometry and X-ray photoelectron spectroscopy analyses of the annealed samples indicated that the thermal treatment induces a phase separation in the SiO layer. The formation of Si nanocrystals was confirmed by high-resolution transmission electron microscopy, although in the thinnest layers (below 2 nm) the Si clusters are probably amorphous. Preliminary results indicate that a similar approach is suitable also for synthesizing Ge nanocrystals. [Copyright &y& Elsevier]
Copyright of Materials Science & Engineering: C is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
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  Data: Synthesis of mono and bi-layer of Si nanocrystals embedded in a dielectric matrix by e-beam evaporation of SiO/SiO<subscript>2</subscript> thin films
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  Data: <searchLink fieldCode="AR" term="%22Perego%2C+M%2E%22">Perego, M.</searchLink><relatesTo>1</relatesTo><i> Michele.perego@mdm.infm.it</i><br /><searchLink fieldCode="AR" term="%22Fanciulli%2C+M%2E%22">Fanciulli, M.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Bonafos%2C+C%2E%22">Bonafos, C.</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AR" term="%22Cherkashin%2C+N%2E%22">Cherkashin, N.</searchLink><relatesTo>2</relatesTo>
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  Data: <searchLink fieldCode="JN" term="%22Materials+Science+%26+Engineering%3A+C%22">Materials Science & Engineering: C</searchLink>. Jul2006, Vol. 26 Issue 5-7, p835-839. 5p.
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  Data: <searchLink fieldCode="DE" term="%22Nanocrystals%22">Nanocrystals</searchLink><br /><searchLink fieldCode="DE" term="%22Photoelectron+spectroscopy%22">Photoelectron spectroscopy</searchLink><br /><searchLink fieldCode="DE" term="%22Thin+films%22">Thin films</searchLink><br /><searchLink fieldCode="DE" term="%22Electron+microscopy%22">Electron microscopy</searchLink>
– Name: Abstract
  Label: Abstract
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  Data: Abstract: Si nanocrystals (ncs) were synthesized by e-beam evaporation of SiO/SiO2 multilayer structures and subsequent annealing at high temperatures. We focused our attention on the possibility to manipulate the ncs dimension by changing the SiO layer thickness. Time of flight secondary ion mass spectrometry and X-ray photoelectron spectroscopy analyses of the annealed samples indicated that the thermal treatment induces a phase separation in the SiO layer. The formation of Si nanocrystals was confirmed by high-resolution transmission electron microscopy, although in the thinnest layers (below 2 nm) the Si clusters are probably amorphous. Preliminary results indicate that a similar approach is suitable also for synthesizing Ge nanocrystals. [Copyright &y& Elsevier]
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  Data: <i>Copyright of Materials Science & Engineering: C is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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        Value: 10.1016/j.msec.2005.09.058
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        Text: English
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      – SubjectFull: Photoelectron spectroscopy
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      – SubjectFull: Thin films
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      – TitleFull: Synthesis of mono and bi-layer of Si nanocrystals embedded in a dielectric matrix by e-beam evaporation of SiO/SiO2 thin films
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              Text: Jul2006
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              Y: 2006
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