Examination of the laser-induced variations in the chemical etch rate of a photosensitive glass ceramic.
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| Title: | Examination of the laser-induced variations in the chemical etch rate of a photosensitive glass ceramic. |
|---|---|
| Authors: | Livingston, F. E.1 Frank.E.Livingston@aero.org, Adams, P. M.2, Helvajian, H.1 |
| Source: | Applied Physics A: Materials Science & Processing. Oct2007, Vol. 89 Issue 1, p97-107. 11p. 2 Black and White Photographs, 7 Graphs. |
| Subjects: | Laser photochemistry, Glass etching, Photosensitive glass, Ceramic materials, Spectrum analysis, Physical & theoretical chemistry |
| Abstract: | Previous studies in our laboratory have reported that the chemical etch rate of a commercial photosensitive glass ceramic (FoturanTM, Schott Corp., Germany) in dilute hydrofluoric acid is strongly dependent on the incident laser irradiance during patterning at λ=266 nm and λ=355 nm. To help elucidate the underlying chemical and physical processes associated with the laser-induced variations in the chemical etch rate, several complimentary techniques were employed at various stages of the UV laser exposure and thermal treatment. X-ray diffraction (XRD) was used to identify the crystalline phases that are formed in Foturan following laser irradiation and annealing, and monitor the crystalline content as a function of laser irradiance at λ=266 nm and λ=355 nm. The XRD results indicate the nucleation of lithium metasilicate (Li2SiO3) crystals as the exclusive phase following laser irradiation and thermal treatment at temperatures not exceeding 605 °C. The XRD studies also show that the Li2SiO3 density increases with increasing laser irradiance and saturates at high laser irradiance. For our thermal treatment protocol, the average Li2SiO3 crystal diameters are 117.0±10.0 nm and 91.2±5.8 nm for λ=266 nm and λ=355 nm, respectively. Transmission electron microscopy (TEM) was utilized to examine the microscopic structural features of the lithium metasilicate crystals. The TEM results reveal that the growth of lithium metasilicate crystals proceeds dendritically, and produces Li2SiO3 crystals that are ∼700–1000 nm in length for saturation exposures. Optical transmission spectroscopy (OTS) was used to study the growth of metallic silver clusters that act as nucleation sites for the Li2SiO3 crystalline phase. The OTS results show that the (Ag0)x cluster concentration has a dependence on incident laser irradiance that is similar to the etch rate ratios and Li2SiO3 concentration. A comparison between the XRD and optical transmission results and our prior etch rate results show that the etch rate contrast and absolute etch rates are dictated by the Li2SiO3 concentration, which is in turn governed by the (Ag0)x cluster concentration. These results characterize the relationship between the laser exposure and chemical etch rate for Foturan, and permit a more detailed understanding of the photophysical processes that occur in the general class of photostructurable glass ceramic materials. Consequently, these results may also influence the laser processing of other photoactive materials. [ABSTRACT FROM AUTHOR] |
| Copyright of Applied Physics A: Materials Science & Processing is the property of Springer Nature and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.) | |
| Database: | Engineering Source |
| FullText | Links: – Type: pdflink Text: Availability: 0 |
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| Header | DbId: egs DbLabel: Engineering Source An: 26210854 AccessLevel: 6 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| Items | – Name: Title Label: Title Group: Ti Data: Examination of the laser-induced variations in the chemical etch rate of a photosensitive glass ceramic. – Name: Author Label: Authors Group: Au Data: <searchLink fieldCode="AR" term="%22Livingston%2C+F%2E+E%2E%22">Livingston, F. E.</searchLink><relatesTo>1</relatesTo><i> Frank.E.Livingston@aero.org</i><br /><searchLink fieldCode="AR" term="%22Adams%2C+P%2E+M%2E%22">Adams, P. M.</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AR" term="%22Helvajian%2C+H%2E%22">Helvajian, H.</searchLink><relatesTo>1</relatesTo> – Name: TitleSource Label: Source Group: Src Data: <searchLink fieldCode="JN" term="%22Applied+Physics+A%3A+Materials+Science+%26+Processing%22">Applied Physics A: Materials Science & Processing</searchLink>. Oct2007, Vol. 89 Issue 1, p97-107. 11p. 2 Black and White Photographs, 7 Graphs. – Name: Subject Label: Subjects Group: Su Data: <searchLink fieldCode="DE" term="%22Laser+photochemistry%22">Laser photochemistry</searchLink><br /><searchLink fieldCode="DE" term="%22Glass+etching%22">Glass etching</searchLink><br /><searchLink fieldCode="DE" term="%22Photosensitive+glass%22">Photosensitive glass</searchLink><br /><searchLink fieldCode="DE" term="%22Ceramic+materials%22">Ceramic materials</searchLink><br /><searchLink fieldCode="DE" term="%22Spectrum+analysis%22">Spectrum analysis</searchLink><br /><searchLink fieldCode="DE" term="%22Physical+%26+theoretical+chemistry%22">Physical & theoretical chemistry</searchLink> – Name: Abstract Label: Abstract Group: Ab Data: Previous studies in our laboratory have reported that the chemical etch rate of a commercial photosensitive glass ceramic (FoturanTM, Schott Corp., Germany) in dilute hydrofluoric acid is strongly dependent on the incident laser irradiance during patterning at λ=266 nm and λ=355 nm. To help elucidate the underlying chemical and physical processes associated with the laser-induced variations in the chemical etch rate, several complimentary techniques were employed at various stages of the UV laser exposure and thermal treatment. X-ray diffraction (XRD) was used to identify the crystalline phases that are formed in Foturan following laser irradiation and annealing, and monitor the crystalline content as a function of laser irradiance at λ=266 nm and λ=355 nm. The XRD results indicate the nucleation of lithium metasilicate (Li2SiO3) crystals as the exclusive phase following laser irradiation and thermal treatment at temperatures not exceeding 605 °C. The XRD studies also show that the Li2SiO3 density increases with increasing laser irradiance and saturates at high laser irradiance. For our thermal treatment protocol, the average Li2SiO3 crystal diameters are 117.0±10.0 nm and 91.2±5.8 nm for λ=266 nm and λ=355 nm, respectively. Transmission electron microscopy (TEM) was utilized to examine the microscopic structural features of the lithium metasilicate crystals. The TEM results reveal that the growth of lithium metasilicate crystals proceeds dendritically, and produces Li2SiO3 crystals that are ∼700–1000 nm in length for saturation exposures. Optical transmission spectroscopy (OTS) was used to study the growth of metallic silver clusters that act as nucleation sites for the Li2SiO3 crystalline phase. The OTS results show that the (Ag0)x cluster concentration has a dependence on incident laser irradiance that is similar to the etch rate ratios and Li2SiO3 concentration. A comparison between the XRD and optical transmission results and our prior etch rate results show that the etch rate contrast and absolute etch rates are dictated by the Li2SiO3 concentration, which is in turn governed by the (Ag0)x cluster concentration. These results characterize the relationship between the laser exposure and chemical etch rate for Foturan, and permit a more detailed understanding of the photophysical processes that occur in the general class of photostructurable glass ceramic materials. Consequently, these results may also influence the laser processing of other photoactive materials. [ABSTRACT FROM AUTHOR] – Name: AbstractSuppliedCopyright Label: Group: Ab Data: <i>Copyright of Applied Physics A: Materials Science & Processing is the property of Springer Nature and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.) |
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| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1007/s00339-007-4197-0 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 11 StartPage: 97 Subjects: – SubjectFull: Laser photochemistry Type: general – SubjectFull: Glass etching Type: general – SubjectFull: Photosensitive glass Type: general – SubjectFull: Ceramic materials Type: general – SubjectFull: Spectrum analysis Type: general – SubjectFull: Physical & theoretical chemistry Type: general Titles: – TitleFull: Examination of the laser-induced variations in the chemical etch rate of a photosensitive glass ceramic. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Livingston, F. E. – PersonEntity: Name: NameFull: Adams, P. M. – PersonEntity: Name: NameFull: Helvajian, H. IsPartOfRelationships: – BibEntity: Dates: – D: 01 M: 10 Text: Oct2007 Type: published Y: 2007 Identifiers: – Type: issn-print Value: 09478396 Numbering: – Type: volume Value: 89 – Type: issue Value: 1 Titles: – TitleFull: Applied Physics A: Materials Science & Processing Type: main |
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