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Overcoming material challenges for replication of “motheye lenses” using step and flash imprint lithography for optoelectronic applications.

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Title: Overcoming material challenges for replication of “motheye lenses” using step and flash imprint lithography for optoelectronic applications.
Authors: Kettle, J.1 jeffrey.kettle@manchester.ac.uk, Hoyle, R. T.2, Perks, R. M.3, Dimov, S.4
Source: Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures. Sep/Oct2008, Vol. 26 Issue 5, p1794-1799. 6p. 3 Black and White Photographs, 2 Graphs.
Subjects: Lithography, Optoelectronic devices, Optoelectronics, Lenses, Ion bombardment, Oxide minerals
Abstract: In this article, the fabrication and characterization of two-dimensional (2D) and three-dimensional (3D) structures using focused ion beam milling onto templates for step and flash imprint lithography (S-FIL) is discussed. It has been discovered that the 2D linewidth and height are closely related to the ion dose. At low doses (∼1 pC/μm2), the surface of the quartz template swells, thus, affecting the shape of the subsequent imprint. Furthermore, it has been shown that during UV curing of the S-FIL resist, the polymeric resist layer contracts as it solidifies, resulting in a dimensionally reduced replication of the original structure. The authors introduce a method to overcome the problem for 3D patterns, using a “multilayer” imprinting technique and apply this technique to the fabrication of “motheye” lenses. With respect to the imprinted replica, they show that the feature profile using this approach has a high fidelity in comparison to the template structure, and thus motheye lenses can be consistently replicated employing the S-FIL technology. [ABSTRACT FROM AUTHOR]
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Database: Engineering Source
Description
Abstract:In this article, the fabrication and characterization of two-dimensional (2D) and three-dimensional (3D) structures using focused ion beam milling onto templates for step and flash imprint lithography (S-FIL) is discussed. It has been discovered that the 2D linewidth and height are closely related to the ion dose. At low doses (∼1 pC/μm2), the surface of the quartz template swells, thus, affecting the shape of the subsequent imprint. Furthermore, it has been shown that during UV curing of the S-FIL resist, the polymeric resist layer contracts as it solidifies, resulting in a dimensionally reduced replication of the original structure. The authors introduce a method to overcome the problem for 3D patterns, using a “multilayer” imprinting technique and apply this technique to the fabrication of “motheye” lenses. With respect to the imprinted replica, they show that the feature profile using this approach has a high fidelity in comparison to the template structure, and thus motheye lenses can be consistently replicated employing the S-FIL technology. [ABSTRACT FROM AUTHOR]
ISSN:10711023
DOI:10.1116/1.2981081