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Overcoming material challenges for replication of “motheye lenses” using step and flash imprint lithography for optoelectronic applications.

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Title: Overcoming material challenges for replication of “motheye lenses” using step and flash imprint lithography for optoelectronic applications.
Authors: Kettle, J.1 jeffrey.kettle@manchester.ac.uk, Hoyle, R. T.2, Perks, R. M.3, Dimov, S.4
Source: Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures. Sep/Oct2008, Vol. 26 Issue 5, p1794-1799. 6p. 3 Black and White Photographs, 2 Graphs.
Subjects: Lithography, Optoelectronic devices, Optoelectronics, Lenses, Ion bombardment, Oxide minerals
Abstract: In this article, the fabrication and characterization of two-dimensional (2D) and three-dimensional (3D) structures using focused ion beam milling onto templates for step and flash imprint lithography (S-FIL) is discussed. It has been discovered that the 2D linewidth and height are closely related to the ion dose. At low doses (∼1 pC/μm2), the surface of the quartz template swells, thus, affecting the shape of the subsequent imprint. Furthermore, it has been shown that during UV curing of the S-FIL resist, the polymeric resist layer contracts as it solidifies, resulting in a dimensionally reduced replication of the original structure. The authors introduce a method to overcome the problem for 3D patterns, using a “multilayer” imprinting technique and apply this technique to the fabrication of “motheye” lenses. With respect to the imprinted replica, they show that the feature profile using this approach has a high fidelity in comparison to the template structure, and thus motheye lenses can be consistently replicated employing the S-FIL technology. [ABSTRACT FROM AUTHOR]
Copyright of Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures is the property of American Institute of Physics and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
Database: Engineering Source
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DbLabel: Engineering Source
An: 34729831
AccessLevel: 6
PubType: Academic Journal
PubTypeId: academicJournal
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  Data: Overcoming material challenges for replication of “motheye lenses” using step and flash imprint lithography for optoelectronic applications.
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+Vacuum+Science+%26+Technology%3A+Part+B-Microelectronics+%26+Nanometer+Structures%22">Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures</searchLink>. Sep/Oct2008, Vol. 26 Issue 5, p1794-1799. 6p. 3 Black and White Photographs, 2 Graphs.
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  Data: <searchLink fieldCode="DE" term="%22Lithography%22">Lithography</searchLink><br /><searchLink fieldCode="DE" term="%22Optoelectronic+devices%22">Optoelectronic devices</searchLink><br /><searchLink fieldCode="DE" term="%22Optoelectronics%22">Optoelectronics</searchLink><br /><searchLink fieldCode="DE" term="%22Lenses%22">Lenses</searchLink><br /><searchLink fieldCode="DE" term="%22Ion+bombardment%22">Ion bombardment</searchLink><br /><searchLink fieldCode="DE" term="%22Oxide+minerals%22">Oxide minerals</searchLink>
– Name: Abstract
  Label: Abstract
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  Data: In this article, the fabrication and characterization of two-dimensional (2D) and three-dimensional (3D) structures using focused ion beam milling onto templates for step and flash imprint lithography (S-FIL) is discussed. It has been discovered that the 2D linewidth and height are closely related to the ion dose. At low doses (∼1 pC/μm2), the surface of the quartz template swells, thus, affecting the shape of the subsequent imprint. Furthermore, it has been shown that during UV curing of the S-FIL resist, the polymeric resist layer contracts as it solidifies, resulting in a dimensionally reduced replication of the original structure. The authors introduce a method to overcome the problem for 3D patterns, using a “multilayer” imprinting technique and apply this technique to the fabrication of “motheye” lenses. With respect to the imprinted replica, they show that the feature profile using this approach has a high fidelity in comparison to the template structure, and thus motheye lenses can be consistently replicated employing the S-FIL technology. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures is the property of American Institute of Physics and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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        Value: 10.1116/1.2981081
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        Text: English
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        Type: general
      – SubjectFull: Optoelectronic devices
        Type: general
      – SubjectFull: Optoelectronics
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      – SubjectFull: Lenses
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      – SubjectFull: Ion bombardment
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      – SubjectFull: Oxide minerals
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      – TitleFull: Overcoming material challenges for replication of “motheye lenses” using step and flash imprint lithography for optoelectronic applications.
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              Text: Sep/Oct2008
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