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Focused Electron-Beam-Induced Deposition of 3 nm Dots in a Scanning Electron Microscope.

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Title: Focused Electron-Beam-Induced Deposition of 3 nm Dots in a Scanning Electron Microscope.
Authors: van Kouwen, Leon1, Botman, Aurelien1, Hagen, Cornelis W.1
Source: Nano Letters. May2009, Vol. 9 Issue 5, p2149-2152. 4p.
Subjects: Electron beams, Microfabrication, Scanning electron microscopes, Quantum dots, Micrometers
Abstract: Electron-beam-induced deposition allows the creation of three-dimensional nanodevices within a scanning electron microscope. Typically the dimensions of the fabricated structure are from 20 nm to several micrometers. Until now the record for the smallest deposited feature in an SEM was 3.5 nm, measured by an indirect method. We have achieved a nanodot having a full width half-maximum of 2.8 ± 0.3 nm, measured directly in the same microscope after deposition. [ABSTRACT FROM AUTHOR]
Copyright of Nano Letters is the property of American Chemical Society and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
Database: Engineering Source
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Header DbId: egs
DbLabel: Engineering Source
An: 39987704
AccessLevel: 6
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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Items – Name: Title
  Label: Title
  Group: Ti
  Data: Focused Electron-Beam-Induced Deposition of 3 nm Dots in a Scanning Electron Microscope.
– Name: Author
  Label: Authors
  Group: Au
  Data: <searchLink fieldCode="AR" term="%22van+Kouwen%2C+Leon%22">van Kouwen, Leon</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Botman%2C+Aurelien%22">Botman, Aurelien</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Hagen%2C+Cornelis+W%2E%22">Hagen, Cornelis W.</searchLink><relatesTo>1</relatesTo>
– Name: TitleSource
  Label: Source
  Group: Src
  Data: <searchLink fieldCode="JN" term="%22Nano+Letters%22">Nano Letters</searchLink>. May2009, Vol. 9 Issue 5, p2149-2152. 4p.
– Name: Subject
  Label: Subjects
  Group: Su
  Data: <searchLink fieldCode="DE" term="%22Electron+beams%22">Electron beams</searchLink><br /><searchLink fieldCode="DE" term="%22Microfabrication%22">Microfabrication</searchLink><br /><searchLink fieldCode="DE" term="%22Scanning+electron+microscopes%22">Scanning electron microscopes</searchLink><br /><searchLink fieldCode="DE" term="%22Quantum+dots%22">Quantum dots</searchLink><br /><searchLink fieldCode="DE" term="%22Micrometers%22">Micrometers</searchLink>
– Name: Abstract
  Label: Abstract
  Group: Ab
  Data: Electron-beam-induced deposition allows the creation of three-dimensional nanodevices within a scanning electron microscope. Typically the dimensions of the fabricated structure are from 20 nm to several micrometers. Until now the record for the smallest deposited feature in an SEM was 3.5 nm, measured by an indirect method. We have achieved a nanodot having a full width half-maximum of 2.8 ± 0.3 nm, measured directly in the same microscope after deposition. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of Nano Letters is the property of American Chemical Society and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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RecordInfo BibRecord:
  BibEntity:
    Identifiers:
      – Type: doi
        Value: 10.1021/nl900717r
    Languages:
      – Code: eng
        Text: English
    PhysicalDescription:
      Pagination:
        PageCount: 4
        StartPage: 2149
    Subjects:
      – SubjectFull: Electron beams
        Type: general
      – SubjectFull: Microfabrication
        Type: general
      – SubjectFull: Scanning electron microscopes
        Type: general
      – SubjectFull: Quantum dots
        Type: general
      – SubjectFull: Micrometers
        Type: general
    Titles:
      – TitleFull: Focused Electron-Beam-Induced Deposition of 3 nm Dots in a Scanning Electron Microscope.
        Type: main
  BibRelationships:
    HasContributorRelationships:
      – PersonEntity:
          Name:
            NameFull: van Kouwen, Leon
      – PersonEntity:
          Name:
            NameFull: Botman, Aurelien
      – PersonEntity:
          Name:
            NameFull: Hagen, Cornelis W.
    IsPartOfRelationships:
      – BibEntity:
          Dates:
            – D: 13
              M: 05
              Text: May2009
              Type: published
              Y: 2009
          Identifiers:
            – Type: issn-print
              Value: 15306984
          Numbering:
            – Type: volume
              Value: 9
            – Type: issue
              Value: 5
          Titles:
            – TitleFull: Nano Letters
              Type: main
ResultId 1