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Field Emission and Electric Discharge of Nanocrystalline Diamond Films.

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Title: Field Emission and Electric Discharge of Nanocrystalline Diamond Films.
Authors: Bohr-Ran Huang1, Jou, Shyankay2 sjou@mail.ntust.edu.tw, Meng-Chang wu3
Source: Journal of Electronic Materials. Jun2009, Vol. 38 Issue 6, p750-755. 6p. 1 Diagram, 2 Charts, 3 Graphs.
Subjects: Diamond thin films, Nanocrystals, Microwave plasmas, Chemical vapor deposition, Electron emission, Field emission, Electric discharges, Liquid crystal films, Cathodes
Abstract: Nanocrystalline diamond (NCD) films were produced by microwave plasma-enhanced chemical vapor deposition (MPECVD) using gas mixtures of Ar, H2, and CH4. The structural properties, electron emission, and electric discharge behaviors of the NCD films varied with H2 flow rates during MPECVD. The turn-on field for electron emission at a pressure of 2.66 × 10−4 Pa increased from 4.2 V μm−1 for the NCD films that were deposited using a H2 flow rate of 10 cm3 min−1 to 7 V μm−1 for films deposited at a H2 flow rate of 20 cm3 min−1. The NCD film with a low turn-on field also induced low breakdown voltages in N2. The grain size and roughness of the NCD films may influence both the electron emission and the electric discharge behaviors of the NCD cathodes. [ABSTRACT FROM AUTHOR]
Copyright of Journal of Electronic Materials is the property of Springer Nature and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
Database: Engineering Source
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  Data: Field Emission and Electric Discharge of Nanocrystalline Diamond Films.
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+Electronic+Materials%22">Journal of Electronic Materials</searchLink>. Jun2009, Vol. 38 Issue 6, p750-755. 6p. 1 Diagram, 2 Charts, 3 Graphs.
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  Data: <searchLink fieldCode="DE" term="%22Diamond+thin+films%22">Diamond thin films</searchLink><br /><searchLink fieldCode="DE" term="%22Nanocrystals%22">Nanocrystals</searchLink><br /><searchLink fieldCode="DE" term="%22Microwave+plasmas%22">Microwave plasmas</searchLink><br /><searchLink fieldCode="DE" term="%22Chemical+vapor+deposition%22">Chemical vapor deposition</searchLink><br /><searchLink fieldCode="DE" term="%22Electron+emission%22">Electron emission</searchLink><br /><searchLink fieldCode="DE" term="%22Field+emission%22">Field emission</searchLink><br /><searchLink fieldCode="DE" term="%22Electric+discharges%22">Electric discharges</searchLink><br /><searchLink fieldCode="DE" term="%22Liquid+crystal+films%22">Liquid crystal films</searchLink><br /><searchLink fieldCode="DE" term="%22Cathodes%22">Cathodes</searchLink>
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  Label: Abstract
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  Data: Nanocrystalline diamond (NCD) films were produced by microwave plasma-enhanced chemical vapor deposition (MPECVD) using gas mixtures of Ar, H2, and CH4. The structural properties, electron emission, and electric discharge behaviors of the NCD films varied with H2 flow rates during MPECVD. The turn-on field for electron emission at a pressure of 2.66 × 10−4 Pa increased from 4.2 V μm−1 for the NCD films that were deposited using a H2 flow rate of 10 cm3 min−1 to 7 V μm−1 for films deposited at a H2 flow rate of 20 cm3 min−1. The NCD film with a low turn-on field also induced low breakdown voltages in N2. The grain size and roughness of the NCD films may influence both the electron emission and the electric discharge behaviors of the NCD cathodes. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of Journal of Electronic Materials is the property of Springer Nature and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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        Value: 10.1007/s11664-009-0706-6
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      – Code: eng
        Text: English
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      Pagination:
        PageCount: 6
        StartPage: 750
    Subjects:
      – SubjectFull: Diamond thin films
        Type: general
      – SubjectFull: Nanocrystals
        Type: general
      – SubjectFull: Microwave plasmas
        Type: general
      – SubjectFull: Chemical vapor deposition
        Type: general
      – SubjectFull: Electron emission
        Type: general
      – SubjectFull: Field emission
        Type: general
      – SubjectFull: Electric discharges
        Type: general
      – SubjectFull: Liquid crystal films
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      – SubjectFull: Cathodes
        Type: general
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      – TitleFull: Field Emission and Electric Discharge of Nanocrystalline Diamond Films.
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            NameFull: Bohr-Ran Huang
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            NameFull: Jou, Shyankay
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            NameFull: Meng-Chang wu
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              M: 06
              Text: Jun2009
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              Y: 2009
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